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91. 发明申请

US20050248853A1 Optical projection lens system 失效
标题翻译：光学投影镜头系统
公开(公告)号：US20050248853A1
公开(公告)日：2005-11-10
申请号：US11175092
申请日：2005-07-05
申请人： David Shafer , Wilhelm Ulrich
发明人： David Shafer , Wilhelm Ulrich
IPC分类号： G02B3/00 , G02B9/00 , G02B13/14 , G02B13/18 , G02B13/24 , G03F7/20 , H01L21/027
CPC分类号： G02B13/143 , G02B13/24 , G03F7/70241
摘要： An optical projection lens system for microlithography includes in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group. At least one lens of the projection lens system which is arranged in front of the waist includes an aspherical surface.
摘要翻译：用于微光刻的光学投影透镜系统包括传播辐射的方向：具有正屈光力的第一透镜组，具有负屈光力的第二透镜组和具有最小传播辐射直径的腰部（缩小部分），以及另外具有正屈光力的透镜装置，其跟随第二透镜组。布置在腰部前方的投影透镜系统的至少一个透镜包括非球面。

92. 发明申请

US20050180011A1 Objective with pupil obscuration 有权
公开(公告)号：US20050180011A1
公开(公告)日：2005-08-18
申请号：US11102524
申请日：2005-04-08
申请人： Hans-Jurgen Mann , Wilhelm Ulrich
发明人： Hans-Jurgen Mann , Wilhelm Ulrich
IPC分类号： G02B17/00 , G02B13/14 , G02B13/18 , G02B13/24 , G02B17/06 , G02B17/08 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70291 , G02B17/0652 , G03F7/70225 , G03F7/70233
摘要： An objective is configured with a first partial objective and a second partial objective. The first partial objective, which projects a first field plane onto an intermediate image, has a first, convex mirror and a second, concave mirror. The second partial objective, which projects the intermediate image onto a second field plane, has a third and a fourth mirror, both concave. All of the four mirrors have central mirror apertures. The axial distance between the first and second mirrors is in a ratio between 0.95 and 1.05 relative to the distance between the second mirror and the intermediate image. The axial distance ZM3-IM between the third mirror and the second field plane conforms to the relationship 0.03 · Du M3 + 5.0 ⁢ ⁢ mm

93. 发明申请

US20050134826A1 Projection objective for microlithography 有权
标题翻译：微光刻的投影目标
公开(公告)号：US20050134826A1
公开(公告)日：2005-06-23
申请号：US10919376
申请日：2004-08-17
申请人： Wilhelm Ulrich , Gerhard Fuerter , Michael Gerhard
发明人： Wilhelm Ulrich , Gerhard Fuerter , Michael Gerhard
IPC分类号： G02B13/14 , G02B17/08 , G02B27/28 , G03F7/20 , G03B27/72
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G02B27/28 , G03F7/70225 , G03F7/70566
摘要： A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, polarization-dependent differences in the intensity and response of the light passing through the objective, which lead to a worsening of the imaging quality of the projection objective, can largely be avoided.
摘要翻译：用于将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中的微光刻的投影物镜具有至少一个在透射或反射中仅被操作一次的偏振分离器件。通过使用该装置，可以大大避免导致通过物镜的光的强度和响应的偏振相关差异，导致投影物镜的成像质量恶化。

94. 发明授权

US06906866B2 Compact 1½-waist system for sub 100 nm ArF lithography 有权
标题翻译：紧凑的1½腰系统用于亚100 nm ArF光刻
公开(公告)号：US06906866B2
公开(公告)日：2005-06-14
申请号：US10688212
申请日：2003-10-15
申请人： Russell Hudyma , Wilhelm Ulrich , Hans-Juergen Rostalski
发明人： Russell Hudyma , Wilhelm Ulrich , Hans-Juergen Rostalski
IPC分类号： G02B13/14 , G03F7/20 , G02B3/00 , G02B9/00
CPC分类号： G03F7/70241 , G02B13/143
摘要： According to one exemplary embodiment, a projection lens having an object plane and an image plane is provided and includes the following lens groups listed objectwise to imagewise: (1) a first lens group having negative refractive power; and (2) at least three other lens groups having a positive refractive power and at least one other lens group having a negative refractive power. In one embodiment, the projections lens includes a second lens group having a positive refractive power; a third lens group having a negative refractive power; and fourth, fifth and sixth lens groups having overall positive refractive power. The projection lens having a numerical aperture of at least about 0.85 and is of a 1½ waist construction, with the ½ waist defined in the first lens group and a primary waist is defined in the third lens group.
摘要翻译：根据一个示例性实施例，提供具有物平面和像平面的投影透镜，并且包括以成像方式对象地列出的以下透镜组：（1）具有负屈光力的第一透镜组; 和（2）具有正屈光力的至少三个其它透镜组和具有负屈光力的至少一个其它透镜组。在一个实施例中，投影透镜包括具有正折光力的第二透镜组; 具有负屈光力的第三透镜组; 以及具有总正正屈光力的第四，第五和第六透镜组。投影透镜具有至少约0.85的数值孔径，并且具有1/2腰围结构，其中限定在第一透镜组中的1/2腰围和初级腰围限定在第三透镜组中。

95. 发明授权

US06600608B1 Catadioptric objective comprising two intermediate images 有权
标题翻译：反射折射物镜包括两个中间图像
公开(公告)号：US06600608B1
公开(公告)日：2003-07-29
申请号：US09434702
申请日：1999-11-05
申请人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Fürter , Rudolf von Bünau , Wilhelm Ulrich
发明人： David R. Shafer , Alois Herkommer , Karl-Heinz Schuster , Gerd Fürter , Rudolf von Bünau , Wilhelm Ulrich
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B17/0812 , G03F7/70225 , G03F7/70275
摘要： An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.
摘要翻译：包括轴向对称的目标，至少一个曲面镜和至少一个透镜和两个中间图像。目标包括两个折射部分目标和一个反射折射部分目标。目标包括第一部分目标，第一中间图像，第二部分目标，第二中间图像和第三部分目标。部分目标中的至少一个纯粹是折射的。其中一个部分目标是纯粹的折射，一个纯粹是反射的。

96. 发明授权

US5978132A Achromatized and athermalized two-lens reimager 失效
标题翻译：消色差和非热化双镜头再造镜
公开(公告)号：US5978132A
公开(公告)日：1999-11-02
申请号：US949456
申请日：1997-10-14
申请人： Wilhelm Ulrich
发明人： Wilhelm Ulrich
IPC分类号： G02B13/14 , G02B27/00
CPC分类号： G02B27/4211 , G02B13/14 , G02B27/0037 , G02B27/4277 , G02B27/4283
摘要： A reimager comprises precisely two positive lenses wherein the chromatic longitudinal aberration lies within the depth of focus and the thermal image position variation likewise lies within the depth of focus over a temperature range of more than .+-.30.degree. (in the embodiment from -40.degree. C. to +70.degree. C.). Aspheric and diffractive surfaces are utilized and, if required, are joined on respective lens surfaces (31, 51, 53, 71, 73).
摘要翻译：重新定像器包括精确的两个正透镜，其中彩色纵向像差位于焦深范围内，并且热图像位置变化同样位于超过+/- 30度的温度范围内的焦点深度（在该实施例中为-40° ℃至+ 70℃）。使用非球面和衍射表面，并且如果需要，在相应的透镜表面（31,51,53,71,73）上接合。

97. 发明授权

US5909308A Achromatic and athermalized reimager 失效
标题翻译：消色差和高温重新定向镜
公开(公告)号：US5909308A
公开(公告)日：1999-06-01
申请号：US780295
申请日：1997-01-08
申请人： Wilhelm Ulrich
发明人： Wilhelm Ulrich
IPC分类号： G02B13/14 , G02B26/08 , H04N5/225 , H04N5/33
CPC分类号： H04N5/2254 , G02B13/14 , G02B26/0875 , H04N5/33
摘要： An achrathermalized reimager includes a front objective defining an optical axis and a relay optic arranged on the optical axis downstream of the front objective. The front objective is both achromatic and athermalized and includes precisely one negative lens made of a material selected from the group consisting of ZnSe and ZnS and one positive lens made of chalcogenide glass.
摘要翻译：光学再造器包括限定光轴的前目标和布置在前物镜下游的光轴上的中继光学元件。前面的目的是消色差和非热处理，并且包括精确地由选自ZnSe和ZnS的材料制成的一个负透镜和由硫族化物玻璃制成的一个正透镜。

98. 发明授权

US5103341A UV-capable dry lens for microscopes 失效
标题翻译：紫外线可干透镜用于显微镜
公开(公告)号：US5103341A
公开(公告)日：1992-04-07
申请号：US524085
申请日：1990-05-15
申请人： Wilhelm Ulrich , Franz Muchel
发明人： Wilhelm Ulrich , Franz Muchel
IPC分类号： G02B13/14 , G02B21/02 , G02B27/00
CPC分类号： G02B27/0068 , G02B21/02
摘要： An UV-capable dry objective for microscopes in which aperture aberration is corrected, at the same time, both for the visible spectrum and for a selected UV-wavelength. The objective comprises two lens groups separated by an air gap which is varied in size by relative movement between the two lens groups. The size of the air gap is adjusted to correct aperture aberration for the selected UV-wavelength. The objective is designed so that the mathematical sign is the same for both (i) the corrections required as the illumination moves toward the longer-wave portion of the visible spectrum, and (ii) for the corrections required as the illumination moves toward the shorter-wave portion of the UV-spectrum. The objective has an aperture of at least 0.7 and a magnification of more than 60.times..
摘要翻译：对于可见光谱和选定的紫外线波长，同时对孔径像差进行校正的显微镜的紫外线干物镜。该目的包括由气隙隔开的两个透镜组，其通过两个透镜组之间的相对运动而在尺寸上变化。调整气隙的尺寸以校正所选择的UV波长的孔径像差。设计目标是为了（i）照明朝向可见光谱的较长波长部分移动所需的校正，以及（ii）当照明朝向较短的光束移动时所需的校正，数学符号是相同的波段部分的紫外光谱。目标具有至少0.7的孔径和大于60倍的放大率。

99. 发明授权

US4963728A Coordinate measuring apparatus having an optical sensing head 失效
标题翻译：具有光学感测头的坐标测量装置
公开(公告)号：US4963728A
公开(公告)日：1990-10-16
申请号：US417551
申请日：1989-10-05
申请人： Albrecht Hof , Wilhelm Ulrich , Lothar Rubl , Klaus-Peter Koch
发明人： Albrecht Hof , Wilhelm Ulrich , Lothar Rubl , Klaus-Peter Koch
IPC分类号： G01B11/00 , G01B11/03
CPC分类号： G01B11/007
摘要： The invention is directed to a coordinate measuring apparatus having an optical sensing head. The optical sensing head is held on the measuring arm of the coordinate measuring apparatus. The optical sensing head includes a holder and a plurality of detachable front optic units which can be exchanged as required. Each of the front optic units has its own objective and its own illuminating optic arrangement adapted to the objective. The illuminating optic is supplied via light conductors with the light conductors being guided over a change interface where the front optic unit is attached to the holder of the sensing head in a reproducible manner. The light conducting ends for the illumination are coupled in the change interface by means of a coupling device which achieves this coupling with low losses. This device includes, for example, self-centering sleeves which enable flexible supply light conductors to be centrally seated on the end faces of half-rigid plastic light conductors. Interface losses are avoided in this manner.
摘要翻译：本发明涉及一种具有光学感测头的坐标测量装置。光学传感头保持在坐标测量装置的测量臂上。光学传感头包括一个保持器和多个可拆卸的前光学单元，可根据需要进行更换。每个前光学单元具有其自己的目标，并且其自身的照明光学装置适合于该目的。照明光学器件通过光导体提供，其中光导体被导引在改变接口上，其中前光学单元以可再现的方式附接到感测头的保持器。用于照明的导光端通过耦合装置耦合在改变界面中，该耦合装置以低损耗实现该耦合。该装置包括例如自对中套筒，其使得柔性供应光导体能够集中位于半刚性塑料光导体的端面上。以这种方式避免接口损耗。

100. 发明授权

US08873151B2 Illumination system for a microlithgraphic exposure apparatus 有权
标题翻译：微型照相曝光设备的照明系统
公开(公告)号：US08873151B2
公开(公告)日：2014-10-28
申请号：US11911904
申请日：2006-04-26
申请人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
发明人： Alexander Sohmer , Aurelian Dodoc , Heiko Feldmann , Wilhelm Ulrich , Gerhard Fuerter , Rafael Egger , Artur Moegele , Michael Raum
IPC分类号： G02B3/00 , G03F7/20 , G02B17/08 , G02B27/00
CPC分类号： G03F7/70075 , G02B17/0892 , G02B27/0043
摘要： An illumination system of a microlithographic exposure apparatus comprises a condenser for transforming a pupil plane into a field plane. The condenser has a lens group that contains a plurality of consecutive lenses. These lenses are arranged such that a light bundle focused by the condenser on an on-axis field point converges within each lens of the lens group. At least one lens of the lens group has a concave surface. The illumination system may further comprise a field stop objective that at least partly corrects a residual pupil aberration of the condenser.
摘要翻译：微光刻曝光设备的照明系统包括用于将光瞳平面转换成场平面的聚光器。冷凝器具有包含多个连续透镜的透镜组。这些透镜被布置成使得由聚光器聚焦在轴上场点上的光束在透镜组的每个透镜内会聚。透镜组的至少一个透镜具有凹面。照明系统还可以包括至少部分地校正冷凝器的残余光瞳像差的场停止物镜。

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