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91. 发明授权

US08842293B2 Level sensor arrangement for lithographic apparatus and device manufacturing method 有权
标题翻译：用于光刻设备和装置制造方法的液位传感器装置
公开(公告)号：US08842293B2
公开(公告)日：2014-09-23
申请号：US12722955
申请日：2010-03-12
申请人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
发明人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
IPC分类号： G01B11/14 , G03F9/00
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
摘要翻译：液位传感器装置可用于测量光刻设备中的基板表面的高度。液位传感器装置设置有朝向基板发射检测辐射的光源，以及用于在操作中测量从基板反射的辐射的检测器单元。光源布置成在光刻设备中用于处理基板的抗蚀剂敏感的波长范围内发射检测辐射。

92. 发明授权

US08497976B2 Substrate measurement method and apparatus 失效
标题翻译：基板测量方法和装置
公开(公告)号：US08497976B2
公开(公告)日：2013-07-30
申请号：US12574231
申请日：2009-10-06
申请人： Wilhelmus Maria Corbeij , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
发明人： Wilhelmus Maria Corbeij , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
IPC分类号： G01B11/00 , G01N21/86 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03B27/32 , G03F7/70625 , G03F7/70633 , G03F7/7085
摘要： A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of the target using a pulsed light source, the duration of a single light pulse being less than 100 psec. A lithographic apparatus includes such a measurement apparatus, and a device manufacturing method includes such a measurement method.
摘要翻译：一种用于测量衬底特性的方法和装置。在基板上存在靶，并且在基板的扫描运动期间进行测量。基板的扫描运动是线性运动，并且测量包括使用脉冲光源获得目标的反射图像，单个光脉冲的持续时间小于100psec。光刻设备包括这样的测量设备，并且包括这种测量方法的设备制造方法。

93. 发明授权

US08351024B2 Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments 有权
标题翻译：涉及具有包括三个或更多个段的检测光栅的液位传感器的平版印刷设备和设备制造方法
公开(公告)号：US08351024B2
公开(公告)日：2013-01-08
申请号：US12722924
申请日：2010-03-12
申请人： Arie Jeffrey Den Boef
发明人： Arie Jeffrey Den Boef
IPC分类号： G03B27/58
CPC分类号： G01B11/0608 , G03F9/7034
摘要： A level sensor configured to determine a height level of a substrate is disclosed. The level sensor includes a projection unit to project a measurement beam having a substantially periodic radiation intensity on the substrate; a detection unit to receive the measurement beam after reflection on the substrate, the detection unit having a detection grating arranged to receive the reflected measurement beam, the detection grating comprising at least one array of three or more segments together having a length substantially equal to a length of a period of the measurement beam projected on the detection grating, and configured to split the reflected measurement beam in three or more reflected measurement beam parts, and three or more detectors each arranged to receive one of the three or more measurement beam parts; and a processing unit to calculate a height level on the basis of the measurement beam parts.
摘要翻译：公开了一种配置成确定基板的高度水平的液位传感器。液位传感器包括：投影单元，用于将具有基本上周期性辐射强度的测量光束投射到基板上; 检测单元，用于在所述基板上反射之后接收所述测量光束，所述检测单元具有布置成接收所述反射的测量光束的检测光栅，所述检测光栅包括三个或更多个段的至少一个阵列，所述三个或更多个段的长度基本上等于投影在检测光栅上的测量光束的周期的长度，并且被配置为将反射的测量光束分成三个或更多个反射的测量光束部分，以及三个或更多个检测器，每个检测器被布置成接收三个或更多个测量光束部分中的一个; 以及处理单元，其基于测量光束部分来计算高度水平。

94. 发明申请

US20120313295A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20120313295A1
公开(公告)日：2012-12-13
申请号：US13579544
申请日：2011-01-11
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
IPC分类号： G01B15/00 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
摘要翻译：一种在压印光刻设备中确定压印模板的位置的方法。在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准通过分析检测到的强度来标记。

95. 发明申请

US20120244319A1 IMPRINT LITHOGRAPHY 有权
公开(公告)号：US20120244319A1
公开(公告)日：2012-09-27
申请号：US13513807
申请日：2010-10-01
申请人： Sander Frederik Wuister , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman
发明人： Sander Frederik Wuister , Arie Jeffrey Den Boef , Yvonne Wendela Kruijt-Stegeman
IPC分类号： B29C43/02 , B32B3/10
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/00 , Y10T428/24479
摘要： An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.
摘要翻译：公开了一种具有特定对准装置的物体，用于将物体和另一物体相对于彼此对准。对准布置包括基本上规则的格栅形式的第一精细对准标记和位于与第一对准标记相同的区域中的第二粗略对准标记。

96. 发明授权

US08120001B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US08120001B2
公开(公告)日：2012-02-21
申请号：US12536580
申请日：2009-08-06
申请人： Arie Jeffrey Den Boef , Yevgeniy Konstantinovich Shmarev
发明人： Arie Jeffrey Den Boef , Yevgeniy Konstantinovich Shmarev
IPC分类号： G01N21/86 , H01J3/14
CPC分类号： G02B27/58 , G01N21/4788 , G03F7/70633
摘要： In a scatterometry apparatus having an illumination aperture stop, a field stop is provided at an intermediate image to control a spot size on a substrate. The field stop may be apodized, e.g., having a transmissivity in the form of a trapezium or a Gaussian shape.
摘要翻译：在具有照明孔径光阑的散射测量装置中，在中间图像处设置场停止件，以控制衬底上的斑点尺寸。场挡板可以被变迹，例如具有呈梯形或高斯形状的透射率。

97. 发明申请

US20110188020A1 Overlay Measurement Apparatus, Lithographic Apparatus and Device Manufacturing Method Using Such Overlay Measurement Apparatus 有权
标题翻译：覆盖测量装置，平版印刷装置和使用这种覆盖测量装置的装置制造方法
公开(公告)号：US20110188020A1
公开(公告)日：2011-08-04
申请号：US13000229
申请日：2009-05-14
申请人： Arie Jeffrey Den Boef
发明人： Arie Jeffrey Den Boef
IPC分类号： G03B27/72 , G01J4/00
CPC分类号： G03F7/70633
摘要： An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unitise connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.
摘要翻译：覆盖测量装置具有用于利用偏振光束照射样本的偏振光源和用于捕获被样品散射的光的光学系统。光学系统包括偏振器，用于透射与偏振光束的偏振方向正交的正交偏振分量。检测器测量正交偏振分量的强度。一种与检测器连接的处理单元，并且被布置为使用从正交偏振分量导出的不对称数据来处理用于覆盖测量测量的正交偏振分量。

98. 发明申请

US20110001254A1 Imprint Lithography Apparatus and Method 审中-公开
标题翻译：印刷光刻设备和方法
公开(公告)号：US20110001254A1
公开(公告)日：2011-01-06
申请号：US12820492
申请日：2010-06-22
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
IPC分类号： B29C59/02 , B29C59/00
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
摘要翻译：公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与印记模板还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。

99. 发明申请

US20100091258A1 SUBSTRATE MEASUREMENT METHOD AND APPARATUS 失效
标题翻译：基板测量方法和设备
公开(公告)号：US20100091258A1
公开(公告)日：2010-04-15
申请号：US12574231
申请日：2009-10-06
申请人： Wilhelmus Maria Corbeij , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
发明人： Wilhelmus Maria Corbeij , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
IPC分类号： G03B27/52 , G01B11/24 , G03B27/32
CPC分类号： G03B27/32 , G03F7/70625 , G03F7/70633 , G03F7/7085
摘要： A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of the target using a pulsed light source, the duration of a single light pulse being less than 100 psec. A lithographic apparatus includes such a measurement apparatus, and a device manufacturing method includes such a measurement method.
摘要翻译：一种用于测量衬底特性的方法和装置。在基板上存在靶，并且在基板的扫描运动期间进行测量。基板的扫描运动是线性运动，并且测量包括使用脉冲光源获得目标的反射图像，单个光脉冲的持续时间小于100psec。光刻设备包括这样的测量设备，并且包括这种测量方法的设备制造方法。

100. 发明授权

US07589832B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和装置方法
公开(公告)号：US07589832B2
公开(公告)日：2009-09-15
申请号：US11501911
申请日：2006-08-10
申请人： Arie Jeffrey Den Boef , Yevgeniy Konstantinovich Shmarev
发明人： Arie Jeffrey Den Boef , Yevgeniy Konstantinovich Shmarev
IPC分类号： G01N21/00
CPC分类号： G02B27/58 , G01N21/4788 , G03F7/70633
摘要： In a scatterometry apparatus having an illumination aperture stop, a field stop is provided at an intermediate image to control the spot size on the substrate. The field stop may be apodized, e.g. having a transmissivity in the form of a trapezium or a Gaussian shape.
摘要翻译：在具有照明孔径光阑的散射测量装置中，在中间图像处设置场停止件，以控制衬底上的斑点尺寸。野外停止可以变迹，例如具有呈梯形或高斯形状的透射率。

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