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    • 95. 发明授权
    • Array substrate, fabricating method thereof and display device
    • 阵列基板,其制造方法和显示装置
    • US09563301B2
    • 2017-02-07
    • US14348144
    • 2013-07-17
    • BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.BOE TECHNOLOGY GROUP CO., LTD.
    • Jian SunLei WangHailin XueXiaochuan Chen
    • G06F3/041G06F3/044G02F1/1362H01L27/12
    • G06F3/0412G02F1/1362G06F3/044G06F2203/04103H01L27/124H01L27/1262
    • An array substrate, a fabricating method thereof and a display device are provided, and the array substrate comprises: a plurality of gate lines (21), extending in a first direction; a plurality of data lines (22), extending in a second direction and crossed with the plurality of gate lines (21), and the second direction being perpendicular to the first direction; a plurality of pixel units, defined by the gate lines (21) and the data lines (22) crossed with each other and arranged to be a matrix, wherein each pixel unit comprises a pixel electrode (23), a thin film transistor (24) and a common electrode (25), wherein the common electrode (25) comprises a plurality of strip-shaped electrode strips; and at least one first sensing line (26) and at least one second sensing line (27), and the first sensing line (26) and the second sensing line (27) being disposed in an upper layer and a lower layer respectively, the first sensing line (26) being insulated from and parallel to and overlapped with the second sensing line (27), and the first sensing line (26) and the second sensing line (27) both crossed with the electrode strips of the common electrode (25), wherein the upper layer and the lower layer are defined according to a travelling direction of light from a backlight in a depth direction of the array substrate, in the travelling direction of the light from the backlight in the depth direction of the array substrate, the first sensing line (26) is located between a pattern layer where the second sensing line (27) is located and a pattern layer where the common electrode (25) is located, and the second sensing line (27) is electrically connected with the common electrode (25).
    • 提供阵列基板,其制造方法和显示装置,阵列基板包括:沿第一方向延伸的多条栅极线(21) 多个数据线(22),其沿第二方向延伸并与所述多条栅极线(21)交叉,并且所述第二方向垂直于所述第一方向; 由栅极线(21)和数据线(22)限定的多个像素单元彼此交叉并且被布置为矩阵,其中每个像素单元包括像素电极(23),薄膜晶体管(24) )和公共电极(25),其中所述公共电极(25)包括多个条形电极条; 和至少一个第一感测线(26)和至少一个第二感测线(27),并且第一感测线(26)和第二感测线(27)分别设置在上层和下层中, 第一感测线(26)与第二感测线(27)绝缘并与其平行并与其重叠,并且第一感测线(26)和第二感测线(27)都与公共电极的电极条 25),其中根据阵列基板的深度方向上的来自背光源的光的行进方向,在沿着阵列基板的深度方向的背光的光的行进方向上限定上层和下层 ,第一感测线(26)位于第二感测线(27)所在的图案层和公共电极(25)所在的图案层之间,并且第二感测线(27)与 公共电极(25)。