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91. 发明授权

US07564534B2 Alignment system and method 有权
标题翻译：校准系统和方法
公开(公告)号：US07564534B2
公开(公告)日：2009-07-21
申请号：US11987325
申请日：2007-11-29
申请人： Arie Jeffrey Den Boef , Maarten Hoogerland , Boguslaw Gajdeczko
发明人： Arie Jeffrey Den Boef , Maarten Hoogerland , Boguslaw Gajdeczko
IPC分类号： G03B27/42 , G03B27/32 , G01B11/00 , G02B5/04
CPC分类号： G03F9/7088 , G03B27/32 , G03F9/7049 , G03F9/7076 , Y10T428/24802
摘要： An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.
摘要翻译：对准系统使用自参考干涉仪，其产生对准标记物的两个重叠且相对旋转的图像。检测器检测在使图像的傅立叶变换被干扰的光瞳平面中的强度。位置信息是从两个图像的衍射级之间的相位差导出的，其表现为受干扰顺序的强度变化。也可以通过在衍射级的任一侧的两个位置处测量强度来测量不对称性。

92. 发明申请

US20090027691A1 Lithographic Apparatus and Device Manufacturing Method with Reduced Scribe Lane Usage for Substrate Measurement 有权
标题翻译：平版印刷设备和器件制造方法，具有减少的刻痕通道用于基板测量
公开(公告)号：US20090027691A1
公开(公告)日：2009-01-29
申请号：US12141640
申请日：2008-06-18
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Everhardus Cornelis Mos
IPC分类号： G01B11/25 , G03B27/52
CPC分类号： G03F7/70433 , G03F7/70625 , G03F7/70633 , G03F9/7049 , G03F9/7076 , G03F9/708 , G03F9/7084
摘要： In a device manufacturing method and a metrology apparatus, metrology measurements are executed using radiation having a first wavelength. Subsequently a grid of conducting material is applied on the substrate, the grid having grid openings which in a first direction in the plane of the grid are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.
摘要翻译：在装置制造方法和计量装置中，使用具有第一波长的辐射来执行度量测量。随后，将导电材料栅格施加在基板上，栅格具有在栅格平面中的第一方向上的栅格开口小于第一波长。测量目标的划线中的空间现在被屏蔽，并且可以再次用于基板的更多层或处理步骤。

93. 发明授权

US07391513B2 Lithographic apparatus and device manufacturing method using overlay measurement quality indication 有权
标题翻译：平版印刷设备和设备制造方法使用覆盖测量质量指示
公开(公告)号：US07391513B2
公开(公告)日：2008-06-24
申请号：US11391690
申请日：2006-03-29
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Stefan Carolus Jacobus Antonius Keij
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos , Stefan Carolus Jacobus Antonius Keij
IPC分类号： G01B11/00 , G06K9/00
CPC分类号： G03F7/70633 , G03F7/70483
摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes two reference gratings provided in the substrate and two measurement gratings on top of the reference gratings, the measurement gratings being similar to the reference gratings, and oppositely biased in a single direction relative to the respective reference gratings. An overlay measurement device with an image sensor is used for obtaining pixel data of a measurement spot in each of the two measurement gratings. Asymmetry for each pixel in the measurement spot is measured, and from the pixel asymmetry measurements in associated pixels of each of the two measurement gratings an overlay value and a process dependent value is determined, as well as a quality indicator for the overlay value and the process dependent value.
摘要翻译：布置成将图案从图案形成装置转移到基板上的光刻设备包括设置在基板中的两个参考光栅和在参考光栅顶部的两个测量光栅，测量光栅类似于参考光栅，并且相反地偏置在单个相对于各个参考光栅的方向。使用具有图像传感器的覆盖测量装置来获得两个测量光栅中的每一个中的测量点的像素数据。测量测量点中每个像素的不对称性，并且从两个测量光栅中的每一个的相关像素中的像素不对称测量结果确定覆盖值和过程相关值，以及重叠值的质量指示符和过程依赖值。

94. 发明申请

US20080144036A1 Method of measurement, an inspection apparatus and a lithographic apparatus 审中-公开
标题翻译：测量方法，检查装置和光刻设备
公开(公告)号：US20080144036A1
公开(公告)日：2008-06-19
申请号：US11641124
申请日：2006-12-19
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Everhardus Cornelis Mos
IPC分类号： G01N21/47
CPC分类号： G03F7/70633 , H01L22/12
摘要： An inspection system is arranged to measure an overlay error by projecting a plurality of radiation beams, differing in wavelength and/or polarization, onto two targets. A first radiation beam is projected onto a first target and the reflected radiation A1+ is detected. The first target comprises two gratings having a bias +d with respect to each other. The first radiation beam is also projected on to a second target, which comprises two gratings having a bias −d with respect to each other, and the reflected radiation A1− is detected. A second radiation beam, having a different wavelength and/or polarization from the first radiation beam, is projected onto the first target and reflected radiation A2+ is detected and projected onto the second target and reflected radiation A2− is detected. Detected radiations A1+, A1−, A2+, and A2− is used to determine the overlay error.
摘要翻译：检查系统被布置成通过将不同波长和/或极化的多个辐射束投影到两个目标上来测量覆盖误差。第一辐射束被投影到第一目标上，并且检测到反射辐射A 1 +。第一个目标包括两个相对于彼此具有偏压+ d的光栅。第一辐射束也被投影到第二靶上，第二靶被包括相对于彼此具有偏压-d的两个光栅，并且检测到反射的辐射A 1 - 。具有与第一辐射束不同的波长和/或极化的第二辐射束被投影到第一目标上，并且检测并反射辐射A 2 + 2并将其投影到第二目标和反射辐射A 检测到<2> 。检测到的辐射使用1 ，1 ，2 和A 2 - 来确定重叠错误。

95. 发明授权

US07148959B2 Test pattern, inspection method, and device manufacturing method 失效
标题翻译：测试模式，检验方法和器件制造方法
公开(公告)号：US07148959B2
公开(公告)日：2006-12-12
申请号：US10696726
申请日：2003-10-30
申请人： Mircea Dusa , Arie Jeffrey Den Boef
发明人： Mircea Dusa , Arie Jeffrey Den Boef
IPC分类号： G01N21/88
CPC分类号： G03F7/70633 , G03F7/706
摘要： A method according to one embodiment of the invention may be applied to enhance scatterometry measurements made from a two-component test pattern. Reference patterns corresponding to each of the components of the two-component pattern are also printed. Scatterometry signals derived from the reference patterns, corresponding to the separate components of the test pattern, are used to enhance the signal from the test pattern to improve sensitivity and signal-to-noise ratios.
摘要翻译：可以应用根据本发明的一个实施例的方法来增强由双组分测试图案进行的散射测量。还打印与双组分图案的每个组分对应的参考图案。使用与参考图形相对应的散射测量信号，对应于测试图形的单独分量，来增强来自测试图案的信号，以提高灵敏度和信噪比。

96. 发明授权

US09535322B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US09535322B2
公开(公告)日：2017-01-03
申请号：US13579544
申请日：2011-01-11
申请人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
IPC分类号： B29C59/02 , G01B15/00 , G03F7/00 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042
摘要： A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.
摘要翻译：一种在压印光刻设备中确定压印模板的位置的方法。在一个实施例中，该方法包括通过扫描在该区域上的对准辐射束来照射其中期望找到对准标记的压印模板的区域，检测从该区域反射或发射的辐射的强度，以及识别对准通过分析检测到的强度来标记。

97. 发明授权

US09279657B2 Level sensor arrangement in a lithographic apparatus for measuring multi-layer surfaces 有权
标题翻译：用于测量多层表面的光刻设备中的液位传感器布置
公开(公告)号：US09279657B2
公开(公告)日：2016-03-08
申请号：US13569680
申请日：2012-08-08
申请人： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef
发明人： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef
IPC分类号： G01B9/02 , G03F9/00 , G01B11/06
CPC分类号： G01B9/02007 , G01B9/02015 , G01B11/0675 , G03F9/7034
摘要： Disclosed is a method of measuring a position of at least one substantially reflective layer surface on a substrate in a lithographic apparatus, and associated level sensor and lithographic apparatuses. The method comprises performing at least two interferometrical measurements using a broadband light source. Between each measurement, the component wavelengths and/or intensity levels over the component wavelengths of the broadband source beam is varied such that, where it is only the intensity levels that are varied, the intensity variation is different for at least some of the beam's component wavelengths. Alternatively, a single measurement and subsequent processing of the measurement to obtain measurement data whereby the component wavelengths and/or intensity levels over the component wavelengths are different can be applied as well to obtain the position.
摘要翻译：公开了一种测量光刻设备中的基板上的至少一个基本上反射层表面的位置的方法，以及相关联的液位传感器和光刻设备。该方法包括使用宽带光源执行至少两个干涉测量。在每个测量之间，宽带源光束的分量波长上的分量波长和/或强度水平是变化的，使得在仅仅是强度级别变化的情况下，强度变化对于至少一些光束的分量是不同的波长。或者，可以应用测量的单次测量和后续处理以获得测量数据，从而分量波长和/或分量波长上的分量波长和/或强度水平不同，以获得位置。

98. 发明授权

US08889055B2 Imprint lithography method 有权
标题翻译：印刷光刻法
公开(公告)号：US08889055B2
公开(公告)日：2014-11-18
申请号：US12886451
申请日：2010-09-20
申请人： Sander Frederik Wuister , Arie Jeffrey Den Boef
发明人： Sander Frederik Wuister , Arie Jeffrey Den Boef
IPC分类号： B29C35/08 , G03F7/00 , B82Y40/00 , B82Y10/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed that includes bringing an imprint template into contact with imprintable medium provided on a substrate, and directing actinic radiation at the imprintable medium, the actinic radiation being oriented such that it is not perpendicularly incident upon a patterned surface of the imprint template.
摘要翻译：公开了一种压印光刻方法，其包括使压印模板与设置在衬底上的可压印介质接触，以及在可压印介质处引导光化辐射，所述光化辐射被定向成使得其不垂直入射到印记的图案化表面上模板。

99. 发明授权

US08529823B2 Imprint lithography 有权
标题翻译：印刷光刻
公开(公告)号：US08529823B2
公开(公告)日：2013-09-10
申请号：US12891422
申请日：2010-09-27
申请人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
IPC分类号： B28B11/10 , G01B11/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
摘要翻译：公开了一种使用压印模板上的对准光栅和衬底上的对准光栅来确定压印模板和衬底之间的偏移的方法。该方法包括使压印模板对准光栅和衬底对准光栅足够靠近在一起，使得它们形成复合光栅，将复合光栅的对准辐射束引导，同时调制压印模板和衬底的相对位置，检测强度从复合光栅反射的对准辐射，并通过分析检测强度的调制来确定偏移。

100. 发明申请

US20120212718A1 Optical Apparatus, Method of Scanning, Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光学仪器，扫描方法，平版印刷设备和器件制造方法
公开(公告)号：US20120212718A1
公开(公告)日：2012-08-23
申请号：US13351728
申请日：2012-01-17
申请人： Arie Jeffrey Den Boef
发明人： Arie Jeffrey Den Boef
IPC分类号： G03B27/53 , G03F7/20 , G01J1/44 , G02B26/08 , G02B26/10
CPC分类号： G01B11/14 , G01B11/00 , G02B21/0048 , G02B26/105 , G03F7/70625 , G03F9/7088
摘要： An apparatus measures positions of marks on a lithographic substrate. A measurement optical system comprises illumination subsystem for illuminating the mark with a spot of radiation and a detecting subsystem for detecting radiation diffracted by the mark. A tilting mirror moves the spot of radiation relative to the reference frame of the measurement optical system synchronously with a scanning motion of the mark itself, to allow more time for accurate position measurements to be acquired. The mirror tilt axis is arranged along the intersection of the mirror plane with a pupil plane of the objective lens to minimize artifacts of the scanning. The same geometrical arrangement can be used for scanning in other types of apparatus, for example a confocal microscope.
摘要翻译：设备测量光刻基板上的标记位置。测量光学系统包括用于用辐射点照射标记的照明子系统和用于检测由标记衍射的辐射的检测子系统。倾斜镜与标记本身的扫描运动同步地相对于测量光学系统的参考系移动辐射点，以允许更多的时间获得精确的位置测量。反射镜倾斜轴沿着镜面与物镜的光瞳平面的交点排列，以最小化扫描的伪影。可以使用相同的几何布置来在其他类型的装置中进行扫描，例如共聚焦显微镜。

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