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    • 91. 发明授权
    • Field emission light source
    • 场发射光源
    • US07821192B2
    • 2010-10-26
    • US11967113
    • 2007-12-29
    • Chen FengPeng LiuShou-Shan Fan
    • Chen FengPeng LiuShou-Shan Fan
    • H01J17/49
    • H01J63/04H01J2201/30469
    • A field emission light source includes a substrate, a cathode conductive layer, a plurality of electron emitters, a transparent substrate, an anode layer and a fluorescent layer. The cathode conductive layer is formed on the substrate. The electron emitters are disposed on the cathode conductive layer. The transparent substrate is spaced from the cathode conductive layer. The anode layer is formed on the transparent substrate facing the electron emitters and includes a carbon nanotube film structure having carbon nanotubes arranged in a preferred orientation. The fluorescent layer is formed on the anode layer facing the electron emitters.
    • 场发射光源包括衬底,阴极导电层,多个电子发射体,透明衬底,阳极层和荧光层。 阴极导电层形成在基板上。 电子发射体设置在阴极导电层上。 透明基板与阴极导电层间隔开。 阳极层形成在面向电子发射体的透明基板上,并且包括具有以优选取向排列的碳纳米管的碳纳米管膜结构。 荧光层形成在面向电子发射体的阳极层上。
    • 93. 发明授权
    • Field emission lamp and method for making the same
    • 场致发射灯及其制作方法
    • US07800293B2
    • 2010-09-21
    • US11603640
    • 2006-11-21
    • Li QianLiang LiuPeng LiuJie TangYang WeiShou-Shan Fan
    • Li QianLiang LiuPeng LiuJie TangYang WeiShou-Shan Fan
    • H01J1/62
    • H01J63/06H01J7/18H01J9/025H01J63/02
    • A field emission lamp generally includes a tube having at least one open end, at least one sealing member respectively arranged in a corresponding open end of the tube, an anode, and a cathode. The anode includes an anode conductive layer formed on an inner surface of the tube, a fluorescent layer formed on the anode conductive layer, and at least one anode electrode electrically connected with the anode conductive layer and extending out of the at least one sealing member. The cathode includes an electron emission element and at least one cathode electrode electrically connected with the electron emission element and extending out of the at least one sealing member. The electron emission element has an electron emission layer. The electron emission layer includes getter powders therein to exhaust unwanted gas in the field emission lamp, thereby ensuring the field emission lamp with a high degree of vacuum during operation thereof. A method for making such field emission lamp is also provided.
    • 场致发射灯通常包括具有至少一个开口端的管,分别布置在管的相应开口端中的至少一个密封构件,阳极和阴极。 阳极包括形成在管的内表面上的阳极导电层,形成在阳极导电层上的荧光层,以及与阳极导电层电连接并延伸出至少一个密封构件的至少一个阳极电极。 阴极包括电子发射元件和与电子发射元件电连接并延伸出至少一个密封构件的至少一个阴极电极。 电子发射元件具有电子发射层。 电子发射层包括其中的吸气剂粉末以排放场致发射灯中的不需要的气体,从而确保在其操作期间具有高真空度的场致发射灯。 还提供了制造这种场致发射灯的方法。
    • 96. 发明申请
    • Thermionic emission device
    • 热电子发射装置
    • US20100039015A1
    • 2010-02-18
    • US12288996
    • 2008-10-23
    • Peng LiuLiang LiuKai-Li JiangShou-Shan Fan
    • Peng LiuLiang LiuKai-Li JiangShou-Shan Fan
    • H01J1/46
    • H01J1/14H01J2201/19H01J2201/30469
    • A thermionic emission device includes an insulating substrate, and one or more grids located thereon. Each grid includes a first, second, third and fourth electrode down-leads located on the periphery thereof, and a thermionic electron emission unit therein. The first and second electrode down-leads are parallel to each other. The third and fourth electrode down-leads are parallel to each other. The first and second electrode down-leads are insulated from the third and fourth electrode down-leads. The thermionic electron emission unit includes a first electrode, a second electrode, and a thermionic electron emitter. The first electrode and the second electrode are separately located and electrically connected to the first electrode down-lead and the third electrode down-lead respectively. The thermionic electron emitter includes at least one carbon nanotube wire.
    • 热电子发射装置包括绝缘基板和位于其上的一个或多个网格。 每个栅格包括位于其周边上的第一,第二,第三和第四电极下引线及其中的热离子电子发射单元。 第一和第二电极下引线彼此平行。 第三和第四电极下引线彼此平行。 第一和第二电极下引线与第三和第四电极下引线绝缘。 热电子发射单元包括第一电极,第二电极和热离子电子发射体。 第一电极和第二电极分别位于第一电极下引线和第三电极引线下电连接。 热离子电子发射体包括至少一个碳纳米管线。
    • 97. 发明申请
    • CHARACTER AUTO-COMPLETION FOR ONLINE EAST ASIAN HANDWRITING INPUT
    • 在线东亚手写输入的字符自动完成
    • US20090324082A1
    • 2009-12-31
    • US12146874
    • 2008-06-26
    • Peng LiuLei MaFrank Kao-Ping Soong
    • Peng LiuLei MaFrank Kao-Ping Soong
    • G06K9/18G06F3/033
    • G06F3/018G06K9/00416G06K9/00429
    • An exemplary method includes receiving stroke information for a partially written East Asian character, the East Asian character representable by one or more radicals; based on the stroke information, selecting a radical on a prefix tree wherein the prefix tree branches to East Asian characters as end states; identifying one or more East Asian characters as end states that correspond to the selected radical for the partially written East Asian character; and receiving user input to verify that one of the identified one or more East Asian characters is the end state for the partially written East Asian character. In such a method, the selection of a radical can occur using radical-based hidden Markov models. Various other exemplary methods, devices, systems, etc., are also disclosed.
    • 一种示例性的方法包括接收部分书写的东亚字符的笔画信息,东亚字符可由一个或多个基团表示; 基于笔画信息,在前缀树上以东亚字符分支为前缀树的前缀树选择基数; 将一个或多个东亚字符识别为对应于部分写入的东亚人物的所选激进的终端状态; 并接收用户输入以验证所识别的一个或多个东亚字符中的一个是部分写入的东亚字符的结束状态。 在这种方法中,可以使用基于激进的隐马尔可夫模型来进行激进的选择。 还公开了各种其它示例性方法,装置,系统等。
    • 99. 发明申请
    • LENS HEATING COMPENSATION SYSTEMS AND METHODS
    • 透镜加热补偿系统及方法
    • US20090296055A1
    • 2009-12-03
    • US12475071
    • 2009-05-29
    • Jun YePeng LiuYu Cao
    • Jun YePeng LiuYu Cao
    • G03B27/52
    • G03F7/70441G03F7/70266G03F7/705G03F7/70533G03F7/706G03F7/70891G06F17/50
    • Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the process window is optimized using the manipulator model. Aberrations are characterized by identifying variations in critical dimensions caused by lens manipulation for a plurality of manipulator settings and by modeling behavior of the manipulator as a relationship between manipulator settings and aberrations. The process window may be optimized by minimizing a cost function for a set of critical locations.
    • 公开了用于校准光刻系统的方法。 生成用于掩模版设计的冷透镜轮廓和用于掩模版设计的至少一个热透镜轮廓,由此定义处理窗口。 由透镜操纵器诱导的畸变在机械手模型中表征,并且使用机械手模型优化过程窗口。 像差的特征在于识别由多个操纵器设置的透镜操纵引起的关键尺寸的变化,以及通过将操纵器的行为建模为机械手设置和像差之间的关系。 可以通过最小化一组关键位置的成本函数来优化过程窗口。