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    • 99. 发明申请
    • INTERSPINOUS PROCESS SPACERS
    • INTERSPINOUS过程间隔
    • US20080255669A1
    • 2008-10-16
    • US12100488
    • 2008-04-10
    • T. Wade FALLINJoshua A. BUTTERSGreta Jo HAYS
    • T. Wade FALLINJoshua A. BUTTERSGreta Jo HAYS
    • A61F2/44A61B17/58
    • A61B17/7065
    • Interspinous implants including a spacer configured to fit between first and second adjacent spinous processes of a human spine, to maintain a minimum separation between the spinous processes. An implant also includes a fixation portion coupled to the spacer, in which the fixation portion engages at least one spinous process to hold the spacer in a stable position relative to the spinous process. An implant may be monolithic, non-fillable, and may be inserted between the spinous process from a lateral approach. The fixation portion may be configured as a bracket which can substantially encircle the spinous process, or as flanges which engage lateral sides of the spinous process(es). The spacer may be resilient, and may be expandable along the anterior/posterior direction between the spinous processes. An implant may provide resilient resistance during extension, and/or a uniform extension stop between the spinous processes.
    • 椎间植入物包括构造成适合人脊柱的第一和第二相邻棘突之间的间隔物,以保持棘突之间的最小间隔。 植入物还包括联接到间隔件的固定部分,其中固定部分接合至少一个棘突以将间隔件相对于棘突保持在稳定的位置。 植入物可以是整体的,不可填充的,并且可以从侧向进入插入在棘突之间。 固定部分可以被构造为可以基本上环绕棘突的支架,或者作为与棘突的侧面接合的凸缘。 间隔件可以是弹性的,并且可以沿棘突之间的前/后方向扩展。 植入物可以在延伸期间提供弹性阻力,和/或棘突之间的均匀延伸止挡。