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    • 95. 发明申请
    • System And Method For Implementing A Partial-Blocking Consistency Point In A Database
    • 在数据库中实现部分阻塞一致性点的系统和方法
    • US20080005191A1
    • 2008-01-03
    • US11427203
    • 2006-06-28
    • Scott David LashleyJohn Frederic MillerClarence Madison PruetDaniel Alan Wood
    • Scott David LashleyJohn Frederic MillerClarence Madison PruetDaniel Alan Wood
    • G06F17/30
    • G06F17/30306Y10S707/99942Y10S707/99954
    • A partial-blocking consistency point system identifies transaction updates with a consistency point ID associated with a consistency point sequence number, records consistency point data that identify a location of the partial-blocking consistency point, flushes to a non-volatile storage the transaction updates identified with the consistency point sequence number without blocking transaction activity, and hardens to the non-volatile storage the recorded partial-blocking consistency point so that data associated with the recorded partial-blocking consistency point can be recovered. The consistency point sequence number is incremented each time the partial-blocking consistency point is recorded to uniquely identify the partial-blocking consistency point and transaction updates associated with the partial-blocking consistency point. The transaction updates identified with the consistency point sequence number are processed to improve efficiency of the flushing of the transaction updates.
    • 部分阻塞一致性点系统使用与一致性点序列号相关联的一致性点ID来识别事务更新,记录标识部分阻塞一致性点的位置的一致性点数据,刷新事件更新识别的非易失性存储 具有一致性点序列号而不阻塞事务活动,并且硬化到非易失性存储器记录的部分阻塞一致性点,使得可以恢复与记录的部分阻塞一致性点相关联的数据。 每次记录部分阻塞一致性点时,一致性点序列号增加,以唯一地标识部分阻塞一致性点和与部分阻塞一致性点相关联的事务更新。 处理以一致性点序列号标识的事务更新,以提高事务更新刷新的效率。
    • 99. 发明申请
    • Methods of forming through-wafer interconnects and structures resulting therefrom
    • 形成贯穿晶片互连和由此产生的结构的方法
    • US20070032061A1
    • 2007-02-08
    • US11198338
    • 2005-08-05
    • Warren FarnworthAlan Wood
    • Warren FarnworthAlan Wood
    • H01L21/44
    • H01L21/76898B33Y80/00H01L23/481H01L2924/0002H01L2924/09701H01L2924/12044H01L2924/00
    • Methods for forming conductive vias or through-wafer interconnects in semiconductor substrates and resulting through wafer interconnect structures are disclosed. In one embodiment of the present invention, a method of forming a through wafer interconnect structure includes the acts of forming an aperture in a first surface of a substrate, depositing a first insulative or dielectric layer on an inner surface of the aperture, depositing an electrically conductive layer over the first dielectric layer, depositing a second insulative or dielectric layer on the inner surface of the aperture over the electrically conductive material, and exposing a portion of the electrically conductive layer through the second, opposing surface of the substrate. Semiconductor devices including through-wafer interconnects produced with the methods of the instant invention are also described.
    • 公开了用于在半导体衬底中形成导电通孔或贯穿晶片互连以及通过晶片互连结构形成的方法。 在本发明的一个实施例中,形成贯穿晶片互连结构的方法包括在衬底的第一表面中形成孔的动作,在孔的内表面上沉积第一绝缘或电介质层, 导电层,在所述导电材料的所述孔的内表面上沉积第二绝缘或电介质层,以及将所述导电层的一部分暴露于所述衬底的所述第二相对表面。 还描述了包括用本发明的方法生产的晶片间互连的半导体器件。