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    • 96. 发明公开
    • 임시기판을 사용하여 태양전지 호일을 제조하는 프로세스
    • 使用临时基板制造太阳能电池的方法
    • KR1020060063899A
    • 2006-06-12
    • KR1020067001292
    • 2004-07-16
    • 아크조 노벨 엔.브이.
    • 두벨담게리트코르넬리스
    • H01L31/042H01L31/18
    • H01L31/1896H01L31/0392H01L31/03923H01L31/03925H01L31/046H01L31/0465Y02E10/541Y02P70/521
    • The invention pertains to a process for manufacturing a solar cell foil comprising the steps of: providing an etchable temporary substrate, applying a front electrode of a transparent conductive oxide (TCO) onto the temporary substrate, applying a photovoltaic layer onto the TCO layer, applying a back electrode layer, applying a permanent carrier, ensuring that the front electrode and the back electrode are electrically connected in an interconnect to establish a series connection, the front and the back electrode each being interrupted by front and back groove, respectively, at different sides of the interconnect, in any one of the preceding steps providing an etch resist on the non-TCO side of the temporary substrate at least at the location of the interconnect, and at least not at the entire location of the front groove, selectively removing the temporary substrate where it is not covered with etch resist. The process of the invention provides a cap of a protective material on the interconnect, leading to a solar cell foil with improved properties.
    • 本发明涉及太阳能电池箔的制造方法,包括以下步骤:提供可蚀刻的临时衬底,将透明导电氧化物(TCO)的前电极施加到临时衬底上,将光伏层施加到TCO层上,施加 背电极层,施加永久载体,确保前电极和后电极在互连中电连接以建立串联连接,前电极和后电极分别由前槽和后槽分别在不同的 在前述步骤中的任一个步骤中,至少在互连的位置处,至少在前槽的整个位置处,在临时衬底的非TCO侧提供抗蚀剂,选择性地去除 临时衬底,其中没有被抗蚀剂覆盖。 本发明的方法在互连上提供保护材料的盖,导致具有改进性能的太阳能电池箔。
    • 99. 发明公开
    • 지방 니트릴용 정제/탈색 처리 방법
    • 脂肪硝酸盐的净化/去除处理
    • KR1020050086560A
    • 2005-08-30
    • KR1020057008473
    • 2003-11-13
    • 아크조 노벨 엔.브이.
    • 텔스코우제프리얼
    • C07C253/34
    • C07C253/34C07C255/03C07C255/07
    • The present invention contemplates a process for the removal of impurities comprising amides, but which may include other impurities such as amines, from a solution of the nitrites and impurities. A reaction mixture is first formed and to that reaction mixture, 0.5 to 3wt% of approximately 60% H2SO4 is stirred in at room temperature and atmospheric pressure for a time effective for the removal of the amide impurities. Typically, after about 30 minutes, the amide impurity is removed into the lower, dark acid layer, probably as a salt. The remaining nitrile, after decantation or filtration, is still colored but is substantially free of amide. In a to second step, at room temperature or at a temperature of up to ~80°C, color can be removed from the nitrile by stirring the acid-washed nitrile with 0.5-5 wt% of clay (bentonite), charcoal, zeolitic type materials, mixtures thereof and the like.
    • 本发明涉及从亚硝酸盐和杂质的溶液中除去包含酰胺,但可以包括其它杂质如胺的杂质的方法。 首先形成反应混合物,并在该反应混合物中,将0.5至3重量%的约60%H 2 SO 4在室温和大气压下搅拌一段时间以有效除去酰胺杂质。 通常,约30分钟后,酰胺杂质被除去到较暗的暗酸层中,可能是盐。 在滗析或过滤后,剩余的腈仍然是有色的,但基本上不含酰胺。 在第二步中,在室温或高达〜80℃的温度下,通过搅拌含0.5-5重量%的粘土(膨润土),炭,沸石的酸洗腈,可以从腈中除去颜色 型材料,其混合物等。