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    • 2. 发明申请
    • Resist removing apparatus and method of removing resist
    • 抗蚀剂去除装置和去除抗蚀剂的方法
    • US20050241673A1
    • 2005-11-03
    • US10510245
    • 2003-04-15
    • Tamio EndoAtsushi SatoYasuhiko AmanoTetsuji Tamura
    • Tamio EndoAtsushi SatoYasuhiko AmanoTetsuji Tamura
    • G03F7/42H01L21/027H01L21/304H01L21/306H01L21/311C25F1/00B08B1/02B08B3/00B08B6/00C25F3/30C25F5/00
    • G03F7/423H01L21/02052H01L21/31133
    • In a resist removing apparatus of the present invention, a distance between a surface of a substrate (10) and an ultraviolet rays transmission plate (3) is adjusted to a predetermined distance by an upward and downward moving mechanism (2b) of a substrate stage (2), and O3 water is supplied from an O3 water supply section (12) to a treatment space formed between the surface of the substrate (10) and the ultraviolet ray transmission plate (3) to form a liquid film (41). Various kinds of active oxygen are generated by emitting ultraviolet rays of wavelengths of 172 nm to 310 nm to the liquid film (41) by an ultraviolet lamp, and dissolving O3, and thereby the resist is dissolved and removed. This construction makes it possible to form the liquid film on the resist and dissolve and remove the resist by using the active oxygen generated in the liquid film, and achieve a breakaway from the resources and energy-intensive technique, namely, realization of an environmentally compatible technique which does not depend on high energy and chemical solvents for removing a resist.
    • 在本发明的抗蚀剂除去装置中,通过基板的上下移动机构(2b)将基板(10)的表面与紫外线透射板(3)之间的距离调整为规定的距离, 阶段(2)和O 3 3水从O 3 3供水部分(12)供应到形成在基板(10)的表面和 紫外线透射板(3)形成液膜(41)。 通过用紫外线灯向液膜(41)发射波长为172nm〜310nm的紫外线,溶解O 3 3,从而使抗蚀剂溶解,生成各种活性氧, 删除。 这种结构使得可以在抗蚀剂上形成液膜并通过使用在液膜中产生的活性氧来溶解并去除抗蚀剂,并实现与资源和能源密集型技术的分离,即实现环境兼容 不依赖于高能量和化学溶剂去除抗蚀剂的技术。