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1. 发明申请

US20100167394A1 ULTRAMARINE FLUORESCENT PROTEIN 审中-公开
标题翻译：超紫外线荧光蛋白
公开(公告)号：US20100167394A1
公开(公告)日：2010-07-01
申请号：US12453000
申请日：2008-08-01
申请人： Takeharu Nagai , Wataru Tomosugi , Tomoki Matsuda
发明人： Takeharu Nagai , Wataru Tomosugi , Tomoki Matsuda
IPC分类号： C12N5/10 , C07K14/00 , C07H21/00 , C12N15/74
CPC分类号： C07K14/43595 , C07K2319/60
摘要： The present invention provides an artificial mutant of GFP having a novel emission peak, i.e., a fluorescent protein having an emission peak at 424 nm comprising an amino acid sequence represented by SEQ ID NO: 1, in which each of the amino acid residues at the 66th position and the 175th position is replaced and at least one of the amino acid residues at the 72nd position and the 206th position is further replaced, or a fluorescent protein having an emission peak at 424 nm and a pH-independent fluorescence intensity, in which each of the amino acid residues at the 65th, 145th, 148th, 46th and/or 203rd positions is further substituted. The fluorescent protein of the invention emits fluorescence having an emission peak at 424 nm and can be visually distinguished by its ultramarine color from other fluorescent proteins. The fluorescent protein has a pH-independent fluorescence intensity which is not affected by pH changes.
摘要翻译：本发明提供具有新发射峰的GFP的人工突变体，即在424nm处具有发射峰的荧光蛋白，其包含由SEQ ID NO：1表示的氨基酸序列，其中每个氨基酸残基第66位和第175位被置换，第72位和第206位的氨基酸残基中的至少一个被进一步置换，或者在424nm具有发射峰和不依赖于pH的荧光强度的荧光蛋白，其中第65，第145，第148，第46和/或第203位的每个氨基酸残基被进一步取代。本发明的荧光蛋白发射具有424nm处的发射峰的荧光，并且可以通过其来自其他荧光蛋白的群青颜色来目视辨别荧光。荧光蛋白具有pH不依赖于荧光强度，不受pH变化的影响。

2. 发明授权

US08841060B2 Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device 有权
标题翻译：光敏感或辐射敏感性树脂组合物，抗蚀剂膜和图案形成方法各自使用组合物，电子器件的制备方法和电子器件
公开(公告)号：US08841060B2
公开(公告)日：2014-09-23
申请号：US13537843
申请日：2012-06-29
申请人： Shohei Kataoka , Yusuke Iizuka , Akinori Shibuya , Tomoki Matsuda , Naohiro Tango
发明人： Shohei Kataoka , Yusuke Iizuka , Akinori Shibuya , Tomoki Matsuda , Naohiro Tango
IPC分类号： G03F7/004 , G03F7/20 , G03F7/11 , G03F7/039
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0397 , G03F7/11 , Y10S430/106 , Y10S430/114 , Y10S430/128 , Y10T428/24802
摘要： An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided.The actinic-ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having repeating units having a structure represented by any one of the following general formulae (I-1) to (I-3), and repeating units containing at least one selected from the group consisting of a lactone structure, a sultone structure, and a cyano group; and (B) a compound that generates an acid by irradiation with actinic rays or radiations.
摘要翻译：能够改善线边缘粗糙度（LER）并抑制图案塌陷的光化射线敏感性或辐射敏感性树脂组合物，抗蚀剂膜和各自使用它们的图案形成方法，制备电子器件的方法和提供电子设备。光化射线敏感性或辐射敏感性树脂组合物含有：（A）具有由以下通式（I-1）至（I-3）中任一个表示的结构的重复单元的树脂和含选自内酯结构，磺内酯结构和氰基中的至少一种; 和（B）通过用光化射线或辐射照射产生酸的化合物。

3. 发明授权

US08951890B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其中的光化射线或辐射敏感膜，以及使用组合物形成图案的方法
公开(公告)号：US08951890B2
公开(公告)日：2015-02-10
申请号：US13637825
申请日：2011-12-22
申请人： Kei Yamamoto , Mitsuhiro Fujita , Tomoki Matsuda
发明人： Kei Yamamoto , Mitsuhiro Fujita , Tomoki Matsuda
IPC分类号： H01L21/301 , H01L23/58 , G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) an onium salt containing a nitrogen atom in its cation moiety, which onium salt when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, and (C) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of compounds of general formulae (1-1) and (1-2) below.
摘要翻译：本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，（B）含有氮原子的鎓盐其阳离子部分，其暴露于光化射线或辐射时的鎓盐被分解，从而产生酸，和（C）当暴露于光化射线或辐射时产生酸的化合物，该化合物是任何一般化合物下式（1-1）和（1-2）。

4. 发明申请

US20130015562A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权
标题翻译：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性膜及其使用组合物形成图案的方法
公开(公告)号：US20130015562A1
公开(公告)日：2013-01-17
申请号：US13637825
申请日：2011-12-22
申请人： Kei Yamamoto , Mitsuhiro Fujita , Tomoki Matsuda
发明人： Kei Yamamoto , Mitsuhiro Fujita , Tomoki Matsuda
IPC分类号： G03F7/027 , G03F7/20 , H01L29/02 , G03F7/075
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) an onium salt containing a nitrogen atom in its cation moiety, which onium salt when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, and (C) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of compounds of general formulae (1-1) and (1-2) below.
摘要翻译：本发明提供一种光化学射线或辐射敏感性树脂组合物，其包含（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，（B）含有氮原子的鎓盐其阳离子部分，其暴露于光化射线或辐射时的鎓盐被分解，从而产生酸，和（C）当暴露于光化射线或辐射时产生酸的化合物，该化合物是任何一般化合物下式（1-1）和（1-2）。

5. 发明授权

US09316911B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其中的光化射线或辐射敏感膜，以及使用组合物形成图案的方法
公开(公告)号：US09316911B2
公开(公告)日：2016-04-19
申请号：US13538246
申请日：2012-06-29
申请人： Tomoki Matsuda , Yoko Tokugawa , Akinori Shibuya
发明人： Tomoki Matsuda , Yoko Tokugawa , Akinori Shibuya
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041 , Y10T428/24802
摘要： An actinic-ray- or radiation-sensitive resin composition according to the present invention includes (A) a resin to be decomposed to increase its solubility in an alkali developer when acted on by an acid, and (B) a compound represented by the general formula (1-1) below.
摘要翻译：根据本发明的光化射线或辐射敏感性树脂组合物包括（A）待酸分解时增加其在碱显影剂中的溶解度的树脂，和（B）由通式公式（1-1）。

6. 发明授权

US09081277B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其中的光化射线或辐射敏感膜，以及使用组合物形成图案的方法
公开(公告)号：US09081277B2
公开(公告)日：2015-07-14
申请号：US13520106
申请日：2011-12-22
申请人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
发明人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
IPC分类号： G03F7/004 , C07C381/12 , G03F7/039 , G03F7/20 , G03F7/11
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
摘要翻译：提供了在灵敏度，粗糙度特性和曝光宽容度方面优异的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。组合物包括（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，和（B）当暴露于光化射线或辐射时被分解从而产生酸的化合物该化合物是下述通式（1-1）的化合物中的任何一种。

7. 发明申请

US20120273924A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权
标题翻译：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性膜及其使用组合物形成图案的方法
公开(公告)号：US20120273924A1
公开(公告)日：2012-11-01
申请号：US13520106
申请日：2011-12-22
申请人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
发明人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
IPC分类号： G03F7/027 , H01L21/311 , H01L29/02 , G03F7/20
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
摘要翻译：提供了在灵敏度，粗糙度特性和曝光宽容度方面优异的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。组合物包括（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，和（B）当暴露于光化射线或辐射时被分解从而产生酸的化合物该化合物是下述通式（1-1）的化合物中的任何一种。

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