专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US6023405A Electrostatic chuck with improved erosion resistance 失效
标题翻译：具有改善耐腐蚀性能的静电吸盘
公开(公告)号：US6023405A
公开(公告)日：2000-02-08
申请号：US24917
申请日：1998-02-17
申请人： Shamouil Shamouilian , Manoocher Birang , John F. Cameron , Chandra Deshpandey , Alfred Goldspeil , Ron Northrup , Semyon Shertinsky , Sasson Somekh
发明人： Shamouil Shamouilian , Manoocher Birang , John F. Cameron , Chandra Deshpandey , Alfred Goldspeil , Ron Northrup , Semyon Shertinsky , Sasson Somekh
IPC分类号： B25J15/06 , C23C16/44 , C23C16/455 , C23C16/458 , H01L21/00 , H01L21/302 , H01L21/3065 , H01L21/683 , H02N13/00
CPC分类号： C23C16/45521 , C23C16/4586 , H01L21/67103 , H01L21/6831 , H01L21/6833 , H02N13/00 , Y10T279/23 , Y10T29/49117
摘要： An electrostatic chuck (20) for holding a substrate (45) is described. One version of the chuck (20) suitable for mounting on a base (25), comprises (i) an electrostatic member (33) having an electrode (50) therein, and (ii) an electrical lead (60) extending through the base (25) to electrically engage the electrode (50) of the electrostatic member (33). When the chuck (20) is used to hold a substrate (45) in a process chamber (80) containing erosive process gas, the substrate (45) covers and substantially protects the electrical lead (60) from erosion by the erosive process gas. In a preferred version of the chuck (20), an electrical connector (55) forming an integral extension of the electrode (50), electrically connects the electrode (50) to a voltage supply terminal (70) used to operate the chuck (20). The electrical connector (55) comprises (i) an electrical lead (60) that extends through the base (25), and (ii) an electrical contact (65) on the electrical lead (60), the contact sized sufficiently large to directly contact and electrically engage the voltage supply terminal (70). The electrode (50) of the chuck (20) can comprise first and second electrodes (130), (135) electrically isolated from one another by an electrical isolation void (52), the electrodes sized and configured so that the electrical isolation void (52) can serve as a cooling groove (105) for holding coolant for cooling the substrate (45) held on the chuck (20). Preferably, the two electrode chuck (20) is used in conjunction with a switching system capable of operating the chuck (20) in either a monopolar mode or in a bipolar mode.
摘要翻译：描述了用于保持基板（45）的静电卡盘（20）。适于安装在基座（25）上的卡盘（20）的一个版本包括（i）其中具有电极（50）的静电部件（33）和（ii）延伸穿过底座（25）电连接静电部件（33）的电极（50）。当卡盘（20）用于将基板（45）保持在包含腐蚀性处理气体的处理室（80）中时，基板（45）覆盖并基本上保护电引线（60）免受侵蚀性处理气体的侵蚀。在卡盘（20）的优选形式中，形成电极（50）的整体延伸的电连接器（55）将电极（50）电连接到用于操作卡盘（20）的电压供应端子）。电连接器（55）包括（i）延伸穿过基座（25）的电引线（60）和（ii）电引线（60）上的电触头（65），触头尺寸足够大以直接接触和电接合电压端子（70）。卡盘（20）的电极（50）可以包括通过电隔离空隙（52）彼此电隔离的第一和第二电极（130），电极的尺寸和构造使得电隔离空隙（ 52）可以用作用于保持冷却剂的冷却槽（105），以冷却保持在卡盘（20）上的基板（45）。优选地，两个电极卡盘（20）与能够以单极模式或双极模式操作卡盘（20）的开关系统结合使用。

2. 发明授权

US5822171A Electrostatic chuck with improved erosion resistance 失效
公开(公告)号：US5822171A
公开(公告)日：1998-10-13
申请号：US410449
申请日：1995-03-24
申请人： Shamouil Shamouilian , Manoocher Birang , John F. Cameron , Chandra Deshpandey , Alfred Goldspiel , Ron Northrup , Semyon Shertinsky , Sasson Somekh
发明人： Shamouil Shamouilian , Manoocher Birang , John F. Cameron , Chandra Deshpandey , Alfred Goldspiel , Ron Northrup , Semyon Shertinsky , Sasson Somekh
IPC分类号： B25J15/06 , C23C16/44 , C23C16/455 , C23C16/458 , H01L21/00 , H01L21/302 , H01L21/3065 , H01L21/683 , H02N13/00
CPC分类号： C23C16/45521 , C23C16/4586 , H01L21/67103 , H01L21/6831 , H01L21/6833 , H02N13/00 , Y10T279/23 , Y10T29/49117
摘要： An electrostatic chuck (20) for holding a substrate (45) is described. One version of the chuck (20) suitable for mounting on a base (25), comprises (i) an electrostatic member (33) having an electrode (50) therein, and (ii) an electrical lead (60) extending through the base (25) to electrically engage the electrode (50) of the electrostatic member (33). When the chuck (20) is used to hold a substrate (45) in a process chamber (80) containing erosive process gas, the substrate (45) covers and substantially protects the electrical lead (60) from erosion by the erosive process gas. In a preferred version of the chuck (20), an electrical connector (55) forming an integral extension of the electrode (50), electrically connects the electrode (50) to a voltage supply terminal (70) used to operate the chuck (20). The electrical connector (55) comprises (i) an electrical lead (60) that extends through the base (25), and (ii) an electrical contact (65) on the electrical lead (60), the contact sized sufficiently large to directly contact and electrically engage the voltage supply terminal (70). The electrode (50) of the chuck (20) can comprise first and second electrodes (130), (135) electrically isolated from one another by an electrical isolation void (52), the electrodes sized and configured so that the electrical isolation void (52) can serve as a cooling groove (105) for holding coolant for cooling the substrate (45) held on the chuck (20). Preferably, the two electrode chuck (20) is used in conjunction with a switching system capable of operating the chuck (20) in either a monopolar mode or in a bipolar mode. Erosion resistance of the chuck (20) is further enhanced by a masking gas assembly (115) which directs a masking gas at an exposed portion of the insulator (35), to protect the exposed portion of the insulator (35) from the erosive gas contained in the process chamber (80).

3. 发明授权

US06557248B1 Method of fabricating an electrostatic chuck 失效
标题翻译：制造静电卡盘的方法
公开(公告)号：US06557248B1
公开(公告)日：2003-05-06
申请号：US09087332
申请日：1998-05-29
申请人： Shamouil Shamouilian , Manoocher Birang , John F. Cameron , Chandra Deshpandey , Alfred Goldspeil , Ron Northrup , Semyon Sherstinsky , Sasson Someth
发明人： Shamouil Shamouilian , Manoocher Birang , John F. Cameron , Chandra Deshpandey , Alfred Goldspeil , Ron Northrup , Semyon Sherstinsky , Sasson Someth
IPC分类号： H01R4300
CPC分类号： C23C16/45521 , C23C16/4586 , H01L21/67103 , H01L21/6831 , H01L21/6833 , H02N13/00 , Y10T29/49117 , Y10T279/23
摘要： A method of fabricating an electrostatic member 33 for holding a substrate 45 in a process chamber 80 containing erosive process gas. The method comprises the steps of forming an electrostatic member 33 comprising an insulator or dielectric layer 35 covering an electrically conductive layer, and shaping the electrostatic member 33 to form a dielectric covered electrode and an electrical connector 55 attached to the dielectric covered electrode 50 to conduct charge to the dielectric covered electrode 50.
摘要翻译：一种制造静电部件33的方法，用于将基板45保持在包含腐蚀性处理气体的处理室80中。该方法包括以下步骤：形成包括覆盖导电层的绝缘体或电介质层35的静电部件33，并且使静电部件33成形以形成介电覆盖电极和连接到电介质被覆电极50的电连接器55 充电到介电覆盖电极50。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式