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    • 6. 发明申请
    • BLOCK HEALTH MONITORING USING THRESHOLD VOLTAGE OF DUMMY MEMORY CELLS
    • 基于虚电内存阈值电压的健康监测
    • WO2018048490A1
    • 2018-03-15
    • PCT/US2017/034891
    • 2017-05-28
    • SANDISK TECHNOLOGIES LLC
    • PANG, LiangYU, XuehongDONG, YingdaYANG, Nian Niles
    • G11C16/34G11C7/14G11C16/04G11C11/56
    • Techniques are provided for measuring the endurance of a set of data memory cells by evaluating the threshold voltage (Vth) of associated dummy memory cells. A cell has a high endurance or good data retention if it is able to maintain the charges. However, there can be a variation in the endurance of cells even within a single die. By evaluating the dummy memory cells, an early warning can be obtained of a degradation of the data memory cells. Moreover, there is no interference with the operation of the data memory cells. Based on a number of dummy memory cells which have a Vth below a demarcation voltage, a corrective action is taken such as adjusting read voltages, an initial program voltage and/or an initial erase voltage, or marking the block as being bad and recovering the data.
    • 通过评估关联的虚存储单元的阈值电压(Vth)来提供用于测量一组数据存储单元的耐久性的技术。 如果电池能够维持充电,则电池具有高耐久性或良好的数据保留。 但是,即使在一个模具内,电池的耐久性也可能有所不同。 通过评估伪存储单元,可以获得数据存储单元退化的预警。 而且,不会干扰数据存储单元的操作。 基于具有低于分界电压Vth的虚拟存储器单元的数量,采取诸如调整读取电压,初始编程电压和/或初始擦除电压的校正动作,或者将块标记为坏并且恢复 数据
    • 7. 发明申请
    • NON-VOLATILE MEMORY WITH REDUCED PROGRAM SPEED VARIATION
    • 非易失性存储器,程序速度变化较小
    • WO2018022184A1
    • 2018-02-01
    • PCT/US2017/034888
    • 2017-05-28
    • SANDISK TECHNOLOGIES LLC
    • BARASKAR, AshishPANG, LiangZHANG, YanliMAKALA, RaghuveerDONG, Yingda
    • H01L27/11556H01L27/11582H01L29/788H01L29/792
    • A three-dimensional non-volatile memory is provided with reduced programming variation across word lines. The gate lengths of word lines decrease from the top to the bottom of the memory hole. Increased programming speeds due to a narrow memory hole are offset by a smaller gate length at corresponding positions. A blocking dielectric thickness may also be varied, independently or in combination with a variable word line thickness. The blocking dielectric is formed with a horizontal thickness that is larger at regions adjacent to the lower word line layers and smaller at regions adjacent to the upper word line layers. The larger thickness at the lower word line layers reduces the programming speed in the memory hole for the lower word lines relative to the upper word lines. A variance in programming speed resulting from differences in memory hole diameter may be offset by a corresponding variance in blocking dielectric thickness.
    • 三维非易失性存储器具有跨越字线的减少的编程变化。 字线的栅极长度从记忆孔的顶部到底部逐渐减小。 由于存储空间狭窄,编程速度的提高被相应位置的较小栅极长度所抵消。 阻挡电介质厚度也可以独立地或与可变字线厚度结合地变化。 阻挡电介质形成有水平厚度,该水平厚度在与下字线层相邻的区域处更大并且在与上字线层相邻的区域处更小。 较低字线层的较大厚度降低了较低字线相对于较高字线的存储空间中的编程速度。 由于记忆孔直径的差异导致的编程速度的变化可能被阻挡电介质厚度的相应变化所抵消。