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    • 2. 发明公开
    • LIQUID CRYSTAL DISPLAY PANEL TESTING DEVICE AND TESTING METHOD THEREOF
    • 液晶显示面板测试装置及其测试方法
    • KR20070109357A
    • 2007-11-15
    • KR20060042212
    • 2006-05-11
    • SAMSUNG ELECTRONICS CO LTD
    • KWON YOUNG MINTCHO JONG BOKAHN IN SUPARK JONG MAN
    • G02F1/1345G02F1/13
    • G02F1/1309G02F1/1345G02F2001/136254G09G3/006
    • An apparatus and a method for inspecting a liquid crystal panel are provided to supply a test power signal driving the liquid crystal panel in an anti static-electricity circuit of the liquid crystal panel to prevent a defective inspection due to a defective contact between a liquid crystal panel and an inspection probe. At least one probe(100) includes a plurality of connection pins respectively connected to a gate line, a data line, and a storage voltage supply line connected to an anti static-electricity circuit of a liquid crystal panel. A tape carrier package generates and supplies a test driving signal to the probe. A printed circuit board includes a power unit and a timing controller supplying a power signal and a control signal to the tape carrier package. The power unit supplies a test power signal to the storage voltage supply line.
    • 提供一种用于检查液晶面板的装置和方法,以将驱动液晶面板的测试功率信号提供给液晶面板的防静电电路,以防止由于液晶面板之间的接触不良而造成的缺陷检查 面板和检查探头。 至少一个探针(100)包括分别连接到与液晶面板的防静电电路连接的栅极线,数据线和存储电压供给线的多个连接针。 载带封装产生测试驱动信号并将其提供给探头。 印刷电路板包括电源单元和向磁带载体封装提供电源信号和控制信号的定时控制器。 电源单元向存储电压供应线提供测试电源信号。
    • 3. 发明授权
    • APPARATUS FOR CLEANING WAFER
    • 装置清洁
    • KR100757417B1
    • 2007-09-11
    • KR20060073856
    • 2006-08-04
    • SAMSUNG ELECTRONICS CO LTD
    • PARK MI SEOKKWON YOUNG MINCHO JUNG HYUNHUH NO HYUNSUNG SOON HWAN
    • H01L21/304
    • H01L21/68728H01L21/67051H01L21/67103
    • A wafer cleaning apparatus is provided to minimize a temperature difference of a cleaning solution by using plural heaters, thereby removing a difference of etching rate and obtaining a uniform cleaning effect. A first plate(110) holds a wafer(W), and has a first supply tube for supplying a cleaning solution onto a first surface of the wafer. A second plate(120) has a second supply tube for supplying the cleaning solution onto a second surface of the wafer and a ultrasonic vibrator(124). Plural heaters(128) heat the cleaning solutions provided on the first and the second surfaces of the wafer. The heater is positioned on any one of the first and the second plates.
    • 提供晶片清洗装置,通过使用多个加热器来最小化清洗溶液的温度差,从而消除蚀刻速率的差异并获得均匀的清洁效果。 第一板(110)保持晶片(W),并且具有用于将清洁溶液供应到晶片的第一表面上的第一供应管。 第二板(120)具有用于将清洁溶液供应到晶片的第二表面上的第二供应管和超声波振动器(124)。 多个加热器(128)加热设置在晶片的第一和第二表面上的清洁溶液。 加热器位于第一和第二板中的任何一个上。