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1. 发明授权

US06863937B2 Method of operating an electron beam physical vapor deposition apparatus 失效
标题翻译：操作电子束物理气相沉积装置的方法
公开(公告)号：US06863937B2
公开(公告)日：2005-03-08
申请号：US10299646
申请日：2002-11-19
申请人： Robert William Bruce , Antonio Frank Maricocchi , Christopher Lee Lagemann , John Douglas Evans, Sr. , Keith Humphries Betscher , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
发明人： Robert William Bruce , Antonio Frank Maricocchi , Christopher Lee Lagemann , John Douglas Evans, Sr. , Keith Humphries Betscher , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
IPC分类号： F02C7/00 , C23C14/24 , C23C14/30 , C23C14/52 , C23C14/54 , C23C14/56 , H01J37/305
CPC分类号： C23C14/246 , C23C14/30 , C23C14/52 , C23C14/541 , C23C14/56 , H01J37/3053 , H01J2237/3132
摘要： An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus at coating pressures above 0.010 mbar.
摘要翻译：电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。 EBPVD装置的操作通过包含或适应一种或多种机械和/或工艺改进而得到增强，包括在涂覆压力高于0.010mbar的条件下操作设备时必需或有益的修改。

2. 发明授权

US06946034B1 Electron beam physical vapor deposition apparatus 失效
标题翻译：电子束物理气相沉积装置
公开(公告)号：US06946034B1
公开(公告)日：2005-09-20
申请号：US10643262
申请日：2003-08-19
申请人： Robert William Bruce , Antonio Frank Maricocchi , Christopher Lee Lagemann , John Douglas Evans, Sr. , Keith Humphries Betscher , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
发明人： Robert William Bruce , Antonio Frank Maricocchi , Christopher Lee Lagemann , John Douglas Evans, Sr. , Keith Humphries Betscher , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
IPC分类号： C23C14/00 , C23C14/24 , C23C14/30 , C23C14/52 , C23C14/54 , C23C14/56 , H01J37/305
CPC分类号： C23C14/52 , C23C14/246 , C23C14/30 , C23C14/541 , C23C14/56 , H01J37/3053
摘要： An electron beam physical vapor deposition (EBPVD) apparatus for producing a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber through an aperture in a wall of the chamber and onto a coating material within a coating region defined within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion within the coating chamber of a second chamber that encloses the aperture so as to separate the aperture from the coating region. The second chamber is maintained at a pressure lower than the coating region.
摘要翻译：一种用于在制品上生产涂层材料（例如，陶瓷热障涂层）的电子束物理气相沉积（EBPVD）装置。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。电子束枪将电子束通过腔室的孔中的电子束投射到涂覆室中，并且覆盖在腔室内限定的涂层区域内的涂层材料上，导致涂层材料熔化和蒸发。在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。 EBPVD装置的操作通过包围在包围孔的第二腔室的涂覆室内以便将孔与涂覆区域分开来增强。第二室保持在比涂覆区域低的压力。

3. 发明授权

US06589351B1 Electron beam physical vapor deposition apparatus and crucible therefor 有权
标题翻译：电子束物理气相沉积设备及其坩埚
公开(公告)号：US06589351B1
公开(公告)日：2003-07-08
申请号：US09624808
申请日：2000-07-24
申请人： Robert William Bruce , Antonio Frank Maricocchi , John Douglas Evans, Sr. , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
发明人： Robert William Bruce , Antonio Frank Maricocchi , John Douglas Evans, Sr. , Rudolfo Viguie , David Vincent Rigney , David John Wortman , William Seth Willen
IPC分类号： C23C1600
CPC分类号： C23C14/30 , C23C14/246 , C23C14/56 , C23C14/564
摘要： An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion of a crucible that supports the coating material and is configured to be efficiently cooled so as to reduce the rate at which the process temperature increases within the coating chamber.
摘要翻译：电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。通过包括支撑涂层材料的坩埚来增强EBPVD装置的操作，并且被配置为被有效地冷却，以便降低涂覆室内工艺温度升高的速度。

4. 发明授权

US06503574B1 Method for producing an enhanced thermal barrier coating system 失效
标题翻译：一种增强型热障涂层系统的制造方法
公开(公告)号：US06503574B1
公开(公告)日：2003-01-07
申请号：US08362050
申请日：1994-12-22
申请人： David William Skelly , Bangalore Aswatha Nagaraj , David John Wortman , David Vincent Rigney , Seetha Ramaiah Mannava , Rudolfo Viguie , Robert William Bruce , Warren Arthur Nelson , Curtis Alan Johnson , Bhupendra Kumar Gupta
发明人： David William Skelly , Bangalore Aswatha Nagaraj , David John Wortman , David Vincent Rigney , Seetha Ramaiah Mannava , Rudolfo Viguie , Robert William Bruce , Warren Arthur Nelson , Curtis Alan Johnson , Bhupendra Kumar Gupta
IPC分类号： B32B904
CPC分类号： F01D5/288 , C23C4/02 , Y02T50/67 , Y02T50/671 , Y10T428/12472 , Y10T428/12611 , Y10T428/12618 , Y10T428/12993 , Y10T428/24521 , Y10T428/24545 , Y10T428/24612
摘要： An article having a substrate is protected by a thermal barrier coating system. An interfacial layer contacts the upper surface of the substrate. The interfacial layer may comprise a bond coat only, or a bond coat and an overlay coat. The interfacial layer has on its upper surface a preselected, controllable pattern of three-dimensional features, such as grooves in a parallel array or in two angularly offset arrays. The features are formed by an ablation process using an ultraviolet laser such as an excimer laser. A ceramic thermal barrier coating is deposited over the pattern of features on the upper surface of the interfacial layer.
摘要翻译：具有基底的制品由热障涂层系统保护。界面层接触基板的上表面。界面层可以仅包含粘结层，或者粘合涂层和覆盖层。界面层在其上表面上具有三维特征的预选的可控模式，例如平行排列的凹槽或两个角度偏移的阵列。特征通过使用诸如准分子激光器的紫外激光的消融处理形成。陶瓷热障涂层沉积在界面层上表面上的特征图案上。

5. 发明授权

US5698273A Electron beam physical vapor deposition method 失效
标题翻译：电子束物理气相沉积法
公开(公告)号：US5698273A
公开(公告)日：1997-12-16
申请号：US562484
申请日：1995-11-24
申请人： Farzin Homayoun Azad , David William Skelly , David Vincent Rigney
发明人： Farzin Homayoun Azad , David William Skelly , David Vincent Rigney
IPC分类号： C23C14/30 , B05D3/06
CPC分类号： C23C14/30
摘要： A method is disclosed for operating an electron beam physical vapor deposition apparatus including a vacuum chamber containing an ingot disposed in a crucible, a workpiece disposed above the ingot, and an electron gun for emitting an electron beam to melt and vaporize the ingot to disperse vapors for deposition coating of the workpiece. The method includes directing a primary electron beam with a primary beam focus in a primary scanning pattern across a top surface of the ingot to melt and vaporize the ingot and develop an ingot melt pool floating atop an underlying ingot substrate. A secondary electron beam is superimposed across the ingot top surface in conjunction with the primary electron beam. The secondary electron beam has a secondary beam focus in a secondary scanning pattern to locally and transiently increase vaporization rate of the melt pool.
摘要翻译：公开了一种用于操作电子束物理气相沉积设备的方法，该电子束物理气相沉积设备包括含有设置在坩埚中的铸锭的真空室，设置在铸块上方的工件，以及用于发射电子束以熔化和蒸发铸锭以分散蒸气的电子枪用于工件的沉积涂层。该方法包括将一次电子束以一次扫描图案的方式引导穿过该锭的顶表面，以熔化和蒸发锭，并且开发漂浮在下面的锭基底顶上的晶锭熔池。二次电子束与一次电子束一起叠加在晶锭顶表面上。二次电子束具有二次扫描图案中的二次束聚焦以局部地并且瞬时提高熔池的蒸发速率。

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