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1. 发明授权

US06959224B2 Probability constrained optimization for electrical fabrication control 失效
标题翻译：概率约束优化电气制造控制
公开(公告)号：US06959224B2
公开(公告)日：2005-10-25
申请号：US10335748
申请日：2003-01-02
申请人： Richard P. Good , Gregory A. Cherry , Jin Wang
发明人： Richard P. Good , Gregory A. Cherry , Jin Wang
IPC分类号： G03F7/20 , G05B19/418 , H01L21/66 , G06F19/00
CPC分类号： G03F7/705 , G05B19/41885 , G05B2219/32015 , G05B2219/50129 , H01L22/20 , Y02P90/26
摘要： A method includes defining a model of a process for manufacturing a device, the process including a plurality of steps. A plurality of inline process targets are defined for at least a subset of the process steps. The model relates the inline process targets to a plurality of process output parameters. A first set of probabilistic constraints for the inline process targets is defined. A second set of probabilistic constraints for the process output parameters is defined. An objective function is defined based on the model and the plurality of process output parameters. A trajectory of the process output parameters is determined by optimizing the objective function subject to the first and second sets of probabilistic constraints for each process step to determine values for the inline process targets at each process step, the optimization being iterated after completion of each process step for the remaining process steps.
摘要翻译：一种方法包括定义用于制造设备的过程的模型，该过程包括多个步骤。为进程步骤的至少一个子集定义了多个内联过程目标。该模型将内联过程目标与多个过程输出参数相关联。定义了内联流程目标的第一组概率约束。定义了过程输出参数的第二组概率约束。基于模型和多个过程输出参数定义目标函数。过程输出参数的轨迹通过优化目标函数来确定，该目标函数受制于每个处理步骤的第一和第二组概率约束，以确定每个处理步骤中的内联过程目标的值，优化在每个过程完成之后重复步骤剩下的过程步骤。

2. 发明授权

US07330800B1 Method and apparatus for selecting sites for sampling 有权
标题翻译：用于选择采样点的方法和装置
公开(公告)号：US07330800B1
公开(公告)日：2008-02-12
申请号：US11539800
申请日：2006-10-09
申请人： Richard P. Good , James Broc Stirton
发明人： Richard P. Good , James Broc Stirton
IPC分类号： G01N37/00
CPC分类号： G01R31/2894 , G01R31/31718
摘要： A method includes providing a plurality of sampling rules. Each sampling rule is associated with at least one of a plurality of sites on a workpiece. At least one penalty is assigned to each sampling rule. The penalty is assessed responsive to a previous site selection not satisfying the associated sampling rule. A subset of the sites is selected for subsequent metrology based on the sampling rules and the assessed penalties. At least one characteristic of the workpiece is measured at the selected subset of the sites.
摘要翻译：一种方法包括提供多个采样规则。每个采样规则与工件上的多个位置中的至少一个相关联。每个采样规则至少分配一个罚款。罚款是根据以前的场地选择进行评估，不符合相关抽样规则。基于采样规则和评估的处罚，选择一个子站点用于后续计量。工件的至少一个特征是在所选位置的子集上进行测量。

3. 发明授权

US06985825B1 Method and apparatus for adaptive sampling based on process covariance 失效
标题翻译：基于过程协方差自适应采样的方法和装置
公开(公告)号：US06985825B1
公开(公告)日：2006-01-10
申请号：US10619843
申请日：2003-07-15
申请人： Richard P. Good , Timothy L. Jackson , Brian K. Cusson
发明人： Richard P. Good , Timothy L. Jackson , Brian K. Cusson
IPC分类号： G06F19/00 , G01N37/00
CPC分类号： G05B19/41865 , G05B2219/32199 , G05B2219/37448 , G05B2219/45031 , Y02P90/20 , Y02P90/22
摘要： A method includes processing a plurality of workpieces to form at least one feature on each workpiece. A plurality of characteristics of the feature is measured. A covariance matrix including diagonal and non-diagonal terms for the plurality of characteristics measured is constructed. At least the non-diagonal terms of the covariance matrix are monitored. A sampling plan for measuring the workpieces is determined based on the monitoring. A system includes a plurality of tools, at least one metrology tool, and a sampling controller. The tools are configured to process a plurality of workpieces to form at least one feature on each workpiece. The metrology tool is configured to measure a plurality of characteristics of the feature. The sampling controller is configured to construct a covariance matrix including diagonal and non-diagonal terms for the plurality of characteristics measured, monitor at least the non-diagonal terms of the covariance matrix, and determine a sampling plan for measuring the workpieces based on the monitoring.
摘要翻译：一种方法包括处理多个工件以在每个工件上形成至少一个特征。测量该特征的多个特征。构造了包括所测量的多个特征的对角和非对角项的协方差矩阵。至少监视协方差矩阵的非对角项。基于监测确定用于测量工件的抽样计划。系统包括多个工具，至少一个计量工具和采样控制器。工具被配置为处理多个工件以在每个工件上形成至少一个特征。计量工具被配置为测量特征的多个特征。采样控制器被配置为构建包括测量的多个特征的对角线和非对角项的协方差矩阵，至少监视协方差矩阵的非对角项，并且基于监视来确定用于测量工件的采样计划。

4. 发明授权

US07542880B2 Time weighted moving average filter 有权
标题翻译：时间加权移动平均滤波器
公开(公告)号：US07542880B2
公开(公告)日：2009-06-02
申请号：US11278840
申请日：2006-04-06
申请人： Richard P. Good , Kevin A. Chamness , Uwe Schulze
发明人： Richard P. Good , Kevin A. Chamness , Uwe Schulze
IPC分类号： G06F19/00 , H03F1/26 , H04B15/00 , G01N37/00 , G06F15/00 , G06F17/18 , G06F11/30 , G21C17/00 , G05B13/02 , G06F7/60 , G06F17/10
CPC分类号： G05B19/41865 , G05B13/048 , G05B2219/32053 , G05B2219/37532 , G05B2219/45031 , Y02P90/20
摘要： A method for estimating a state associated with a process includes receiving a state observation associated with the process. The state observation has an associated process time. A weighting factor to discount the state observation is generated based on the process time. A state estimate is generated based on the discounted state observation. A system includes a process tool, a metrology tool, and a process controller. The process tool is operable to perform a process in accordance with an operating recipe. The metrology tool is operable to generate a state observation associated with the process. The process controller is operable to receive the state observation, the state observation having an associated process time, generate a weighting factor to discount the state observation based on the process time, generate a state estimate based on the discounted state observation, and determine at least one parameter of the operating recipe based on the state estimate.
摘要翻译：用于估计与过程相关联的状态的方法包括接收与该过程相关联的状态观察。状态观察具有相关的处理时间。基于处理时间生成打折状态观察的权重因子。基于贴现状态观察来生成状态估计。系统包括处理工具，计量工具和过程控制器。处理工具可操作以根据操作配方执行处理。计量工具可操作以产生与该过程相关联的状态观察。过程控制器可操作以接收状态观察，具有相关联的处理时间的状态观察，基于处理时间生成加权因子以折扣状态观察，基于打折状态观察生成状态估计，并且至少确定基于状态估计的操作配方的一个参数。

5. 发明授权

US08180471B2 Tuning a process controller based on a dynamic sampling rate 有权
标题翻译：基于动态采样率调整过程控制器
公开(公告)号：US08180471B2
公开(公告)日：2012-05-15
申请号：US12472624
申请日：2009-05-27
申请人： Richard P. Good , J. Broc Stirton , Detlef Pabst
发明人： Richard P. Good , J. Broc Stirton , Detlef Pabst
IPC分类号： G06F19/00 , G01N37/00
CPC分类号： G05B19/41875 , G05B2219/32018 , Y02P90/22
摘要： A method for estimating a state of a process implemented by a tool for fabricating workpieces includes collecting metrology data associated with a subset of workpieces processed in the tool. The collecting exhibits an irregular pattern. Metrology data associated with a selected state observation is received for a selected run of the process. A tuning factor for the selected run is determined based on the irregular pattern. The selected state observation is discounted based on the determined tuning factor. A state estimate of the process is determined based on the discounted selected state observation. At least one process tool operable to implement the process is controlled based on the state estimate.
摘要翻译：用于估计由用于制造工件的工具实现的过程的状态的方法包括收集与在工具中处理的工件的子集相关联的度量数据。收集呈现不规则图案。接收与所选状态观察相关联的计量数据，用于选定的进程运行。基于不规则图案确定所选运行的调谐因子。所选择的状态观察基于所确定的调谐因子来折扣。根据打折的状态观察确定过程的状态估计。可操作以实现该过程的至少一个处理工具基于状态估计来控制。

6. 发明申请

US20100305737A1 TUNING A PROCESS CONTROLLER BASED ON A DYNAMIC SAMPLING RATE 有权
标题翻译：基于动态采样率调整过程控制器
公开(公告)号：US20100305737A1
公开(公告)日：2010-12-02
申请号：US12472624
申请日：2009-05-27
申请人： Richard P. Good , J. Broc Stirton , Detlef Pabst
发明人： Richard P. Good , J. Broc Stirton , Detlef Pabst
IPC分类号： G06F17/00
CPC分类号： G05B19/41875 , G05B2219/32018 , Y02P90/22
摘要： A method for estimating a state of a process implemented by a tool for fabricating workpieces includes collecting metrology data associated with a subset of workpieces processed in the tool. The collecting exhibits an irregular pattern. Metrology data associated with a selected state observation is received for a selected run of the process. A tuning factor for the selected run is determined based on the irregular pattern. The selected state observation is discounted based on the determined tuning factor. A state estimate of the process is determined based on the discounted selected state observation. At least one process tool operable to implement the process is controlled based on the state estimate.
摘要翻译：用于估计由用于制造工件的工具实现的过程的状态的方法包括收集与在工具中处理的工件的子集相关联的度量数据。收集呈现不规则图案。接收与所选状态观察相关联的计量数据用于所选择的进程运行。基于不规则图案确定所选运行的调谐因子。所选择的状态观察基于所确定的调谐因子来折扣。根据打折的状态观察确定过程的状态估计。可操作以实现该过程的至少一个处理工具基于状态估计来控制。

7. 发明授权

US07460968B1 Method and apparatus for selecting wafers for sampling 有权
标题翻译：用于选择晶片进行取样的方法和装置
公开(公告)号：US07460968B1
公开(公告)日：2008-12-02
申请号：US11239814
申请日：2005-09-30
申请人： Richard P. Good , Matthew A. Purdy
发明人： Richard P. Good , Matthew A. Purdy
IPC分类号： G06F19/00
CPC分类号： G06Q10/06 , G05B2219/32206 , G05B2219/45031 , Y02P90/22
摘要： The present invention provides a method and apparatus for selecting wafers for sampling. The method includes determining a plurality of sampling rules associated with at least one of a plurality of wafers and selecting at least one wafer for sampling based on the plurality of sampling rules.
摘要翻译：本发明提供一种用于选择用于取样的晶片的方法和装置。该方法包括确定与多个晶片中的至少一个相关联的多个采样规则，并且基于多个采样规则选择至少一个晶片进行采样。

8. 发明授权

US07908109B2 Identifying manufacturing disturbances using preliminary electrical test data 有权
标题翻译：使用初步电气测试数据识别制造干扰
公开(公告)号：US07908109B2
公开(公告)日：2011-03-15
申请号：US12169267
申请日：2008-07-08
申请人： Richard P. Good , Lothar Waetzold , Thomas Depaly
发明人： Richard P. Good , Lothar Waetzold , Thomas Depaly
IPC分类号： G01R31/26 , G06F11/26
CPC分类号： G01R31/2894 , H01L21/67288
摘要： A method includes receiving measured values for a plurality of electrical test parameters associated with integrated circuit devices on at least one wafer measured prior to completion of the wafer. Values of the electrical test parameters are predicted. The measured values are compared to the predicted values to generate residual values associated with the electrical test parameters. At least one performance metric associated with the devices is generated based on the residual values.
摘要翻译：一种方法包括在晶片完成之前测量的至少一个晶片上接收与集成电路器件相关联的多个电测试参数的测量值。预测电气测试参数的值。将测量值与预测值进行比较，以产生与电气测试参数相关联的残余值。基于剩余值生成与设备相关联的至少一个性能度量。

9. 发明申请

US20100010768A1 IDENTIFYING MANUFACTURING DISTURBANCES USING PRELIMINARY ELECTRICAL TEST DATA 有权
标题翻译：使用初步电气测试数据识别制造干扰
公开(公告)号：US20100010768A1
公开(公告)日：2010-01-14
申请号：US12169267
申请日：2008-07-08
申请人： Richard P. Good , Lothar Waetzold , Thomas Depaly
发明人： Richard P. Good , Lothar Waetzold , Thomas Depaly
IPC分类号： G01R31/00
CPC分类号： G01R31/2894 , H01L21/67288
摘要： A method includes receiving measured values for a plurality of electrical test parameters associated with integrated circuit devices on at least one wafer measured prior to completion of the wafer. Values of the electrical test parameters are predicted. The measured values are compared to the predicted values to generate residual values associated with the electrical test parameters. At least one performance metric associated with the devices is generated based on the residual values.
摘要翻译：一种方法包括在晶片完成之前测量的至少一个晶片上接收与集成电路器件相关联的多个电测试参数的测量值。预测电气测试参数的值。将测量值与预测值进行比较，以产生与电气测试参数相关联的残余值。基于剩余值生成与设备相关联的至少一个性能度量。

10. 发明申请

US20080147224A1 Method and Apparatus for Compensating Metrology Data for Site Bias Prior to Filtering 有权
标题翻译：过滤之前用于补偿场地偏差的计量数据的方法和装置
公开(公告)号：US20080147224A1
公开(公告)日：2008-06-19
申请号：US11539803
申请日：2006-10-09
申请人： James Broc Stirton , Kevin R. Lensing , Richard P. Good
发明人： James Broc Stirton , Kevin R. Lensing , Richard P. Good
IPC分类号： G06F19/00
CPC分类号： G06Q50/04 , G06Q10/04 , Y02P90/30
摘要： A method includes acquiring metrology data associated with a process. Bias information associated with the process is determined. The metrology data is adjusted based on the bias information to generate bias-adjusted metrology data. The bias-adjusted metrology data is filtered to identify and reject outlier data. The process is controlled based on the metrology data remaining after the rejection of the outlier data.
摘要翻译：一种方法包括获取与过程相关联的度量数据。确定与该过程相关的偏差信息。基于偏差信息调整计量数据，以产生偏差调整的度量数据。偏差调整后的测量数据被过滤以识别和排除异常值数据。该过程基于在排除异常值数据之后剩余的测量数据进行控制。

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