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1. 发明授权

US08587180B2 Pressure control valve driving circuit for pressure type flow rate control device with flow rate self-diagnosis function 有权
标题翻译：压力式流量控制装置的压力控制阀驱动电路具有流量自我诊断功能
公开(公告)号：US08587180B2
公开(公告)日：2013-11-19
申请号：US12989614
申请日：2009-02-18
申请人： Katsuyuki Sugita , Nobukazu Ikeda , Kouji Nishino , Ryousuke Dohi , Kaoru Hirata , Takatoshi Nakatani
发明人： Katsuyuki Sugita , Nobukazu Ikeda , Kouji Nishino , Ryousuke Dohi , Kaoru Hirata , Takatoshi Nakatani
IPC分类号： H01L41/09
CPC分类号： G05D7/0635 , Y10T137/7762
摘要： A pressure control valve piezoelectric element driving circuit is provided for a pressure type flow rate control device provided with a flow rate self-diagnosis function for comparing initial pressure drop characteristics data measured and with pressure drop characteristics data in a flow rate diagnosis which are measured under conditions that are the same for both measurements to detect malfunction in flow rate control from a difference between both characteristics data, wherein a first discharge circuit slowly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a step-down command signal from a CPU, through a step-down command circuit to step down the voltage, and a second discharge circuit that rapidly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a high-speed step-down command signal from the CPU, through a high-speed step-down command circuit to step down the voltage.
摘要翻译：为压力式流量控制装置设置压力式流量控制装置，该压力式流量控制装置具有用于比较测定的初始压降特性数据和流量诊断中的压降特性数据的流量自我诊断功能，两个测量结果相同的条件是根据两个特性数据之间的差异来检测流量控制的故障，其中第一放电电路根据来自一个压电元件的降压命令信号缓慢放电施加到压电元件的压电元件驱动电压 CPU通过降压指令电路降低电压，以及第二放电电路，其根据来自CPU的高速降压命令信号快速放电施加到压电元件的压电元件的驱动电压，通过高速降压指令电路降压。

2. 发明申请

US20120273061A1 Piezoelectrically Driven Valve and Piezoelectrically Driven Flow Rate Control Device 有权
标题翻译：压电驱动阀和压电驱动流量控制装置
公开(公告)号：US20120273061A1
公开(公告)日：2012-11-01
申请号：US13505620
申请日：2010-11-04
申请人： Atsushi Hidaka , Kaoru Hirata , Masaaki Nagase , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino
发明人： Atsushi Hidaka , Kaoru Hirata , Masaaki Nagase , Nobukazu Ikeda , Ryousuke Dohi , Kouji Nishino
IPC分类号： F16K49/00 , F16K31/02
CPC分类号： F16K31/007 , F16K7/14 , F16K25/005 , G05D7/0629 , Y10T137/6416 , Y10T137/7759 , Y10T137/776 , Y10T137/7761
摘要： A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.
摘要翻译：提供了一种压电驱动阀和压电驱动的流体控制装置，其可以控制流体，即使流体的温度高于压电致动器的工作温度范围。压电驱动阀包括用于打开和关闭流体通道的阀元件，通过利用压电元件的延伸来驱动阀元件的压电致动器，以及将压电致动器提升和支撑远离流体通道的辐射间隔件，以及辐射从在流体通道中流动的流体转移到压电致动器的热量，并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒，其中支撑筒由具有相同材料的材料制成至少在用于容纳辐射间隔物的部分处，与辐射间隔物的热膨胀系数相同。

3. 发明授权

US07654137B2 Corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed 失效
标题翻译：用于流体的耐腐蚀金属制传感器和使用传感器的流体供应装置
公开(公告)号：US07654137B2
公开(公告)日：2010-02-02
申请号：US10598290
申请日：2005-01-13
申请人： Kaoru Hirata , Nobukazu Ikeda , Kouji Nishino , Ryousuke Dohi
发明人： Kaoru Hirata , Nobukazu Ikeda , Kouji Nishino , Ryousuke Dohi
IPC分类号： G01F1/68
CPC分类号： G01L19/0023 , G01F1/6842 , G01F1/6845 , Y10T137/7761
摘要： The present invention provides a corrosion-resistant metal made sensor for fluid and a fluid supply device for which the sensor is employed.More specifically, the corrosion-resistant metal made sensor for fluid is equipped with a corrosion-resistant metal substrate, a mass flow rate sensor part comprising a corrosion resistant metal substrate, a thin film forming a temperature sensor and a heater mounted on the back face side of the fluid contacting surface of the corrosion-resistant metal substrate, and a pressure sensor part comprising a thin film forming a strain sensor element mounted on the back face side of the fluid contacting surface of the corrosion-resistant metal substrate, and the sensor is so constituted that the mass flow rate and pressure of the fluid are measured.
摘要翻译：本发明提供了用于流体的耐腐蚀金属制传感器和使用该传感器的流体供应装置。更具体地说，用于流体的耐腐蚀金属制传感器配备有耐腐蚀金属基板，包含耐腐蚀金属基板的质量流量传感器部件，形成温度传感器的薄膜和安装在背面上的加热器耐压金属基板的流体接触面的一侧，以及包含形成安装在耐腐蚀金属基板的流体接触面的背面侧的应变传感器元件的薄膜的压力传感器部，以及传感器如此构成，即测量流体的质量流量和压力。

4. 发明申请

US20100012026A1 EVAPORATION SUPPLY APPARATUS FOR RAW MATERIAL AND AUTOMATIC PRESSURE REGULATING DEVICE USED THEREWITH 有权
标题翻译：用于原材料和自动压力调节装置的蒸发供应装置
公开(公告)号：US20100012026A1
公开(公告)日：2010-01-21
申请号：US12306904
申请日：2007-06-13
申请人： Kaoru Hirata , Masaaki Nagase , Atsushi Hidaka , Atsushi Matsumoto , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
发明人： Kaoru Hirata , Masaaki Nagase , Atsushi Hidaka , Atsushi Matsumoto , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： C23C16/52 , F16K17/38
CPC分类号： C23C16/4481 , C23C16/52 , G05D16/2013 , Y10T137/7737
摘要： An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.
摘要翻译：用于半导体制造的原料的蒸发供给装置包括：原料汇集在其中的源罐; 流量控制装置，其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路，基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置，以调节十字混合气体G0通过其分配的通道的截面积，以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元，其中将混合气体G0供给到处理室，同时控制源罐内的压力。

5. 发明授权

US09133951B2 Gasket type orifice and pressure type flow rate control apparatus for which the orifice is employed 有权
标题翻译：采用孔口的垫片式孔口和压力型流量控制装置
公开(公告)号：US09133951B2
公开(公告)日：2015-09-15
申请号：US11913271
申请日：2006-05-10
申请人： Tadahiro Ohmi , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda , Masaaki Nagase , Kaoru Hirata , Katsuyuki Sugita , Tsutomu Shinohara , Takashi Hirose , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
发明人： Tadahiro Ohmi , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda , Masaaki Nagase , Kaoru Hirata , Katsuyuki Sugita , Tsutomu Shinohara , Takashi Hirose , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
IPC分类号： F16K27/00 , F16L55/027 , G01F1/36 , G01F15/00 , G05D7/06
CPC分类号： F16K27/003 , F16L55/02718 , G01F1/36 , G01F15/001 , G01F15/005 , G05D7/0635
摘要： An orifice changeable pressure type flow rate control apparatus comprises a valve body of a control valve for a pressure type flow rate control apparatus installed between an inlet side fitting block provided with a coupling part of a fluid supply pipe and an outlet side fitting block provided with a coupling part of a fluid takeout pipe; a fluid inlet side of the valve body and the inlet side fitting block, and a fluid outlet side of the valve body and the outlet side fitting block are detachably and hermitically connected respectively so a flow passage for gases through the control valve is formed; and, a gasket type orifice for a pressure type flow rate control apparatus is removably inserted between a gasket type orifice insertion hole provided on the outlet side of the valve body and a gasket type orifice insertion hole of the outlet side fitting block.
摘要翻译：节流孔可变压力型流量控制装置包括安装在设置有流体供给管的联接部的入口侧配件块和设置有流体供给管的出口侧配件块之间的压力型流量控制装置的控制阀的阀体流体取出管的联接部分; 阀体和入口侧配件块的流体入口侧和阀体和出口侧配件块的流体出口侧分别可拆卸地和隐蔽地连接，从而形成用于通过控制阀的气体的流动通道; 并且用于压力式流量控制装置的垫圈型孔口可移除地插入设置在阀体的出口侧的垫圈型孔插入孔和出口侧配件块的衬垫型孔插入孔之间。

6. 发明授权

US08757197B2 Automatic pressure regulator for flow rate regulator 有权
标题翻译：用于流量调节器的自动压力调节器
公开(公告)号：US08757197B2
公开(公告)日：2014-06-24
申请号：US12996370
申请日：2009-04-06
申请人： Kaoru Hirata , Katsuyuki Sugita , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda
发明人： Kaoru Hirata , Katsuyuki Sugita , Kouji Nishino , Ryousuke Dohi , Nobukazu Ikeda
IPC分类号： F16K31/02
CPC分类号： G05D7/0635 , Y10T137/7761
摘要： The invention prevents overshoot from occurring in flow rate on the output side of a flow rate regulator when output flow rate is changed or the gas type distributed is changed. Thus, an automatic pressure regulator is provided to supply gas pressure to a flow rate regulator that includes a piezoelectric element driving type pressure regulating valve, a control pressure detector provided on the output side of the pressure regulating valve, and a controller to which a detected value P2 of the control pressure detector and a set value Pst for control pressure are input, wherein the controller supplies a control signal to a piezoelectric element driving unit of the pressure regulating valve using a proportional control system to perform valve opening regulation in which the proportional control system of the controller is set to control to bring about a residual deviation in control pressure by disabling an integral action.
摘要翻译：本发明防止了当流量改变或气体分布改变时流量调节器的输出侧的流量发生过冲。因此，提供了一种自动压力调节器，用于向包括压电元件驱动型压力调节阀的流量调节器，设置在压力调节阀的输出侧的控制压力检测器和控制器提供气体压力，输入控制压力检测器的值P2和用于控制压力的设定值Pst，其中控制器使用比例控制系统向压力调节阀的压电元件驱动单元提供控制信号，以执行阀开度调节，其中比例控制器的控制系统设置为通过禁用积分作用来控制控制压力的残留偏差。

7. 发明授权

US08606412B2 Method for detecting malfunction of valve on the downstream side of throttle mechanism of pressure type flow control apparatus 有权
标题翻译：压力式流量控制装置节气门机构下游侧阀门故障检测方法
公开(公告)号：US08606412B2
公开(公告)日：2013-12-10
申请号：US12307554
申请日：2007-06-13
申请人： Masaaki Nagase , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino , Kaoru Hirata , Katsuyuki Sugita , Atsushi Matsumoto
发明人： Masaaki Nagase , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino , Kaoru Hirata , Katsuyuki Sugita , Atsushi Matsumoto
IPC分类号： G05D7/00
CPC分类号： G05D7/0635 , G01F1/36 , G01F15/005 , G01F15/022
摘要： With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe inputted to the pressure type flow control apparatus is changed to detect the magnitude ΔV of change of a flow rate output signal Qo from the pressure type flow control apparatus while the flow rate setting value Qe is changed, so that normal functioning of the releasing operations of the valve on the downstream side of the throttle mechanism is confirmed when the magnitude ΔV of change of the flow rate output signal Qo is above the predetermined value. If the releasing operations are malfunctioning, the magnitude ΔV of changes is found to be below the predetermined value.
摘要翻译：利用压力式流量控制装置，释放节气门机构下游侧的阀，改变输入到压力式流量控制装置的流量设定值Qe，以检测流量输出信号的变化幅度DeltaV 当流量设定值Qe变化时，来自压力式流量控制装置的Qo，使得当流量输出的变化幅度DeltaV被确定时，在节气门机构的下游侧的阀的释放操作的正常功能被确认信号Qo高于预定值。如果释放操作发生故障，则发现变化幅度DeltaV低于预定值。

8. 发明授权

US08555920B2 Flow rate ratio variable type fluid supply apparatus 有权
标题翻译：流量比可变型流体供给装置
公开(公告)号：US08555920B2
公开(公告)日：2013-10-15
申请号：US12303841
申请日：2007-06-13
申请人： Kaoru Hirata , Yohei Sawada , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
发明人： Kaoru Hirata , Yohei Sawada , Ryousuke Dohi , Kouji Nishino , Nobukazu Ikeda
IPC分类号： F17D1/04
CPC分类号： G05D7/0664 , Y10T137/85938 , Y10T137/87314 , Y10T137/87539
摘要： A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q1/Q0 so gas is supplied to a chamber, and a first orifice having opening area S1 is installed on the first flow diverting passage, and the second flow diverting passage is connected to a plurality of branch pipe passages connected in parallel, orifices having opening area installed on the branch passages, and open/close valves installed on all, or some of, the branch passages so gas is diverted to flow diverting passages with flow rate ratio Q1/Q0 equivalent to the ratio of the first orifice and the total opening area S2o of flow passable orifices of the second flow diverting passage by regulating total opening area of the flow passable orifices.
摘要翻译：流量比可变型流体供给装置包括：流量控制系统，其将具有规定流量Q1 / Q0的第一分流管路和第二分流管路的流量Q的气体供给到气室，并且具有开口面积S1的第一孔口安装在第一分流通道上，第二分流通道连接到并联连接的多个支管通道，开口区域安装在分支通道上的开口/ 安装在所有或一些分支通道上的关闭阀，使得气体转向流动转向通道，流量比Q1 / Q0等于第一孔口与第二流量的可流通孔口的总开口面积S2o的比值通过调节流通孔的总开口面积来分流通道。

9. 发明授权

US08191856B2 Piezoelectric element driven metal diaphragm control valve 有权
标题翻译：压电元件驱动金属隔膜控制阀
公开(公告)号：US08191856B2
公开(公告)日：2012-06-05
申请号：US12852220
申请日：2010-08-06
申请人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
发明人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
IPC分类号： F16K31/02
CPC分类号： F16K24/04 , F16K7/14 , F16K31/004 , F16K31/007 , F16K51/02
摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.
摘要翻译：控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长，规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

10. 发明授权

US08181932B2 Normally open type piezoelectric element driven metal diaphragm control valve 有权
标题翻译：常开式压电元件驱动金属隔膜控制阀
公开(公告)号：US08181932B2
公开(公告)日：2012-05-22
申请号：US12161549
申请日：2006-11-13
申请人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
发明人： Atsushi Matsumoto , Kaoru Hirata , Ryousuke Dohi , Nobukazu Ikeda , Kouji Nishino
IPC分类号： F16K31/02
CPC分类号： F16K24/04 , F16K7/14 , F16K31/004 , F16K31/007 , F16K51/02
摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.
摘要翻译：控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长，规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

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