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1. 发明申请

WO2008108253A3 EXPOSING METHOD, EXPOSURE APPARATUS, DEVICE FABRICATING METHOD, AND SUBSTRATE FOR IMMERSION EXPOSURE 审中-公开
标题翻译：曝光方法，曝光装置，装置制造方法和浸没曝光基板
公开(公告)号：WO2008108253A3
公开(公告)日：2008-12-04
申请号：PCT/JP2008053453
申请日：2008-02-21
申请人： NIPPON KOGAKU KK , NAKANO KATSUSHI
发明人： NAKANO KATSUSHI
IPC分类号： G03F7/20
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70866
摘要： In an exposing method which exposes a substrate (P) through a liquid, the pH value of the liquid is adjusted in accordance with a material of a surface layer of the substrate that contacts the liquid (LQ).
摘要翻译：在通过液体露出基板（P）的曝光方法中，根据与液体（LQ）接触的基板的表面层的材料来调节液体的pH值。

2. 发明公开

EP1816671A4 EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND SUBSTRATE 审中-公开
标题翻译：曝光方法，ELEMENTS方法及基板
公开(公告)号：EP1816671A4
公开(公告)日：2010-01-13
申请号：EP05806272
申请日：2005-11-11
申请人： NIPPON KOGAKU KK
发明人： NAKANO KATSUSHI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/2041 , G03F7/70341
摘要： An exposure method for exposing a substrate with exposure light that irradiates the substrate via a liquid, wherein the concentration of an eluted substance in the liquid on the substrate is set so as to satisfy the condition R W - R P ‰ 1.0 × 10 -3 when R P is the transmittance of the liquid containing an eluted substance eluted from the substrate per 1 mm in the optical path direction of the exposure light, and R W is the transmittance of the liquid that does not contain the eluted substance per 1 mm in the optical path direction of the exposure light.

3. 发明公开

EP1814144A4 SUBSTRATE PROCESSING METHOD, EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE 有权
标题翻译：维多利亚州BURICHTUNGSVORRICHTUNG VERFAHREN ZUR BAUELEMENTEHERSTELLUNG
公开(公告)号：EP1814144A4
公开(公告)日：2010-01-06
申请号：EP05805228
申请日：2005-10-25
申请人： NIPPON KOGAKU KK
发明人： NAKANO KATSUSHI , OKUMURA MASAHIKO , SUGIHARA TAROU , MIZUTANI TAKEYUKI , FUJIWARA TOMOHARU
IPC分类号： H01L21/027 , G03F7/20 , G03F7/38
CPC分类号： G03F7/2041 , G03F7/38 , G03F7/70341 , G03F7/70925
摘要： Disclosed is a substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced.
摘要翻译：公开了一种基板处理方法，其包括曝光步骤，其中在基板上形成第一液体的浸没面积，并且通过经由第一液体的曝光光照射基板而暴露基板;浸渍步骤，其中基板浸没在曝光步骤之前的第二液体。通过这种方法，可以减少始终涉及浸没曝光的附着标记引起的问题的发生。

4. 发明公开

EP1801853A4 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： BELICHTUNGSVORRICHTUNG UND BAUELEMENTEHERSTELLUNGSVERFAHREN
公开(公告)号：EP1801853A4
公开(公告)日：2008-06-04
申请号：EP05780490
申请日：2005-08-17
申请人： NIPPON KOGAKU KK
发明人： NAKANO KATSUSHI , HAGIWARA TSUNEYUKI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341
摘要： Provided is an exposure apparatus that is able to prevent liquid from remaining on a measuring part. An exposure apparatus comprises a measuring system (60), which has a first pattern (61) formed on the upper surface of a substrate stage, and a second area (S2) specified on the upper surface in the vicinity of a first area (S1), which includes the first pattern (61), and a second pattern (80) is formed in the second area (S2) so that the liquid (LQ) that has remained so as to span the first area (S1) and the second area (S2) retreats from the first area (S1) and collects in the second area (S2).
摘要翻译：一种能够防止液体残留在测量部件上的曝光装置和装置制造方法。该装置包括测量系统（60），该测量系统（60）具有形成在基板台的上表面上的第一图案（61）和指定在第一区域（S1）附近的第二区域（S2），第一区域（S1）包括上部表面。在第二区域（S2）中形成第二图案（80），使得留在第一区域（S1）和第二区域（S2）上的液体（LQ）可以从第一区域（S1）撤回并收集到第二区域（S2）。

5. 发明公开

EP1705695A4 EXPOSURE APPARATUS AND DEVICE PRODUCING METHOD 审中-公开
标题翻译：曝光装置及元件制造工艺
公开(公告)号：EP1705695A4
公开(公告)日：2007-08-08
申请号：EP05703467
申请日：2005-01-12
申请人： NIPPON KOGAKU KK
发明人： TSUJI TOSHIHIKO , SHIRAISHI KENICHI , NAGASAKA HIROYUKI , NAKANO KATSUSHI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70725 , G03F7/70775
摘要： An exposure apparatus is provided in which, even when a projection optical system and substrate are in close proximity, collisions between the projection optical system and the substrate or the substrate stage can be easily avoided. An exposure apparatus EX having a projection optical system (30) which projects and transfers a pattern (PA) formed on a mask (R) onto a substrate (W), and a substrate stage (42), positioned below the projection optical system (30), which moves in directions substantially perpendicular to the direction of the optical axis (AX) of the projection optical system (30) while supporting the substrate (W), comprises a detector (81), positioned on the outer periphery of the projection optical system (30), and which detects the position of the substrate stage (42) or substrate W along the direction of the optical axis (AX), and a control device (70), which based on the detection results of the detector (81), stops or reverses the movement of the substrate stage (42).

6. 发明公开

EP1865540A4 EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD 审中-公开
公开(公告)号：EP1865540A4
公开(公告)日：2010-03-17
申请号：EP06730625
申请日：2006-03-30
申请人： NIPPON KOGAKU KK
发明人： NAKANO KATSUSHI , HAMATANI MASATO
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341
摘要： An exposure apparatus (EX) includes: a substrate stage (ST1) that is movable while holding substrate (P); a first immersion mechanism (1) that fills an optical path space (K1) between a final optical member (LS1) and the substrate stage (ST1) with a liquid (LQ) when the substrate stage (ST1) is disposed opposite the final optical member (LS1) that is closest to the image plane of the projection optical system (PL); a measurement stage (ST2) in which the optical path space (K1) with the final optical member (LS1) is filled with the liquid (LQ) when the measurement stage (ST2) is disposed in place of the substrate stage (ST1) opposite the final optical member (LS1) in the projection optical system; a measuring device (60) that has an upper plate (65) that is disposed on the measurement stage (ST2), and that carries out specific measurements when the upper plate (65) is disposed opposite the final optical member (LS1) of the projection optical system with the liquid (LQ) held therebetween; and a second immersion mechanism (2) that forms an immersion region (LR2) on the upper plate (65) at least when the measurement stage (ST2) has moved away from the final optical member (LS1) in the projection optical system.

7. 发明公开

EP1628329A4 EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光装置及元件制造工艺
公开(公告)号：EP1628329A4
公开(公告)日：2009-09-16
申请号：EP04734624
申请日：2004-05-24
申请人： NIPPON KOGAKU KK
发明人： KOBAYASHI NAOYUKI , TANIMOTO AKIKAZU , MIZUNO YASUSHI , SHIRAISHI KENICHI , NAKANO KATSUSHI , OWA SOICHI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.

8. 发明公开

EP2034514A4 EXPOSURE METHOD AND APPARATUS, MAINTENANCE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光的方法和装置，维护方法及零部件生产工艺
公开(公告)号：EP2034514A4
公开(公告)日：2012-01-11
申请号：EP07743845
申请日：2007-05-22
申请人： NIPPON KOGAKU KK
发明人： NAKANO KATSUSHI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/7085 , G03F7/70916 , G03F9/7088 , G03F9/7096
摘要： An exposure method for exposing a substrate P with an exposure light EL via an projection optical system PL and a liquid 1 includes: a first step of optically observing a liquid contact portion which comes into contact with the liquid 1 and storing first image data obtained by the optical observation; a second step of optically observing the liquid contact portion after the liquid contact portion came into contact with the liquid 1, for example, after the liquid immersion exposure and obtaining second image data obtained by the optical observation; and a third step of comparing the first image data and the second image data to judge whether abnormality of observation objective portion is present or absent. It is possible to efficiently judge whether or not the abnormality of the liquid-contact portion, of the exposure apparatus which performs the exposure by the immersion method, is present or absent.

9. 发明公开

EP1895571A4 EXPOSURE APPARATUS, EXPOSURE METHOD, MAINTENANCE METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：比利时巨人
公开(公告)号：EP1895571A4
公开(公告)日：2011-04-27
申请号：EP06767006
申请日：2006-06-20
申请人： NIPPON KOGAKU KK
发明人： NAGAHASHI YOSHITOMO , NAKANO KATSUSHI
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/70858 , G03F7/70941 , G03F7/70975
摘要： An exposure apparatus (EX) includes; a supply outlet (8) that supplies a liquid (2) to an optical path space (K) of exposure light (EL), and a liquid supply system (10) that supplies an ionized ionic liquid (2A, 2B) to the supply outlet (8).
摘要翻译：曝光装置（EX）包括：向液体（2）供给曝光用光（EL）的光路空间（K）的供给口（8），以及向电源供给离子化离子液体（2A，2B）的液体供给系统（10）出口（8）。

10. 发明公开

EP1801850A4 SUBSTRATE HOLDING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：衬底和保持装置，曝光装置以及元件制造工艺
公开(公告)号：EP1801850A4
公开(公告)日：2008-12-10
申请号：EP05783614
申请日：2005-09-16
申请人： NIPPON KOGAKU KK
发明人： NAGASAKA HIROYUKI , SHIBUTA MAKOTO , NAKANO KATSUSHI , YOSHIDA YUICHI , TAKAIWA HIROAKI
IPC分类号： H01L21/00
CPC分类号： G03F7/70341 , G03F7/707 , H01L21/6715 , H01L21/6838 , H01L21/68735 , H01L21/6875 , Y10T29/49002
摘要： To provide a substrate holding apparatus which can prevent a liquid from entering into a rear surface side of a substrate. A substrate holding apparatus (PH) is provided with a base material (PHB), a first holding portion (PHB) formed on the base material (PHB) for holding the substrate (P), and a second holding portion (PH2) formed on the base material (PHB) for holding a plate member (T) by surrounding the circumference of a processing substrate (P) held by the first holding portion (PH1). The second holding portion (PH2) holds the plate member (T) so as to form a second space (32) on the side of the rear surface (Tb) of the plate member (T). On the rear surface (Tb) of the plate member (T), an absorbing member (100) is arranged for absorbing the liquid (LQ) entered from a gap (A) between the substrate (P) held by the first holding portion (PH1) and the plate member (T) held by the second holding portion (PHB2).

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