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1. 发明申请

US20110189618A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20110189618A1
公开(公告)日：2011-08-04
申请号：US13062180
申请日：2009-09-01
申请人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
发明人： Mitsuhiro Hata , Nobuo Ando , Satoshi Yamamoto , Junji Shigematsu , Akira Kamabuchi
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： A resist processing method comprises the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, a photo acid generator (B), a cross-linking agent (C) and an acid amplifier (D) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing to the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern.
摘要翻译：抗蚀剂处理方法包括以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：具有酸不稳定基团的树脂（A），其在碱性水溶液中不溶或难溶，并且呈现通过酸，光酸产生剂（B），交联剂（C）和酸放大器（D）的作用将其溶于碱水溶液中并干燥; （2）预烘第一抗蚀膜; （3）暴露于第一抗蚀膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）硬烘烤第一抗蚀剂图案，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上并干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。

2. 发明授权

US08057983B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08057983B2
公开(公告)日：2011-11-15
申请号：US12425942
申请日：2009-04-17
申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
发明人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

3. 发明授权

US07494763B2 Polyhydric phenol compound and chemically amplified resist composition containing the same 失效
标题翻译：多元酚化合物和含有它的化学放大抗蚀剂组合物
公开(公告)号：US07494763B2
公开(公告)日：2009-02-24
申请号：US11976197
申请日：2007-10-22
申请人： Ichiki Takemoto , Nobuo Ando , Junji Shigematsu
发明人： Ichiki Takemoto , Nobuo Ando , Junji Shigematsu
IPC分类号： G03F7/004 , C07C69/74
CPC分类号： C07C39/15 , C07C67/31 , C07C69/712 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a polyhydric phenol compound represented by the formula (I): wherein at least one selected from R1, R2, R3, R4, and R5 is a group represented by the formula (II): wherein X1, X2, X3 and X4 each independently represent a hydrogen atom or a C1-C4 alkyl group, n represents an integer of 0 to 3, Z1 represents a C1-C6 alkyl group or a C3-C12 cycloalkyl group, and ring Y represents an alicyclic hydrocarbon group, and the others are hydrogen atoms, and a chemically amplified resist composition containing the same.
摘要翻译：本发明提供由式（I）表示的多元酚化合物：其中，选自R 1，R 2，R 3，R 4和R 5中的至少一种为式（II）表示的基团：其中X 1，X 2，X 3和 X4各自独立地表示氢原子或C1-C4烷基，n表示0〜3的整数，Z1表示C1-C6烷基或C3-C12环烷基，Y表示脂环族烃基，其他的是氢原子，和含有它们的化学放大抗蚀剂组合物。

4. 发明申请

US20080248417A1 Polyhydric phenol compound and chemically amplified resist composition containing the same 失效
标题翻译：多元酚化合物和含有它的化学放大抗蚀剂组合物
公开(公告)号：US20080248417A1
公开(公告)日：2008-10-09
申请号：US11976197
申请日：2007-10-22
申请人： Ichiki Takemoto , Nobuo Ando , Junji Shigematsu
发明人： Ichiki Takemoto , Nobuo Ando , Junji Shigematsu
IPC分类号： G03F7/004 , C07C39/12
CPC分类号： C07C39/15 , C07C67/31 , C07C69/712 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provides a polyhydric phenol compound represented by the formula (I): wherein at least one selected from R1, R2, R3, R4, and R5 is a group represented by the formula (II): wherein X1, X2, X3 and X4 each independently represent a hydrogen atom or a C1-C4 alkyl group, n represents an integer of 0 to 3, Z1 represents a C1-C6 alkyl group or a C3-C12 cycloalkyl group, and ring Y represents an alicyclic hydrocarbon group, and the others are hydrogen atoms, and a chemically amplified resist composition containing the same.
摘要翻译：本发明提供由式（I）表示的多元酚化合物：其中选自R 1，R 2，R 3，O， >，R 4，R 5和R 5是由式（II）表示的基团：其中X 1，X 2， X 3，X 3和X 4各自独立地表示氢原子或C 1 -C 4烷基，n表示0〜3的整数，Z < 1表示C1-C6烷基或C3-C12环烷基，Y表示脂环族烃基，其余为氢原子，含有该烷氧基的化学放大型抗蚀剂组合物。

5. 发明授权

US08062830B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US08062830B2
公开(公告)日：2011-11-22
申请号：US12425759
申请日：2009-04-17
申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
发明人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中基于树脂（B）的总单元的结构单元（b1）的含量小于10摩尔％。

6. 发明申请

US20090269695A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20090269695A1
公开(公告)日：2009-10-29
申请号：US12425942
申请日：2009-04-17
申请人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
发明人： Yusuke Fuji , Junji Shigematsu , Takayuki Miyagawa , Nobuo Ando , Ichiki Takemoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/0395 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the amount of the resin (B) is 2 parts by weight or less per 100 parts by weight of the resin (A).
摘要翻译：本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团，在侧链中具有内酯结构的单元（b4）和酸产生剂，其中树脂（B）的量相对于树脂（A）每100重量份为2重量份以下。

7. 发明授权

US08476473B2 Compound, method for preparing the compound and resist composition containing the compound 有权
标题翻译：化合物，制备化合物的方法和含有该化合物的抗蚀剂组合物
公开(公告)号：US08476473B2
公开(公告)日：2013-07-02
申请号：US12552085
申请日：2009-09-01
申请人： Ichiki Takemoto , Nobuo Ando , Mitsuhiro Hata
发明人： Ichiki Takemoto , Nobuo Ando , Mitsuhiro Hata
IPC分类号： C07C69/63 , C07C69/74
CPC分类号： C07C67/08 , C07C67/11 , C07C69/63 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0392
摘要： A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
摘要翻译：由式（I）或式（I'）表示的化合物。其中Z 1和Z 2独立地表示氢原子，C 1至C 12烷基或C 3至C 12环状饱和烃基，条件是Z 1和Z 2中的至少一个表示C 1至C 12烷基或C 3至C 12环状饱和烃组; 环Y1和Y2独立地表示任选取代的C 3至C 20脂环族烃基; Q1至Q4和Q'1至Q'4独立地表示氟原子或C1至C6全氟烷基; m和n独立地表示0〜5的整数。

8. 发明申请

US20100055609A1 COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND 有权
标题翻译：化合物，用于制备化合物的方法和含有该化合物的抗蚀剂组合物
公开(公告)号：US20100055609A1
公开(公告)日：2010-03-04
申请号：US12552085
申请日：2009-09-01
申请人： Ichiki TAKEMOTO , Nobuo Ando , Mitsuhiro Hata
发明人： Ichiki TAKEMOTO , Nobuo Ando , Mitsuhiro Hata
IPC分类号： G03F7/004 , C07C69/63
CPC分类号： C07C67/08 , C07C67/11 , C07C69/63 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0392
摘要： A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
摘要翻译：由式（I）或式（I'）表示的化合物。其中Z 1和Z 2独立地表示氢原子，C 1至C 12烷基或C 3至C 12环状饱和烃基，条件是Z 1和Z 2中的至少一个表示C 1至C 12烷基或C 3至C 12环状饱和烃组; 环Y1和Y2独立地表示任选取代的C 3至C 20脂环族烃基; Q1至Q4和Q'1至Q'4独立地表示氟原子或C1至C6全氟烷基; m和n独立地表示0〜5的整数。

9. 发明授权

US5113277A Fiber optic distributed temperature sensor system 失效
标题翻译：光纤分布式温度传感器系统
公开(公告)号：US5113277A
公开(公告)日：1992-05-12
申请号：US542610
申请日：1990-06-22
申请人： Yasuo Ozawa , Nobuo Ando , Satoshi Yamamoto , Toshio Fukahori , Hiroyuki Kunugiyama , Kouichi Sugiyama , Teruaki Tsutsui , Keiichi Hashiba , Shigehiro Endoh , Hiroshi Kawakami , Akira Tokushima , Kaoru Yamazaki
发明人： Yasuo Ozawa , Nobuo Ando , Satoshi Yamamoto , Toshio Fukahori , Hiroyuki Kunugiyama , Kouichi Sugiyama , Teruaki Tsutsui , Keiichi Hashiba , Shigehiro Endoh , Hiroshi Kawakami , Akira Tokushima , Kaoru Yamazaki
IPC分类号： G01K11/32 , G02B6/24 , G02B6/34
CPC分类号： G02B6/2938 , G01K11/32 , G02B6/243 , G02B6/29362
摘要： A fiber optic distributed temperature sensor system outputs a temperature distribution along the longitudinal direction of a sensor optical fiber by measuring the temperature dependency of Raman scattered light intensity produced in an optical fiber by use of the OTDR technique. The system is characterized in that a light output from a light source is input to the sensor (optical fiber) via an optical wavelength division demultiplexer, that among the reflected light of back scattered light returning from the sensor optical fiber, light of a particular wavelength range is reflected or transmitted by at least one optical filter of the optical wavelength division demultiplexer to separate the light of the particular wavelength range and that signal of the light of the particular wavelength range is guided to a detector of an optical measuring system.
摘要翻译：光纤分布式温度传感器系统通过使用OTDR技术测量在光纤中产生的拉曼散射光强度的温度依赖性，输出沿传感器光纤纵向的温度分布。该系统的特征在于，从光源输出的光经由光波分复用器输入到传感器（光纤），在从传感器光纤返回的反射散射光的反射光中，特定波长的光范围由光波分复用器的至少一个滤光器反射或透射以分离特定波长范围的光，并且将特定波长范围的光的信号引导到光学测量系统的检测器。

10. 发明授权

US07741007B2 Chemicallly amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US07741007B2
公开(公告)日：2010-06-22
申请号：US11987672
申请日：2007-12-03
申请人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
发明人： Satoshi Yamaguchi , Satoshi Yamamoto , Nobuo Ando
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: (A) a salt represented by the formula (1) wherein R21, Q1, Q2, and A+ defined in the specification; (B) a salt represented by the formula (II): wherein R22, Q3, Q4, and A′+ are defined in the specification; and (C) a resin which contains a structural unit having a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：（A）由式（1）表示的盐，其中在说明书中定义的R 21，Q 1，Q 2和A + （B）由式（II）表示的盐：其中R 22，Q 3，Q 4和A'+在本说明书中定义; 和（C）含有具有酸不稳定基团的结构单元的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

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