专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20110229010A1 METHOD AND DEVICE FOR MEASURING THE RELATIVE LOCAL POSITION ERROR OF ONE OF THE SECTIONS OF AN OBJECT THAT IS EXPOSED SECTION BY SECTION 有权
标题翻译：用于测量部分暴露部分的部分之一的相对本地位置错误的方法和装置
公开(公告)号：US20110229010A1
公开(公告)日：2011-09-22
申请号：US13130600
申请日：2009-11-28
申请人： Michael Arnz , Dirk Beyer , Wolfgang Harnisch , Thomas Scheruebl
发明人： Michael Arnz , Dirk Beyer , Wolfgang Harnisch , Thomas Scheruebl
IPC分类号： G06K9/00
CPC分类号： G03F7/70633 , B82Y10/00 , B82Y40/00 , G03F1/84 , G03F7/70616 , H01J37/3174
摘要： A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.
摘要翻译：提供了一种用于测量逐段暴露的物体的一个部分（特别是光刻掩模或晶片）的相对局部位置误差的方法，每个暴露部分具有多个测量标记，其中）以放大的方式成像大于该部分的对象的区域，并且被检测为图像，b）基于检测到的图像确定检测图像中包含的测量标记的位置误差，c）校正位置误差是通过由放大的成像和检测引起的位置误差分量从确定的测量标记的位置误差中提取导出的，d）基于校正位置导出一个部分的相对局部位置误差测量标记的误差。

2. 发明授权

US08731273B2 Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section 有权
标题翻译：用于测量被逐个暴露的对象的一个部分的相对局部位置误差的方法和装置
公开(公告)号：US08731273B2
公开(公告)日：2014-05-20
申请号：US13130600
申请日：2009-11-28
申请人： Michael Arnz , Dirk Beyer , Wolfgang Harnisch , Thomas Scheruebl
发明人： Michael Arnz , Dirk Beyer , Wolfgang Harnisch , Thomas Scheruebl
IPC分类号： G06K9/40 , G01N21/00
CPC分类号： G03F7/70633 , B82Y10/00 , B82Y40/00 , G03F1/84 , G03F7/70616 , H01J37/3174
摘要： A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.
摘要翻译：提供了一种用于测量逐段暴露的物体的一个部分（特别是光刻掩模或晶片）的相对局部位置误差的方法，每个暴露部分具有多个测量标记，其中）以放大的方式成像大于该部分的对象的区域，并且被检测为图像，b）基于检测到的图像确定检测图像中包含的测量标记的位置误差，c）校正位置误差是通过由放大的成像和检测引起的位置误差分量从确定的测量标记的位置误差中提取导出的，d）基于校正位置导出一个部分的相对局部位置误差测量标记的误差。

3. 发明授权

US07525115B2 Arrangement for inspecting objects, especially masks in microlithography 有权
标题翻译：用于检查物体的布置，特别是微光刻中的掩模
公开(公告)号：US07525115B2
公开(公告)日：2009-04-28
申请号：US10554048
申请日：2004-04-20
申请人： Hans-Juergen Dobschal , Wolfgang Harnisch , Thomas Scheruebl , Nobert Rosenkranz , Ralph Semmler
发明人： Hans-Juergen Dobschal , Wolfgang Harnisch , Thomas Scheruebl , Nobert Rosenkranz , Ralph Semmler
IPC分类号： G01N23/04 , G01N21/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N21/956 , G03F1/24 , G03F1/84
摘要： Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.
摘要翻译：用于检查物体的装置，特别是在微光刻中的掩模，其设置在真空室中。该装置包括用于将从物体发射的照射辐射转换成更高波长的辐射的转换器。用于记录图像的传感器设置在真空室的外部并且被布置为从真空室到转换器的传感器的光学界面，或者将图像透镜的至少一部分布置成在真空室中的窗口。

4. 再颁专利

USRE44216E1 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
标题翻译：用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查
公开(公告)号：USRE44216E1
公开(公告)日：2013-05-14
申请号：US12604821
申请日：2009-10-23
申请人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Matejka
发明人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Matejka
IPC分类号： G02B23/00
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
摘要翻译：用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量，被传送到评估单元进行进一步处理。

5. 发明申请

US20060262306A1 Arrangement for inspecting objects, especially masks in microlithography 有权
公开(公告)号：US20060262306A1
公开(公告)日：2006-11-23
申请号：US10554048
申请日：2004-04-20
申请人： Hans-Juergen Dobschal , Wolfgang Harnisch , Thomas Scheruebl , Nobert Rosenkranz , Ralph Semmler
发明人： Hans-Juergen Dobschal , Wolfgang Harnisch , Thomas Scheruebl , Nobert Rosenkranz , Ralph Semmler
IPC分类号： G01N21/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N21/956 , G03F1/24 , G03F1/84
摘要： Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.

6. 发明授权

US07286284B2 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
标题翻译：用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查
公开(公告)号：US07286284B2
公开(公告)日：2007-10-23
申请号：US10917626
申请日：2004-08-13
申请人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
发明人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
IPC分类号： G02B23/00
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
摘要翻译：用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量，被传送到评估单元进行进一步处理。

7. 发明申请

US20060028706A1 Polarizer device for generating a defined spatial distribution of polarization states 审中-公开
标题翻译：用于产生限定的偏振态空间分布的偏振器装置
公开(公告)号：US20060028706A1
公开(公告)日：2006-02-09
申请号：US11174489
申请日：2005-07-06
申请人： Michael Totzeck , Heiko Feldman , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Ulrich Stroessner , Thomas Scheruebl , Wolfgang Harnisch
发明人： Michael Totzeck , Heiko Feldman , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Ulrich Stroessner , Thomas Scheruebl , Wolfgang Harnisch
IPC分类号： G02B26/00
CPC分类号： G03F7/70108 , G02B5/3041 , G02B5/3091 , G02B27/286 , G02B27/288 , G03F7/70566
摘要： A polarizer device, for converting an entry light beam into an exit light beam with a defined spatial distribution of polarization states, has an angle varying input device for receiving the entry light beam and for generating a first light beam with a predeterminable first angular distribution of light rays; an angle-selectively active polarization influencing device for receiving the first light beam and for converting the first light beam into a second light beam according to a defined angle function of the polarization state variation; and an angle varying output device for receiving the second light beam and for generating the exit light beam with a second angular distribution from the second light beam. In particular, polarization states with a radial or tangential polarization can be provided cost-effectively in this way.
摘要翻译：一种用于将入射光束转换成具有限定的偏振状态空间分布的出射光束的偏振器装置具有角度变化输入装置，用于接收入射光束并用于产生具有可预先确定的第一角度分布的第一光束光线角度选择性有源极化影响装置，用于接收第一光束并根据偏光状态变化的限定角函数将第一光束转换成第二光束; 以及角度变化的输出装置，用于接收第二光束并用于从第二光束产生具有第二角度分布的出射光束。特别地，可以以这种方式成本有效地提供具有径向或切向极化的极化状态。

8. 发明申请

US20060012873A1 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
标题翻译：用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查
公开(公告)号：US20060012873A1
公开(公告)日：2006-01-19
申请号：US10917626
申请日：2004-08-13
申请人： Michael Totzeck , Heiko Feldmann , Toralf Grunder , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
发明人： Michael Totzeck , Heiko Feldmann , Toralf Grunder , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
IPC分类号： G02B21/06
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.
摘要翻译：本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量，被传送到评估单元进行进一步处理。利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。

9. 发明申请

US20060154150A1 Arrangement for the production of photomasks 审中-公开
标题翻译：制作光掩模的安排
公开(公告)号：US20060154150A1
公开(公告)日：2006-07-13
申请号：US10520648
申请日：2003-07-09
申请人： Thomas Engel , Wolfgang Harnisch , Peter Hoffrogge , Axel Zibold
发明人： Thomas Engel , Wolfgang Harnisch , Peter Hoffrogge , Axel Zibold
IPC分类号： G03F1/00
CPC分类号： G03F1/72 , G03F1/84
摘要： An arrangement and a method for the production of photomasks in which at least one defect control system is connected to at least one repair system by a stationary data connection or online connection, and the defect control system and repair system are connected to one another by data in such a way that the results obtained on one of the systems are immediately available to the other system for further processing. The defect control system conveys detected defects to the repair system via a data connection for data exchange. An AIMS system is advantageously provided as defect control system and an electron beam system is advantageously provided for defect control.
摘要翻译：一种用于生产光掩模的布置和方法，其中至少一个缺陷控制系统通过固定数据连接或在线连接连接到至少一个修复系统，并且所述缺陷控制系统和修复系统通过数据彼此连接以使得在其中一个系统上获得的结果立即可用于另一个系统用于进一步处理。缺陷控制系统通过用于数据交换的数据连接将检测到的缺陷传送到维修系统。有利地提供AIMS系统作为缺陷控制系统，并且有利地提供用于缺陷控制的电子束系统。

10. 发明授权

US08705838B2 Method for mask inspection for mask design and mask production 有权
标题翻译：面罩设计和面膜生产的面膜检查方法
公开(公告)号：US08705838B2
公开(公告)日：2014-04-22
申请号：US11885095
申请日：2006-02-04
申请人： Klaus Boehm , Christian Kalus , Thomas Schmoeller , Wolfgang Harnisch , Axel Zibold
发明人： Klaus Boehm , Christian Kalus , Thomas Schmoeller , Wolfgang Harnisch , Axel Zibold
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.
摘要翻译：本发明涉及一种掩模检查方法，可用于设计和生产掩模，以便早期检测相关的弱点并进行纠正。根据所述掩模检查方法，基于转换为掩模布局的掩模设计，进行空中图像模拟，优选全面的空间图像模拟，以便确定热点列表。通过AIMS工具分析掩模/测试掩模，从而产生真实的航空图像并与模拟的航空图像进行比较。使用确定的空间图像之间的差异来改进掩模设计。本发明的布置使得能够进行用于掩模设计和掩模生产的掩模检查的方法。直接在掩模生产过程中使用AIMS工具基本上加快了掩模生产，同时降低了错误率和成本。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式