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1. 发明申请

US20090246530A1 Method For Fabricating Thin Films 审中-公开
标题翻译：薄膜制造方法
公开(公告)号：US20090246530A1
公开(公告)日：2009-10-01
申请号：US12401967
申请日：2009-03-11
申请人： Makoto Murakami , Zhendong Hu , Yong Che , Bing Liu , Yuzuru Uehara , Zhenlin Liu
发明人： Makoto Murakami , Zhendong Hu , Yong Che , Bing Liu , Yuzuru Uehara , Zhenlin Liu
IPC分类号： B32B9/04 , C23C14/28 , C23C14/30 , B05B5/025
CPC分类号： C23C14/08 , C23C14/083 , C23C14/086 , C23C14/14 , C23C14/28 , C23C14/54 , Y10T428/31504
摘要： A method of pulsed laser deposition (PLD) capable of continuously tuning formed-film morphology from that of a nanoparticle aggregate to a smooth thin film free of particles and droplets. The materials that can be synthesized using various embodiments of the invention include, but are not limited to, metals, alloys, metal oxides, and semiconductors. In various embodiments a ‘burst’ mode of ultrashort pulsed laser ablation and deposition is provided. Tuning of the film morphology is achieved by controlling the burst-mode parameters such as the number of pulses and the time-spacing between the pulses within each burst, the burst repetition rate, and the laser fluence. The system includes an ultrashort pulsed laser, an optical system for delivering a focused onto the target surface with an appropriate energy density, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.
摘要翻译：脉冲激光沉积（PLD）的方法，其能够将形成膜的形态从纳米颗粒聚集体的形态连续调节到没有颗粒和液滴的平滑薄膜。可以使用本发明的各种实施方案合成的材料包括但不限于金属，合金，金属氧化物和半导体。在各种实施例中，提供了超短脉冲激光烧蚀和沉积的“突发”模式。通过控制脉冲串模式参数，例如脉冲数和每个脉冲之间的脉冲之间的时间间隔，脉冲串重复频率和激光能量密度来实现电影形态的调整。该系统包括超短脉冲激光器，用于以适当的能量密度传递聚焦到目标表面上的光学系统，以及真空室，其中靶和基底被安装在其中，背景气体及其压力被适当地调整。

2. 发明授权

US07608308B2 P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates 失效
标题翻译： P型半导体氧化锌膜的制造方法以及使用透明基板的脉冲激光沉积法
公开(公告)号：US07608308B2
公开(公告)日：2009-10-27
申请号：US11405020
申请日：2006-04-17
申请人： Bing Liu , Zhendong Hu , Yong Che , Yuzuru Uehara
发明人： Bing Liu , Zhendong Hu , Yong Che , Yuzuru Uehara
IPC分类号： C23C14/30 , H05B7/00 , C23C8/00
CPC分类号： C23C14/22 , C23C14/083 , C23C14/28
摘要： A p-type semiconductor zinc oxide (ZnO) film and a process for preparing the film are disclosed. The film is co-doped with phosphorous (P) and lithium (Li). A pulsed laser deposition scheme is described for use in growing the film. Further described is a process of pulsed laser deposition using transparent substrates which includes a pulsed laser source, a substrate that is transparent at the wavelength of the pulsed laser, and a multi-target system. The optical path of the pulsed laser is arranged in such a way that the pulsed laser is incident from the back of the substrate, passes through the substrate, and then focuses on the target. By translating the substrate towards the target, this geometric arrangement enables deposition of small features utilizing the root of the ablation plume, which can exist in a one-dimensional transition stage along the target surface normal, before the angular width of the plume is broadened by three-dimensional adiabatic expansion. This can provide small deposition feature sizes, which can be similar in size to the laser focal spot, and provides a novel method for direct deposition of patterned materials.
摘要翻译：公开了一种p型半导体氧化锌（ZnO）膜及其制备方法。该膜与磷（P）和锂（Li）共掺杂。描述脉冲激光沉积方案用于生长膜。进一步描述的是使用透明衬底的脉冲激光沉积过程，其包括脉冲激光源，在脉冲激光的波长处是透明的衬底和多目标系统。脉冲激光器的光路布置成使得脉冲激光从衬底的背面入射，穿过衬底，然后聚焦在靶上。通过将基板朝向目标平移，这种几何布置可以在羽流的角宽度扩大之前利用消融羽流的根部沉积小特征，其可以沿着目标表面法线存在于一维过渡阶段中三维绝热膨胀。这可以提供小的沉积特征尺寸，其尺寸可以与激光焦点类似，并且提供用于直接沉积图案化材料的新颖方法。

3. 发明申请

US20070243328A1 P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates 失效
标题翻译： P型半导体氧化锌膜的制造方法以及使用透明基板的脉冲激光沉积法
公开(公告)号：US20070243328A1
公开(公告)日：2007-10-18
申请号：US11405020
申请日：2006-04-17
申请人： Bing Liu , Zhendong Hu , Yong Che , Yuzuru Uehara
发明人： Bing Liu , Zhendong Hu , Yong Che , Yuzuru Uehara
IPC分类号： C23C16/00 , C23C14/30
CPC分类号： C23C14/22 , C23C14/083 , C23C14/28
摘要： A p-type semiconductor zinc oxide (ZnO) film and a process for preparing the film are disclosed. The film is co-doped with phosphorous (P) and lithium (Li). A pulsed laser deposition scheme is described for use in growing the film. Further described is a process of pulsed laser deposition using transparent substrates which includes a pulsed laser source, a substrate that is transparent at the wavelength of the pulsed laser, and a multi-target system. The optical path of the pulsed laser is arranged in such a way that the pulsed laser is incident from the back of the substrate, passes through the substrate, and then focuses on the target. By translating the substrate towards the target, this geometric arrangement enables deposition of small features utilizing the root of the ablation plume, which can exist in a one-dimensional transition stage along the target surface normal, before the angular width of the plume is broadened by three-dimensional adiabatic expansion. This can provide small deposition feature sizes, which can be similar in size to the laser focal spot, and provides a novel method for direct deposition of patterned materials.
摘要翻译：公开了一种p型半导体氧化锌（ZnO）膜及其制备方法。该膜与磷（P）和锂（Li）共掺杂。描述脉冲激光沉积方案用于生长膜。进一步描述的是使用透明衬底的脉冲激光沉积过程，其包括脉冲激光源，在脉冲激光的波长处是透明的衬底和多目标系统。脉冲激光器的光路布置成使得脉冲激光从衬底的背面入射，穿过衬底，然后聚焦在靶上。通过将基板朝向目标平移，这种几何布置可以在羽流的角宽度扩大之前利用消融羽流的根部沉积小特征，其可以沿着目标表面法线存在于一维过渡阶段中三维绝热膨胀。这可以提供小的沉积特征尺寸，其尺寸可以与激光焦点类似，并且提供用于直接沉积图案化材料的新颖方法。

4. 发明授权

US08663754B2 Pulsed laser micro-deposition pattern formation 有权
标题翻译：脉冲激光微沉积图案形成
公开(公告)号：US08663754B2
公开(公告)日：2014-03-04
申请号：US12400438
申请日：2009-03-09
申请人： Bing Liu , Zhendong Hu , Makoto Murakami , Jingzhou Xu , Yong Che
发明人： Bing Liu , Zhendong Hu , Makoto Murakami , Jingzhou Xu , Yong Che
IPC分类号： C23C14/28 , C08J7/04 , B05D5/06 , B05D5/12 , B23K26/00
CPC分类号： C23C20/04 , B41M5/262 , B41M5/267 , B44F1/10 , C23C14/28 , C23C14/3435 , G02B26/101 , Y10T428/24802 , Y10T428/24917
摘要： A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.
摘要翻译：公开了使用脉冲激光在透明基板上形成图案的方法。各种实施例包括超短脉冲激光器，对激光波长透明的衬底和靶板。激光束被引导通过透明基板并聚焦在目标表面上。目标材料被激光烧蚀并沉积在相对的基板表面上。通过相对于目标扫描激光束来形成例如灰度图像的图案。激光束扫描速度和扫描线密度的变化控制材料沉积并改变沉积图案的光学性质，产生灰度的视觉效果。在一些实施例中，可以在制造过程期间在微电子器件的一部分上形成图案。在一些实施例中，高重复率皮秒和纳秒源被配置为产生图案。

5. 发明申请

US20100227133A1 PULSED LASER MICRO-DEPOSITION PATTERN FORMATION 有权
标题翻译：脉冲激光微沉积图形成
公开(公告)号：US20100227133A1
公开(公告)日：2010-09-09
申请号：US12400438
申请日：2009-03-09
申请人： Bing Liu , Zhendong Hu , Makoto Murakami , Jingzhou Xu , Yong Che
发明人： Bing Liu , Zhendong Hu , Makoto Murakami , Jingzhou Xu , Yong Che
IPC分类号： B32B3/00 , C23C14/34 , C23C14/00
CPC分类号： C23C20/04 , B41M5/262 , B41M5/267 , B44F1/10 , C23C14/28 , C23C14/3435 , G02B26/101 , Y10T428/24802 , Y10T428/24917
摘要： A method of forming patterns on transparent substrates using a pulsed laser is disclosed. Various embodiments include an ultrashort pulsed laser, a substrate that is transparent to the laser wavelength, and a target plate. The laser beam is guided through the transparent substrate and focused on the target surface. The target material is ablated by the laser and is deposited on the opposite substrate surface. A pattern, for example a gray scale image, is formed by scanning the laser beam relative to the target. Variations of the laser beam scan speed and scan line density control the material deposition and change the optical properties of the deposited patterns, creating a visual effect of gray scale. In some embodiments patterns may be formed on a portion of a microelectronic device during a fabrication process. In some embodiments high repetition rate picoseconds and nanosecond sources are configured to produce the patterns.
摘要翻译：公开了使用脉冲激光在透明基板上形成图案的方法。各种实施例包括超短脉冲激光器，对激光波长透明的衬底和靶板。激光束被引导通过透明基板并聚焦在目标表面上。目标材料被激光烧蚀并沉积在相对的基板表面上。通过相对于目标扫描激光束来形成例如灰度图像的图案。激光束扫描速度和扫描线密度的变化控制材料沉积并改变沉积图案的光学性质，产生灰度的视觉效果。在一些实施例中，可以在制造过程期间在微电子器件的一部分上形成图案。在一些实施例中，高重复率皮秒和纳秒源被配置为产生图案。

6. 发明授权

US08246714B2 Production of metal and metal-alloy nanoparticles with high repetition rate ultrafast pulsed laser ablation in liquids 有权
标题翻译：在液体中生产金属和金属合金纳米粒子，具有高重复率超快脉冲激光烧蚀
公开(公告)号：US08246714B2
公开(公告)日：2012-08-21
申请号：US12320617
申请日：2009-01-30
申请人： Bing Liu , Zhendong Hu , Makoto Murakami , Yong Che
发明人： Bing Liu , Zhendong Hu , Makoto Murakami , Yong Che
IPC分类号： B22F9/02 , B22F9/04
CPC分类号： B02C19/18 , B01J13/0043 , B01J19/121 , B22F1/0022 , B22F9/04 , B22F2999/00 , B82Y30/00 , B22F2202/11
摘要： Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.
摘要翻译：各种实施方案包括用超快速脉冲激光烧蚀制备化学纯的和稳定分散的金属和金属合金纳米颗粒胶体的方法。一种方法包括以高重复率以超短激光脉冲辐射淹没在液体中的金属或金属合金靶，冷却包括辐射区域的液体的一部分，以及收集通过激光照射和液体冷却产生的纳米颗粒。该方法可以用高重复率超快脉冲激光源，用于聚焦和移动脉冲激光束的光学系统，浸没在液体中的金属或金属合金靶和液体循环系统来实现，以冷却激光聚焦体积，收集纳米颗粒产品。通过控制各种激光参数，并具有可选的液流运动，该方法提供分散金属和金属合金纳米粒子的稳定胶体。在各种实施方案中，不需要另外的稳定化学试剂。

7. 发明申请

US20100196192A1 Production of metal and metal-alloy nanoparticles with high repetition rate ultrafast pulsed laser ablation in liquids 有权
标题翻译：在液体中生产金属和金属合金纳米粒子，具有高重复率超快脉冲激光烧蚀
公开(公告)号：US20100196192A1
公开(公告)日：2010-08-05
申请号：US12320617
申请日：2009-01-30
申请人： Bing Liu , Zhendong Hu , Makoto Murakami , Yong Che
发明人： Bing Liu , Zhendong Hu , Makoto Murakami , Yong Che
IPC分类号： C22C5/04 , B22F9/04 , B23K26/08 , C22C5/02 , C22C5/06 , C22C9/00 , B01F3/12
CPC分类号： B02C19/18 , B01J13/0043 , B01J19/121 , B22F1/0022 , B22F9/04 , B22F2999/00 , B82Y30/00 , B22F2202/11
摘要： Various embodiments include a method of producing chemically pure and stably dispersed metal and metal-alloy nanoparticle colloids with ultrafast pulsed laser ablation. A method comprises irradiating a metal or metal alloy target submerged in a liquid with ultrashort laser pulses at a high repetition rate, cooling a portion of the liquid that includes an irradiated region, and collecting nanoparticles produced with the laser irradiation and liquid cooling. The method may be implemented with a high repetition rate ultrafast pulsed laser source, an optical system for focusing and moving the pulsed laser beams, a metal or metal alloy target submerged in a liquid, and a liquid circulating system to cool the laser focal volume and collect the nanoparticle products. By controlling various laser parameters, and with optional liquid flow movement, the method provides stable colloids of dispersed metal and metal-alloy nanoparticles. In various embodiments additional stabilizing chemical agents are not required.
摘要翻译：各种实施方案包括用超快速脉冲激光烧蚀制备化学纯的和稳定分散的金属和金属合金纳米颗粒胶体的方法。一种方法包括以高重复率以超短激光脉冲辐射淹没在液体中的金属或金属合金靶，冷却包括辐射区域的液体的一部分，以及收集通过激光照射和液体冷却产生的纳米颗粒。该方法可以用高重复率超快脉冲激光源，用于聚焦和移动脉冲激光束的光学系统，浸没在液体中的金属或金属合金靶和液体循环系统来实现，以冷却激光聚焦体积，收集纳米颗粒产品。通过控制各种激光参数，并具有可选的液流运动，该方法提供分散金属和金属合金纳米粒子的稳定胶体。在各种实施方案中，不需要另外的稳定化学试剂。

8. 发明授权

US08858676B2 Nanoparticle production in liquid with multiple-pulse ultrafast laser ablation 有权
标题翻译：多脉冲超快激光烧蚀液中纳米粒子生产
公开(公告)号：US08858676B2
公开(公告)日：2014-10-14
申请号：US12951423
申请日：2010-11-22
申请人： Bing Liu , Zhendong Hu , Yong Che , Makoto Murakami
发明人： Bing Liu , Zhendong Hu , Yong Che , Makoto Murakami
IPC分类号： B22F9/14 , B01J19/12 , B22F9/04 , B22F1/00
CPC分类号： B01J19/121 , B22F1/0018 , B22F9/04 , B22F2999/00 , Y10S977/889 , B22F2202/11
摘要： A method for generating nanoparticles in a liquid comprises generating groups of ultrafast laser pulses, each pulse in a group having a pulse duration of from 10 femtoseconds to 200 picoseconds, and each group containing a plurality of pulses with a pulse separation of 1 to 100 nanoseconds and directing the groups of pulses at a target material in a liquid to ablate it. The multiple pulse group ablation produces nanoparticles with a reduced average size, a narrow size distribution, and improved production efficiency compared to prior pulsed ablation systems.
摘要翻译：用于在液体中产生纳米颗粒的方法包括产生超快激光脉冲组，组中的每个脉冲具有10飞秒至200皮秒的脉冲持续时间，并且每组包含脉冲间隔为1至100纳秒的多个脉冲并将脉冲组定向在液体中的目标材料以烧蚀它。与先前的脉冲消融系统相比，多脉冲组消融产生具有降低的平均尺寸，窄尺寸分布和提高的生产效率的纳米颗粒。

9. 发明申请

US20090246413A1 METHOD FOR FABRICATING THIN FILMS 审中-公开
标题翻译：薄膜制作方法
公开(公告)号：US20090246413A1
公开(公告)日：2009-10-01
申请号：US12254076
申请日：2008-10-20
申请人： Makoto Murakami , Zhendong Hu , Yong Che , Bing Liu
发明人： Makoto Murakami , Zhendong Hu , Yong Che , Bing Liu
IPC分类号： C23C14/30 , C23C16/54
CPC分类号： C23C14/28 , C23C14/08 , C23C14/564 , H01S3/0057 , H01S3/0085 , H01S3/2308
摘要： A method of ultrashort pulsed laser deposition (PLD) capable of continuously tuning formed-film morphology from that of a nanoparticle aggregate to a smooth thin film completely free of particles and droplets. The materials that can be synthesized using various embodiments of the invention include, but are not limited to, metals, alloys, metal oxides, and semiconductors. A ‘burst’ mode of ultrashort pulsed laser ablation and deposition is provided, where each ‘burst’ contains a train of laser pulses. Tuning of the film morphology is achieved by controlling the burst-mode parameters such as the number of pulses and the time-spacing between the pulses within each burst, the burst repetition rate, and the laser fluence. The system includes an ultrashort pulsed laser, an optical setup for delivering the laser beam such that the beam is focused onto the target surface with an appropriate average energy density (fluence), and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.
摘要翻译：一种超短脉冲激光沉积（PLD）的方法，其能够将形成膜的形态从纳米颗粒聚集体的形态连续调节到完全没有颗粒和液滴的光滑薄膜。可以使用本发明的各种实施方案合成的材料包括但不限于金属，合金，金属氧化物和半导体。提供了超短脉冲激光烧蚀和沉积的“突发”模式，其中每个“脉冲串”包含一系列激光脉冲。通过控制脉冲串模式参数，例如脉冲数和每个脉冲之间的脉冲之间的时间间隔，脉冲串重复频率和激光能量密度来实现电影形态的调整。该系统包括超短脉冲激光器，用于传送激光束的光学装置，使得光束以适当的平均能量密度（能量密度）聚焦到目标表面上;以及真空室，其中安装有靶和基底; 背景气体及其压力得到适当调整。

10. 发明授权

US08609205B2 Method for depositing crystalline titania nanoparticles and films 有权
标题翻译：沉积结晶二氧化钛纳米粒子和薄膜的方法
公开(公告)号：US08609205B2
公开(公告)日：2013-12-17
申请号：US12497205
申请日：2009-07-02
申请人： Zhendong Hu , Yong Che , Bing Liu
发明人： Zhendong Hu , Yong Che , Bing Liu
IPC分类号： H05B7/00 , C23C14/14
CPC分类号： C30B23/08 , C23C14/083 , C23C14/28 , C30B29/16
摘要： A one-step and room-temperature process for depositing nanoparticles or nanocomposite (nanoparticle-assembled) films of metal oxides such as crystalline titanium dioxide (TiO2) onto a substrate surface using ultrafast pulsed laser ablation of Titania or metal titanium target. The system includes a pulsed laser with a pulse duration ranging from a few femtoseconds to a few tens of picoseconds, an optical setup for processing the laser beam such that the beam is focused onto the target surface with an appropriate average energy density and an appropriate energy density distribution, and a vacuum chamber in which the target and the substrate are installed and background gases and their pressures are appropriately adjusted.
摘要翻译：使用二氧化钛或金属钛靶的超快速脉冲激光烧蚀将金属氧化物如结晶二氧化钛（TiO 2）的纳米颗粒或纳米复合材料（纳米颗粒组装的）膜沉积到基底表面上的一步和室温方法。该系统包括脉冲激光，其脉冲持续时间范围从几飞秒到几十皮秒，用于处理激光束的光学设置，使得光束以适当的平均能量密度和适当的能量聚焦到目标表面上密度分布，以及真空室，其中安装了目标物和基质，背景气体及其压力被适当调节。

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