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    • 6. 发明申请
    • Semiconductor integrated circuit device and semiconductor memory using the same
    • 半导体集成电路器件和使用其的半导体存储器
    • US20050082613A1
    • 2005-04-21
    • US10917500
    • 2004-08-13
    • Kazuo Taguchi
    • Kazuo Taguchi
    • H01L21/28H01L21/8238H01L21/8244H01L21/84H01L27/092H01L27/11H01L27/12H01L29/423H01L29/49H01L29/786
    • H01L29/78615H01L21/84H01L27/1104H01L27/1203H01L29/42384H01L29/78621
    • Aspects of the invention can provide a semiconductor device including a transistor having a gate shape, which enables a source area and a body contact area to be connected without using wiring and with no gate part protruding to the source area side, and a semiconductor memory. The semiconductor device can have field regions, a transistor which includes a gate (L type gate), a gate insulating film directly below the gate, a body area directly below the gate insulating film, and a source area and a drain area formed on both sides which hold the body area in between. The gate can consist essentially of a first part extending along a channel width direction on the field region and a second part protruding from one end of the first part in the channel width direction to the drain side, and being formed in the L type gate in a plan view. A body contact area can be provided on the field region on the opposite side to the first part with the second part of the L type gate in between, and a low resistant layer is formed on a surface between the source area and the body contact area.
    • 本发明的方面可以提供一种半导体器件,其包括具有栅极形状的晶体管,其能够在不使用布线并且没有栅极部分突出到源极区侧的情况下连接源极区域和本体接触区域,以及半导体存储器。 半导体器件可以具有场区域,晶体管包括栅极(L型栅极),栅极正下方的栅极绝缘膜,栅极绝缘膜正下方的体区,以及形成在两者上的源极区和漏极区 身体区域之间的两侧。 栅极基本上可以由场区域上的沟道宽度方向延伸的第一部分和从沟道宽度方向上的第一部分的一端突出到漏极侧的第二部分形成在L型栅极中 一个平面图。 可以在与第一部分相反的一侧的场区域上设置体接触区域,其中L型栅极的第二部分在其间,并且在源区域和身体接触区域之间的表面上形成低阻力层 。
    • 8. 发明申请
    • Semiconductor device and semiconductor memory using the same
    • 半导体器件和使用其的半导体存储器
    • US20050077576A1
    • 2005-04-14
    • US10924995
    • 2004-08-25
    • Kazuo Taguchi
    • Kazuo Taguchi
    • H01L27/10G11C11/412H01L21/8244H01L27/02H01L27/11H01L27/12H01L29/786G11C11/34G11C16/04H01L27/01
    • G11C11/412H01L27/0207H01L27/1104H01L27/1203
    • Aspects of the invention can provide a semiconductor device and a semiconductor memory using the semiconductor device having a gate shape by which the width of the gate can be realized as designed even if relative shifts occur between the masks for forming the field regions and the gate patterns. The semiconductor device can include, in field regions, a gate (an H-type gate), a gate insulating film right under the gate, a body region right under the gate insulating film, and source/drain regions formed on both sides of and across the body region. The H-type gate can have a first section extending along the channel width direction on the field region, and a pair of second sections formed on both ends of the first section in the channel width direction and extending along the channel length direction, and is formed to be an H shape in plan view. Since a part of each of the pair of second sections of the H-type gate can be formed on a part of the field region having a constant length in the channel length direction, the channel width can be defined by the length of the first section.
    • 本发明的方面可以提供半导体器件和半导体存储器,其使用具有栅极形状的半导体器件,通过该栅极形状可以实现栅极的宽度,即使在用于形成场区域的掩模和栅极图案之间发生相对偏移 。 半导体器件可以在场区域中包括栅极(H型栅极),栅极正下方的栅极绝缘膜,栅极绝缘膜正下方的主体区域和形成在栅极绝缘膜两侧的源极/漏极区域 穿过身体区域。 H型栅极可以具有沿着场区域上的沟道宽度方向延伸的第一部分,以及在沟道宽度方向上形成在第一部分的两端并沿着沟道长度方向延伸的一对第二部分,并且是 在平面图中形成为H形。 由于H型栅极的一对第二部分中的每一个的一部分可以形成在沟道长度方向上具有恒定长度的场区域的一部分上,所以沟道宽度可以由第一部分的长度 。