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1. 发明授权

US06984299B2 Methods for determining organic component concentrations in an electrolytic solution 失效
标题翻译：测定电解液中有机成分浓度的方法
公开(公告)号：US06984299B2
公开(公告)日：2006-01-10
申请号：US10833194
申请日：2004-04-27
申请人： Jianwen Han , Mackenzie E. King
发明人： Jianwen Han , Mackenzie E. King
IPC分类号： C25D21/14
CPC分类号： C25D21/14 , C25D3/38
摘要： The present invention relates to a method and apparatus for determining organic additive concentrations in a sample electrolytic solution, preferably a copper electroplating solution, by measuring the double layer capacitance of a measuring electrode in such sample solution. Specifically, the present invention utilizes the correlation between double layer capacitance and the organic additive concentration for concentration mapping, based on the double layer capacitance measured for the sample electrolytic solution.
摘要翻译：本发明涉及一种通过测量这种样品溶液中的测量电极的双层电容来测定样品电解溶液（优选铜电镀溶液）中的有机添加剂浓度的方法和装置。具体地说，本发明基于对样品电解液测量的双层电容，利用双层电容与浓度映射的有机添加剂浓度之间的相关性。

2. 发明授权

US07435320B2 Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions 有权
标题翻译：用于监测电化学沉积溶液中有机添加剂的方法和装置
公开(公告)号：US07435320B2
公开(公告)日：2008-10-14
申请号：US10836546
申请日：2004-04-30
申请人： Jianwen Han , Mackenzie E. King , Weihua Wang , Glenn Tom , Jay Jung
发明人： Jianwen Han , Mackenzie E. King , Weihua Wang , Glenn Tom , Jay Jung
IPC分类号： G01N27/403
CPC分类号： C25D5/18 , C25D1/00 , C25D3/38 , C25D21/12 , C25D21/14 , G01N27/42 , H05K3/188 , H05K2203/163
摘要： The present invention relates in general to real-time analysis of electrochemical deposition (ECD) metal plating solutions, for the purpose of reducing plating defects and achieving high quality metal deposition. The present invention provides various new electrochemical analytical cell designs for reducing cross-contamination and increasing analytical signal strength. The present invention also provides improved plating protocols for increasing potential signal strength and reducing the time required for each measurement cycle. Further, the present invention provides new methods and algorithms for simultaneously determining concentrations of suppressor, accelerator, and leveler in a sample ECD solution within three experimental runs. A particularly preferred embodiment of the present invention provides a method for simultaneously determining concentrations of all three organic additives within a single experimental run by using a single analytical cell, while interactions between such additives are properly accounted for.
摘要翻译：本发明一般涉及电化学沉积（ECD）金属电镀溶液的实时分析，以减少电镀缺陷并实现高质量的金属沉积。本发明提供用于减少交叉污染和增加分析信号强度的各种新的电化学分析池设计。本发明还提供改进的电镀方案，用于增加潜在的信号强度并减少每个测量周期所需的时间。此外，本发明提供了用于在三个实验运行中同时测定样品ECD溶液中的抑制剂，促进剂和矫味剂的浓度的新方法和算法。本发明的一个特别优选的实施方案提供了一种通过使用单一分析电池同时测定单个实验运行中所有三种有机添加剂的浓度的方法，同时适当地考虑了这些添加剂之间的相互作用。

3. 发明授权

US07141156B2 One-point recalibration method for reducing error in concentration measurements for an electrolytic solution 有权
标题翻译：用于减少电解液浓度测量误差的一点重新校准方法
公开(公告)号：US07141156B2
公开(公告)日：2006-11-28
申请号：US10833192
申请日：2004-04-27
申请人： Jianwen Han , Mackenzie E. King , Glenn Tom , Steven Lurcott
发明人： Jianwen Han , Mackenzie E. King , Glenn Tom , Steven Lurcott
IPC分类号： G01N27/26
CPC分类号： G01N27/42 , C25D21/12
摘要： The present invention relates to a method for mathematically re-calibrating and adjusting an initial concentration analysis model that suffers from electrochemical measurement errors caused by surface state changes in the working/counter/reference electrode after extended usage. Specifically, such recalibration method reimburses long-term drift in the electrochemical measurements based on a single point testing.
摘要翻译：本发明涉及一种用于数学重新校准和调整初始浓度分析模型的方法，所述初始浓度分析模型在延长使用后受到工作/计数器/参比电极表面状态变化引起的电化学测量误差的影响。具体来说，这种重新校准方法基于单点测试来偿还电化学测量中的长期漂移。

4. 发明授权

US07080545B2 Apparatus and process for sensing fluoro species in semiconductor processing systems 失效
标题翻译：用于在半导体处理系统中感测氟物质的装置和方法
公开(公告)号：US07080545B2
公开(公告)日：2006-07-25
申请号：US10273036
申请日：2002-10-17
申请人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N9/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的检测器结构布置采用基于微机电系统（MEMS）的器件结构和/或独立的金属元件，其在需要高温感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

5. 发明申请

US20090305427A1 APPARATUS AND PROCESS FOR SENSING FLUORO SPECIES IN SEMICONDUCTOR PROCESSING SYSTEMS 有权
标题翻译：在半导体处理系统中感测荧光物种的装置和方法
公开(公告)号：US20090305427A1
公开(公告)日：2009-12-10
申请号：US12537910
申请日：2009-08-07
申请人： Frank Dimeo, JR. , Philip S.H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, JR. , Philip S.H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N33/00 , B01J19/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的结构布置中的检测器采用微机电系统（MEMS））的器件结构和/或独立的金属元件，其在需要升高的温度感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

6. 发明授权

US06844196B2 Analysis of antioxidant in solder plating solutions using molybdenum dichloride dioxide 失效
标题翻译：使用二氯二氯化二氧化锡焊接电镀溶液中的抗氧化剂分析
公开(公告)号：US06844196B2
公开(公告)日：2005-01-18
申请号：US10320875
申请日：2002-12-17
申请人： Mackenzie E. King , Cory Schomburg , Monica K. Hilgarth
发明人： Mackenzie E. King , Cory Schomburg , Monica K. Hilgarth
IPC分类号： G01N21/31 , G01N21/77 , G01N33/20 , G01N33/00 , G01N21/75
CPC分类号： G01N21/31 , G01N21/77 , G01N33/206 , Y10T436/203332
摘要： The present invention relates to antioxidant analysis for solder plating solutions, by using a complexing solution comprising a molybdenum compound, such as MoO2Cl2, to form a highly colored antioxidant-molybdenum complex, which can be detected and analyzed by UV-Vis spectroscopic, as a basis for concentration determination for the antioxidant.
摘要翻译：本发明涉及通过使用包含钼化合物如MoO 2 Cl 2的络合溶液形成可以通过UV-Vis光谱检测和分析的高度着色的抗氧化剂 - 钼络合物的焊料电镀溶液的抗氧化分析，作为抗氧化剂浓度测定的基础。

7. 发明授权

US06295861B1 Quartz crystal microbalance sensors and semiconductor manufacturing process systems comprising same 有权
标题翻译：石英晶体微量天平传感器和包括其的半导体制造工艺系统
公开(公告)号：US06295861B1
公开(公告)日：2001-10-02
申请号：US09238852
申请日：1999-01-28
申请人： Glenn M. Tom , Mackenzie E. King
发明人： Glenn M. Tom , Mackenzie E. King
IPC分类号： G01N2902
CPC分类号： G01N29/326 , B01D53/02 , G01N29/036 , G01N29/323 , G01N2033/0095
摘要： A sensor device for detecting the presence of a gas species in a gas environment susceptible to the presence of same. The sensor device may include a piezoelectric crystal coated with a sensor material having adsorptive affinity for the gas species, with an electric oscillator arranged for applying an oscillating electric field to the piezoelectric crystal to generate an output frequency therefrom indicative of the presence of the gas species when present in the gas environment, when the gas environment is exposed to the piezoelectric crystal. Another aspect of the invention involves a porous polymeric material that may be employed as a sensor material on a piezoelectric crystal sensor device, as well as a quartz microbalance holder that enables reactor gas monitoring. The sensor device alternatively may comprise an optical sensor arranged in a non-contaminating fashion in relation to the gas environment being monitored.
摘要翻译：一种传感器装置，用于检测易受其存在的气体环境中气体种类的存在。传感器装置可以包括涂覆有对气体种类具有吸附亲和性的传感器材料的压电晶体，其中电振荡器被布置成将振荡电场施加到压电晶体，以产生来自其的输出频率，表示存在气体种类当存在于气体环境中时，当气体环境暴露于压电晶体时。本发明的另一方面涉及可用作压电晶体传感器装置上的传感器材料的多孔聚合物材料以及能够进行反应器气体监测的石英微量天平保持器。传感器装置可以包括相对于被监测的气体环境以非污染方式布置的光学传感器。

8. 发明授权

US08109130B2 Apparatus and process for sensing fluoro species in semiconductor processing systems 有权
标题翻译：用于在半导体处理系统中感测氟物质的装置和方法
公开(公告)号：US08109130B2
公开(公告)日：2012-02-07
申请号：US12537910
申请日：2009-08-07
申请人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N33/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的结构布置中的检测器采用微机电系统（MEMS））的器件结构和/或独立的金属元件，其在需要升高的温度感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

9. 发明授权

US07475588B2 Apparatus and process for sensing fluoro species in semiconductor processing systems 有权
标题翻译：用于在半导体处理系统中感测氟物质的装置和方法
公开(公告)号：US07475588B2
公开(公告)日：2009-01-13
申请号：US11057734
申请日：2005-02-14
申请人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawacz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawacz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N9/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的结构布置中的检测器采用微机电系统（MEMS））的器件结构和/或独立的金属元件，其在需要升高的温度感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

10. 发明授权

US07296460B2 Apparatus and process for sensing fluoro species in semiconductor processing systems 有权
标题翻译：用于在半导体处理系统中感测氟物质的装置和方法
公开(公告)号：US07296460B2
公开(公告)日：2007-11-20
申请号：US11057594
申请日：2005-02-14
申请人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
发明人： Frank Dimeo, Jr. , Philip S. H. Chen , Jeffrey W. Neuner , James Welch , Michele Stawasz , Thomas H. Baum , Mackenzie E. King , Ing-Shin Chen , Jeffrey F. Roeder
IPC分类号： G01N7/00
CPC分类号： G01N27/128 , H01J37/3244 , H01J37/32935 , H01J37/32981 , Y10T29/49007 , Y10T436/17 , Y10T436/19
摘要： A gas detector and process for detecting a fluorine-containing species in a gas containing same, e.g., an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF3, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.
摘要翻译：用于检测含有其的气体中的含氟物质的气体检测器和方法，例如用HF，NF 3等进行蚀刻清洁的半导体加工工具的流出物。优选的检测器结构布置采用基于微机电系统（MEMS）的器件结构和/或独立的金属元件，其在需要高温感测时用作感测部件并且可选地作为热源。独立的金属元件可以直接制造在标准芯片载体/器件封装上，使得封装成为检测器的平台。

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