专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5069930A Method for the evaporation of monomers that are liquid at room temperature 失效
标题翻译：蒸发室内液体的方法
公开(公告)号：US5069930A
公开(公告)日：1991-12-03
申请号：US501230
申请日：1990-03-29
申请人： Ingo Hussla , Jochen Ritter
发明人： Ingo Hussla , Jochen Ritter
IPC分类号： C30B25/14 , C23C16/44 , C23C16/448
CPC分类号： C23C16/4485
摘要： Monomers containing silicon and oxygen which are liquid at room temperature and have a low vapor pressure are fed in a liquid state via a mass flow regulator to an evaporator provided with a body having capillary action where the liquid is evaporated by radiant heat. Evaporated monomer is fed to the reaction zone of a vacuum chamber where thin coatings are applied on substrates by chemical vapor deposition.

2. 发明授权

US4947789A Apparatus for vaporizing monomers that flow at room temperature 失效
标题翻译：用于蒸发在室温下流动的单体的装置
公开(公告)号：US4947789A
公开(公告)日：1990-08-14
申请号：US267077
申请日：1988-11-04
申请人： Ingo Hussla , Jochen Ritter
发明人： Ingo Hussla , Jochen Ritter
IPC分类号： C30B25/14 , C23C16/44 , C23C16/448
CPC分类号： C23C16/4485
摘要： An evaporator chamber has an entry end with a conduit connected to the output of a mass flow regulator, an exit end connected to a vacuum, and a wall surface extending therebetween. A body having capillary action is disposed in the chamber and has one end connected to the conduit and a free surface spaced from the wall surface in line of sight thereof. Heating means for the wall surface heats the body radiantly and causes monomer carried thereby to evaporate.
摘要翻译：蒸发器室具有入口端，导管连接到质量流量调节器的输出端，连接到真空的出口端和在其间延伸的壁表面。具有毛细管作用的主体设置在腔室中，并且其一端连接到管道，并且在其视线上与壁表面间隔开的自由表面。用于壁表面的加热装置使身体辐射加热，并使由此携带的单体蒸发。

3. 发明授权

US4948259A Method and apparatus for monitoring layer erosion in a dry-etching process 失效
标题翻译：用于在干法蚀刻工艺中监测层侵蚀的方法和装置
公开(公告)号：US4948259A
公开(公告)日：1990-08-14
申请号：US373883
申请日：1989-06-30
申请人： Knut Enke , Ingo Hussla , Gerhard Lorenz
发明人： Knut Enke , Ingo Hussla , Gerhard Lorenz
IPC分类号： G01B11/06 , H01J37/32
CPC分类号： H01J37/32935 , G01B11/0683
摘要： A method and apparatus for monitoring layer erosion in a dry-etching process. The apparatus has a first electrode that is electrically connected to a substrate to be etched, as well as a second electrode that is located above the first electrode. Both electrodes are situated inside a process chamber. An optical photometer is positioned outside of the process chamber and directed onto the substrate in the process chamber. Signals received from the optical photometer are amplified by an electrical circuit and are edited and displayed with a Fourier transformation. The etching process can be automatically interrupted when received periodic signals having essentially constant amplitude and frequency undergo a significant change during the etching process of the upper layer. That is, they are received as signals signficantly deviating from one another, this being identified by the electrical circuit as the passage from one layer to another layer of the substrate during the dry-etching process.
摘要翻译：用于在干蚀刻工艺中监测层侵蚀的方法和装置。该装置具有电连接到待蚀刻的基板的第一电极以及位于第一电极上方的第二电极。两个电极位于处理室内。光学光度计位于处理室的外部并且被引导到处理室中的衬底上。从光学光度计接收到的信号由电路放大并用傅里叶变换进行编辑和显示。当在上层的蚀刻工艺期间具有基本上恒定幅度和频率的接收周期信号经历显着变化时，可以自动中断蚀刻工艺。也就是说，它们作为显着偏离的信号被接收，这被电路识别为在干蚀刻工艺期间从衬底的一层到另一层的通道。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式