专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08350235B2 Semiconductor intra-field dose correction 有权
标题翻译：半导体场内剂量校正
公开(公告)号：US08350235B2
公开(公告)日：2013-01-08
申请号：US12509821
申请日：2009-07-27
申请人： Hyung-Rae Lee , Dong Hee Yu , Sohan Singh Mehta , Niall Shepherd , Daniel A Corliss
发明人： Hyung-Rae Lee , Dong Hee Yu , Sohan Singh Mehta , Niall Shepherd , Daniel A Corliss
IPC分类号： G21K5/10
CPC分类号： G03F7/70425 , G03F7/70066 , G03F7/70558 , G03F7/70625
摘要： A system and method are provided for automatic dose-correction recipe generation, the system including a dose-correction recipe generator, a reticle data unit in signal communication with the recipe generator, a slit data unit in signal communication with the recipe generator, a process data unit in signal communication with the recipe generator, a wafer data unit in signal communication with the recipe generator, a control unit in signal communication with the recipe generator, and an output unit or a storage unit in signal communication with the control unit; and the method including receiving a current reticle data set and a previous reticle data set, receiving a current slit data set and a previous slit data set, receiving a process condition, receiving a wafer condition, automatically generating a dose-correction recipe in accordance with the received reticle, slit, process and wafer information, and controlling a dose in accordance with the generated recipe.
摘要翻译：提供了一种用于自动剂量校正配方生成的系统和方法，该系统包括剂量校正配方生成器，与配方生成器进行信号通信的掩模版数据单元，与配方生成器进行信号通信的缝隙数据单元，与配方生成器进行信号通信的数据单元，与配方生成器进行信号通信的晶片数据单元，与配方生成器进行信号通信的控制单元，以及与控制单元进行信号通信的输出单元或存储单元; 并且所述方法包括接收目前的掩模版数据集和先前的掩模版数据集，接收当前狭缝数据集和先前的狭缝数据组，接收处理条件，接收晶片条件，根据以下步骤自动生成剂量校正配方接收到的掩模版，狭缝，处理和晶片信息，以及根据生成的食谱控制剂量。

2. 发明申请

US20110017926A1 SEMICONDUCTOR INTRA-FIELD DOSE CORRECTION 有权
标题翻译：半导体场内剂量校正
公开(公告)号：US20110017926A1
公开(公告)日：2011-01-27
申请号：US12509821
申请日：2009-07-27
申请人： Hyung-Rae Lee , Dong Hee Yu , Sohan Singh Mehta , Niall Shepherd , Daniel A. Corliss
发明人： Hyung-Rae Lee , Dong Hee Yu , Sohan Singh Mehta , Niall Shepherd , Daniel A. Corliss
IPC分类号： G21K5/10
CPC分类号： G03F7/70425 , G03F7/70066 , G03F7/70558 , G03F7/70625
摘要： A system and method are provided for automatic dose-correction recipe generation, the system including a dose-correction recipe generator, a reticle data unit in signal communication with the recipe generator, a slit data unit in signal communication with the recipe generator, a process data unit in signal communication with the recipe generator, a wafer data unit in signal communication with the recipe generator, a control unit in signal communication with the recipe generator, and an output unit or a storage unit in signal communication with the control unit; and the method including receiving a current reticle data set and a previous reticle data set, receiving a current slit data set and a previous slit data set, receiving a process condition, receiving a wafer condition, automatically generating a dose-correction recipe in accordance with the received reticle, slit, process and wafer information, and controlling a dose in accordance with the generated recipe.
摘要翻译：提供了一种用于自动剂量校正配方生成的系统和方法，该系统包括剂量校正配方生成器，与配方生成器进行信号通信的掩模版数据单元，与配方生成器进行信号通信的缝隙数据单元，与配方生成器进行信号通信的数据单元，与配方生成器进行信号通信的晶片数据单元，与配方生成器进行信号通信的控制单元，以及与控制单元进行信号通信的输出单元或存储单元; 并且所述方法包括接收目前的掩模版数据集和先前的掩模版数据集，接收当前狭缝数据集和先前的狭缝数据组，接收处理条件，接收晶片条件，根据以下步骤自动生成剂量校正配方接收到的掩模版，狭缝，处理和晶片信息，以及根据生成的食谱控制剂量。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式