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    • 3. 发明申请
    • DEPOSITION APPARATUS AND METHOD FOR MANUFACTURING FILM BY USING DEPOSITION APPARATUS
    • 沉积装置和使用沉积装置制造薄膜的方法
    • US20100075036A1
    • 2010-03-25
    • US12516328
    • 2008-03-10
    • Sadayuki OKAZAKIKazuyoshi HONDATomofumi YANAGIShoichi IMASHIKU
    • Sadayuki OKAZAKIKazuyoshi HONDATomofumi YANAGIShoichi IMASHIKU
    • C23C16/00
    • C23C14/562C23C14/02C23C14/226H01M4/0421H01M4/1395H01M10/052
    • A vapor deposition device 100 for moving a sheet-like substrate 4 in a roll-to-roll system in a chamber 2 to continuously form a vapor deposition film on the substrate 4. The vapor deposition device 100 comprises an evaporation source 9 for evaporating a vapor-depositing material; a transportation section including first and second rolls 3 and 8 for holding the substrate 4 in the state of being wound therearound and a guide section for guiding the substrate 4; and a shielding section, located in a vapor deposition possible zone, for forming a shielded zone which is not reachable by the vapor-depositing material from the evaporation source 9. Vapor deposition zones 60a through 60d include a planar transportation zone for transporting the substrate 4 such that the surface of the substrate 4 to be subjected to the vapor-depositing material is planar; and the transportation section is located with respect to the evaporation source 9 such that the vapor-depositing material is not incident on the substrate 4 in a direction of the normal to the substrate in the vapor deposition possible zone excluding the shielded zone.
    • 一种气相沉积装置100,用于在室2中的辊对辊系统中移动片状基底4,以在基底4上连续地形成气相沉积膜。气相沉积装置100包括蒸发源9 气相沉积材料; 一个传送部分,包括用于将基片4保持在其周围的状态的第一和第二辊子3和8;以及用于引导衬底4的引导部分; 以及位于气相沉积可能区域中的屏蔽部分,用于形成从蒸发源9不能通过气相沉积材料到达的屏蔽区域。蒸镀区域60a至60d包括用于输送基板4的平面输送区域 使得要经历气相沉积材料的基板4的表面是平面的; 并且运送部分相对于蒸发源9定位,使得气相沉积材料在除了屏蔽区域之外的气相沉积可能区域中不与基板的法线方向入射到基板4上。