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    • 1. 发明专利
    • METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR INTERGRATED CIRCUIT DEVICE
    • JPH0474433A
    • 1992-03-09
    • JP18821090
    • 1990-07-17
    • HITACHI LTDHITACHI VLSI ENG
    • NISHIUMA MASAHIKOKAMATA CHIYOSHIMISHIMAGI HIROMITSU
    • H01L21/60H01L21/321
    • PURPOSE:To remarkably enhance the connecting relaibility of an electrode to a bump electrode by a method wherein a metal foil is placed on the electrode on a mounting board, the electrode and the metal foil are heated and alloyed and the bump electrode is formed on the electrode. CONSTITUTION:An Au ribbon 11 is sucked and fixed onto a chuck block 35; a ribbon cutting blade 37 is lowered; the Au ribbon 11 is cut; an Au foil 12 having a prescribed area is formed. In succession, the foil is sucked by a chuck collet 39; it is conveyed to a metal-foil positioning part C; it is placed in the chip-mounting face of a package board 2. While the foil has been placed on a carrier 40, it is conveyed to a heating part D and is placed on a heating block 42. Then, in this state an electric current is applied to a heater 45 which has been built in the heating block 42; the package board 2 is heated to a prescribed temperature. Sn on the surface of electrodes 6 is diffused into the Au foil 12; a eutectic alloying reaction is caused; bump electrodes 7a which are composed of an Au-Sn alloy and which are in a molten state are formed on the respective electrodes 6 in a self-aligned manner. The residue of the Au foil 12 which has been sucked to a metal-foil fixation collet 43 is collected in a pocket 47; it is regenerated and utilized as the Au ribbon 11.
    • 3. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPH0412538A
    • 1992-01-17
    • JP11180890
    • 1990-05-01
    • HITACHI LTDHITACHI VLSI ENG
    • IMAI TOMIOKAMATA CHIYOSHI
    • H01L21/60
    • PURPOSE:To contrive a reduction in the size of a semiconductor device, whose leads are connected to the external terminals of a semiconductor chip, by a method wherein a conductor, to which a fixed potential is applied, is provided on the surface of each metal wiring interposing a dielectric between the metal wiring and the conductor. CONSTITUTION:A conductor 7c, to which a fixed potential is applied, is provided on the surface of each metal wire 7a interposing a dielectric 7b between the wire 7a and the conductor 7c. As a result, a parallel connection by-pass capacitor constituted using this metal wiring 7a connected with a lead wiring 4 for power supply use, to which a power supply is applied, as an electrode on one side and using the conductor 7c, to which the fixed potential is applied, as the other electrode can be formed within the occupation area of this metal wiring 7a. Thereby, the size of a package is reduced and a reduction in the size of a semiconductor device is contrived.
    • 9. 发明专利
    • SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
    • JPH03185900A
    • 1991-08-13
    • JP32374589
    • 1989-12-15
    • HITACHI LTDHITACHI VLSI ENG
    • IMAI TOMIOKAMATA CHIYOSHI
    • H05K7/20H01L23/36H01L23/373H01L25/04H01L25/18
    • PURPOSE:To perform highly integrated packaging and high-efficiency cooling of an ingot simultaneously by a method wherein a wiring metal film is formed on the outer surface of the ingot formed into a polyhedron, a cylindrical body or a spherical body in a prescribed pattern and semiconductor chips, which are connected to the wiring metal film, are mounted on the outer surface of the ingot. CONSTITUTION:IC chips 2 are adhered on the whole periphery of the outer surface of a hollow and polyhedral silicon ingot 1 at prescribed arrangement intervals. The ingot 1 is arranged its external shape into a hexagonal pillar by a chamfering work, for example, and the outer diameter and height of the hexagonal pillar are respectively set in a dimension to correspond to a mounting density, but the diameter of a hollow part 3 is provided comparatively large for improving a cooling effect. The individual IC chips 2 are directly formed on the ingot 1 in the same method as the manufacturing method of normal semiconductor element. In case the member of the IC chips 2 is high and the IC chips are formed on the whole periphery of the ingot 1, the heat generation at the time of operation of the ingot becomes a considerable one. Then a cooling medium is circulated in the hollow of the ingot 1. Thereby, the cooling of the ingot is performed.
    • 10. 发明专利
    • JIG FOR INSPECTING PROBE
    • JPH02172249A
    • 1990-07-03
    • JP32584088
    • 1988-12-26
    • HITACHI LTDHITACHI VLSI ENG
    • IMAI TOMIOKAMATA CHIYOSHI
    • G01R31/28H01L21/66
    • PURPOSE:To prevent influence of noise caused by a transmission system connected to a probe by a method wherein signal transmission between the probe and respective inspection machines is performed by using optical fiber cables. CONSTITUTION:A plurality of optical fiber cables 1 are used, which are to be connected to inspection machines and an optic fiber cable connector 2 on a probe. Therefore, a signal from a signal generator or the like is output to the optical fiber 1, and an electric signal is supplied to a probe 5 for supplying signal with photoelectric conversion at its end 3 and printed on a specimen 11 to be inspected. On the other hand, an electric signal output from the specimen 11 is photoelectrically converted at a signal processing unit 4 immediately after it exits from the probe 5 for outputting, and the optical signal is applied to a measurement input unit of an inspection machine via the optical fiber 1. This enables signal transmission to be performed by optical signals so that the signal is completely free from influence of noise and measurement accuracy may not deteriorate.