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    • 2. 发明授权
    • Digital realtime convergence correction circuit and method thereof
    • 数字实时会聚校正电路及其方法
    • US06392369B1
    • 2002-05-21
    • US09850542
    • 2001-05-07
    • Kyoung-hwan Kim
    • Kyoung-hwan Kim
    • H01J2970
    • H04N9/28
    • A convergence correction circuit including a coordinate unit which sets a predetermined range with first level values according to a screen length; an interval unit which divides the screen length; an interval decoder which calculates the value of the branch point of each interval determined by the interval unit; an interval gain unit which stores the gain of each interval; a subtracter which subtracts the output of the coordinate unit from the output of the interval decoder; a multiplier which multiplies the output of the subtracter by the output of the interval gain unit; a level shifter which sets an initial and last value of each interval upon horizontal scanning; an adder which adds the output of the multiplier and the output of the level shifter; a digital-analog converter which converts the output of the adder; and a correction coil which corrects the convergence according to the converted output.
    • 一种会聚校正电路,包括:坐标单元,其根据屏幕长度设定具有第一电平值的预定范围; 分隔屏幕长度的间隔单元; 间隔解码器,其计算由间隔单元确定的每个间隔的分支点的值; 间隔增益单元,其存储每个间隔的增益; 减法器,其从间隔解码器的输出中减去坐标单位的输出; 乘法器,将减法器的输出乘以间隔增益单元的输出; 电平移位器,其在水平扫描时设定每个间隔的初始值和最后值; 加法器,其将乘法器的输出和电平移位器的输出相加; 一个转换加法器的输出的数模转换器; 以及校正线圈,其根据转换的输出校正收敛。
    • 3. 发明授权
    • Nonvolatile semiconductor memory device
    • 非易失性半导体存储器件
    • US07408219B2
    • 2008-08-05
    • US11099658
    • 2005-04-06
    • Tea-kwang YuWeon-ho ParkKyoung-hwan KimKwang-tae Kim
    • Tea-kwang YuWeon-ho ParkKyoung-hwan KimKwang-tae Kim
    • H01L29/788
    • H01L27/115H01L27/11521H01L27/11524
    • In a nonvolatile semiconductor memory device, and a method of fabricating the same, the nonvolatile semiconductor memory device includes a cell doping region and source/drain regions in a semiconductor substrate, the cell doping region being doped as a first conductive type, a channel region disposed between the source/drain regions in the semiconductor substrate, a tunnel doping region of the first conductive type formed in a predetermined region of an upper portion of the cell doping region, the tunnel doping region being doped in a higher concentration than that of the cell doping region, a tunnel insulating layer formed on a surface of the semiconductor substrate on the tunnel doping region, a gate insulating layer surrounding the tunnel insulating layer and covering the channel region and the cell doping region exposed beyond the tunnel doping region, and a gate electrode covering the tunnel insulating layer and on the gate insulating layer.
    • 在非易失性半导体存储器件及其制造方法中,非易失性半导体存储器件包括半导体衬底中的单元掺杂区域和源极/漏极区域,该单元掺杂区域被掺杂为第一导电类型,沟道区域 设置在半导体衬底中的源极/漏极区之间,形成在电池掺杂区的上部的预定区域中的第一导电类型的隧道掺杂区,掺杂浓度高于 在隧道掺杂区域上形成在半导体衬底的表面上的隧道绝缘层,围绕隧道绝缘层并覆盖沟道区域的栅极绝缘层和暴露在隧道掺杂区域外的电池掺杂区域,以及 栅电极覆盖隧道绝缘层和栅极绝缘层。
    • 4. 发明申请
    • Method of fabricating nonvolatile semiconductor memory device
    • 制造非易失性半导体存储器件的方法
    • US20080293200A1
    • 2008-11-27
    • US12219995
    • 2008-07-31
    • Tea-kwang YuWeon-ho ParkKyoung-hwan KimKwang-tae Kim
    • Tea-kwang YuWeon-ho ParkKyoung-hwan KimKwang-tae Kim
    • H01L21/336
    • H01L27/115H01L27/11521H01L27/11524
    • In a nonvolatile semiconductor memory device, and a method of fabricating the same, the nonvolatile semiconductor memory device includes a cell doping region and source/drain regions in a semiconductor substrate, the cell doping region being doped as a first conductive type, a channel region disposed between the source/drain regions in the semiconductor substrate, a tunnel doping region of the first conductive type formed in a predetermined region of an upper portion of the cell doping region, the tunnel doping region being doped in a higher concentration than that of the cell doping region, a tunnel insulating layer formed on a surface of the semiconductor substrate on the tunnel doping region, a gate insulating layer surrounding the tunnel insulating layer and covering the channel region and the cell doping region exposed beyond the tunnel doping region, and a gate electrode covering the tunnel insulating layer and on the gate insulating layer.
    • 在非易失性半导体存储器件及其制造方法中,非易失性半导体存储器件包括半导体衬底中的单元掺杂区域和源极/漏极区域,该单元掺杂区域被掺杂为第一导电类型,沟道区域 设置在半导体衬底中的源极/漏极区之间,形成在电池掺杂区的上部的预定区域中的第一导电类型的隧道掺杂区,掺杂浓度高于 在隧道掺杂区域上形成在半导体衬底的表面上的隧道绝缘层,围绕隧道绝缘层并覆盖沟道区域的栅极绝缘层和暴露在隧道掺杂区域外的电池掺杂区域,以及 栅电极覆盖隧道绝缘层和栅极绝缘层。
    • 6. 发明申请
    • Nonvolatile semiconductor memory device and method of fabricating the same
    • 非易失性半导体存储器件及其制造方法
    • US20060006453A1
    • 2006-01-12
    • US11099658
    • 2005-04-06
    • Tea-kwang YuWeon-ho ParkKyoung-hwan KimKwang-tae Kim
    • Tea-kwang YuWeon-ho ParkKyoung-hwan KimKwang-tae Kim
    • H01L29/76H01L21/8238
    • H01L27/115H01L27/11521H01L27/11524
    • In a nonvolatile semiconductor memory device, and a method of fabricating the same, the nonvolatile semiconductor memory device includes a cell doping region and source/drain regions in a semiconductor substrate, the cell doping region being doped as a first conductive type, a channel region disposed between the source/drain regions in the semiconductor substrate, a tunnel doping region of the first conductive type formed in a predetermined region of an upper portion of the cell doping region, the tunnel doping region being doped in a higher concentration than that of the cell doping region, a tunnel insulating layer formed on a surface of the semiconductor substrate on the tunnel doping region, a gate insulating layer surrounding the tunnel insulating layer and covering the channel region and the cell doping region exposed beyond the tunnel doping region, and a gate electrode covering the tunnel insulating layer and on the gate insulating layer.
    • 在非易失性半导体存储器件及其制造方法中,非易失性半导体存储器件包括半导体衬底中的单元掺杂区域和源极/漏极区域,该单元掺杂区域被掺杂为第一导电类型,沟道区域 设置在半导体衬底中的源极/漏极区之间,形成在电池掺杂区的上部的预定区域中的第一导电类型的隧道掺杂区,掺杂浓度高于 在隧道掺杂区域上形成在半导体衬底的表面上的隧道绝缘层,围绕隧道绝缘层并覆盖沟道区域的栅极绝缘层和暴露在隧道掺杂区域外的电池掺杂区域,以及 栅电极覆盖隧道绝缘层和栅极绝缘层。
    • 7. 发明授权
    • Apparatus and method for removing horizontal moire in cathode-ray tube monitors
    • 用于去除阴极射线管监测器中水平波纹的装置和方法
    • US06847176B2
    • 2005-01-25
    • US10353598
    • 2003-01-29
    • Kyoung-hwan Kim
    • Kyoung-hwan Kim
    • G09G1/04H04N3/22H04N5/21H04N5/68
    • H04N5/68G09G1/04H04N3/22H04N5/21
    • An apparatus and method for removing horizontal moire of a cathode-ray tube (CRT) monitor system, wherein horizontal moire can be completely removed even when the moire that occurs in an upper portion of the monitor is different from the moire that occurs in a lower portion of the monitor. In one aspect of the invention, a method for removing horizontal moire in a cathode ray tube (CRT) monitor comprises generating moire correction data in synchronization with a vertical synchronous signal, the moire correction data comprising a sawtooth waveform, adjusting one of a direct current (DC) component, an alternating current (AC) component, and both the DC and AC component, of the moire correction data, outputting the adjusted moire correction data for every other horizontal scan line in synchronization with an odd-numbered or an even-numbered horizontal synchronous signal, and delaying a horizontal drive signal in response to the output adjusted moire correction data.
    • 一种用于去除阴极射线管(CRT)监视器系统的水平波纹的装置和方法,其中即使当在监视器的上部发生的莫尔不同于在下部发生的莫尔条纹时,水平波纹也可以被完全去除 显示器的一部分。 在本发明的一个方面,一种用于去除阴极射线管(CRT)监视器中的水平云纹的方法,包括与垂直同步信号同步地产生莫尔校正数据,该莫尔校正数据包括锯齿波形,调整直流电 (DC)分量,交流(AC)分量,以及直线和交流分量两者的莫尔校正数据,与奇数编号或偶数分频同步地输出每隔一个水平扫描线的调整后的莫尔修正数据, 并且响应于输出调节的莫尔校正数据延迟水平驱动信号。