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1. 发明专利

JP2010077003A Crucible for melting silicon and release agent used for the same 审中-公开
标题翻译：用于熔化硅和用于其的释放剂
公开(公告)号：JP2010077003A
公开(公告)日：2010-04-08
申请号：JP2008250628
申请日：2008-09-29
申请人： Covalent Materials Corp , コバレントマテリアル株式会社
发明人： OHASHI TADASHI , UMEMOTO SEIJIRO , ICHIKI TAKESHI
IPC分类号： C01B33/12 , B22C3/00 , B22D25/04
摘要： PROBLEM TO BE SOLVED: To provide a crucible for melting silicon provided with a protective film excellent in releasability and suppressing generation of crack and breakage of a silicon block due to adhesion between the protective film and the silicon block by the collapse of the protective film itself upon demolding the silicon block from the crucible, and to provide a release agent used for the crucible.
SOLUTION: The crucible for melting silicon comprises a crucible body 1 comprising a heat-resistant member and a protective film 2 formed at least on the inner surface 1a of the crucible body 1. The protective film 2 comprises: first solid particles having, at least on the surface thereof, a composition of SiO
X N
Y (X>0 and Y>0) and second solid particles having an SiO
2 composition and a smaller particle diameter than that of the first solid particles; and the second solid particles connect the first solid particles with each other at a part of the interface between the first solid particles.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种坩埚，其具有提供脱模性优异的保护膜的熔融硅，并且由于保护膜和硅块之间的粘合而导致的硅块的裂纹产生和硅块的破裂，保护膜本身将硅块从坩埚中脱模，并提供用于坩埚的脱模剂。解决方案：用于熔化硅的坩埚包括坩埚主体1，其包括耐热构件和至少形成在坩埚主体1的内表面1a上的保护膜2.保护膜2包括：第一固体颗粒，其具有，至少在其表面上具有SiO Y （X> 0和Y> 0）的组成和SiO 2 SB 2的第二固体颗粒， / SB>组成，并且比第一固体颗粒的粒径小; 并且所述第二固体颗粒在所述第一固体颗粒之间的界面的一部分处将所述第一固体颗粒彼此连接。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2009269792A Silicon melting crucible and mold release agent used for it 审中-公开
标题翻译：用于其的硅胶粉碎和模具释放剂
公开(公告)号：JP2009269792A
公开(公告)日：2009-11-19
申请号：JP2008121545
申请日：2008-05-07
申请人： Covalent Materials Corp , コバレントマテリアル株式会社
发明人： OHASHI TADASHI , UMEMOTO SEIJIRO , ICHIKI TAKESHI
IPC分类号： C01B33/02 , B22C3/00 , B22D25/04 , C01B21/082
摘要： PROBLEM TO BE SOLVED: To provide a silicon melting crucible extremely little in the dissolving quantity of impurity to a silicon melt and excellent in the releasing property of the crucible and silicon crystal obtained by solidifying the silicon melt in the crucible.
SOLUTION: This silicon melting crucible 10 has a structure of a crucible body 12 constructed with a heat resistant member and laid with a protective film 14 at least on its inner surface. The composition of the protective film 14 is SiO
X N
Y (X>0, Y>0).
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了将硅熔融坩埚提供到硅熔体中的溶解量极少，并且通过使坩埚中的硅熔体固化而获得的坩埚和硅晶体的脱模性优异。解决方案：该硅熔融坩埚10具有由耐热构件构成的坩埚体12的结构，并且至少在其内表面上铺设有保护膜14。保护膜14的组成是SiO（X> 0，Y> 0）。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2010077005A Crucible for melting silicon and release agent used for the same 审中-公开
标题翻译：用于熔化硅和用于其的释放剂
公开(公告)号：JP2010077005A
公开(公告)日：2010-04-08
申请号：JP2008250814
申请日：2008-09-29
申请人： Covalent Materials Corp , コバレントマテリアル株式会社
发明人： OHASHI TADASHI , UMEMOTO SEIJIRO , ICHIKI TAKESHI
IPC分类号： C01B33/02 , H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a crucible for melting silicon provided with a protective film excellent in releasability, from which the protective film does not peel even when thermal shock or physical shock is generated, and to provide a release agent used for the crucible. SOLUTION: The crucible for melting silicon comprises a crucible body 1 comprising a heat-resistant member and a protective film 2 formed at least on the inner surface 1a of the crucible body 1, wherein in the protective film 2, a plurality of solid particles, in which an oxide film is formed on the surface thereof and a direct inner layer of the oxide film has a composition of SiO X N Y (X>0 and Y>0), are connected with each other through the oxide film. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于熔化硅的坩埚，其提供具有优异的脱模性的保护膜，即使产生热冲击或物理冲击，保护膜也不会剥离，并且提供用于坩埚。解决方案：用于熔化硅的坩埚包括坩埚主体1，其包括耐热构件和至少形成在坩埚主体1的内表面1a上的保护膜2，其中在保护膜2中，多个在其表面形成有氧化膜的固体颗粒和氧化膜的直接内层具有SiO X的组成（X> 0和/ Y> 0）通过氧化膜彼此连接。版权所有（C）2010，JPO＆INPIT

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