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1. 发明授权

US07202939B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07202939B2
公开(公告)日：2007-04-10
申请号：US11018927
申请日：2004-12-22
申请人： Cheng-Qun Gui , Pieter Willem Herman De Jager , Robert-Han Munnig Schmidt
发明人： Cheng-Qun Gui , Pieter Willem Herman De Jager , Robert-Han Munnig Schmidt
IPC分类号： G03B27/72 , G03B27/54 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，包括用于将光束横截面赋予图案的独立可控元件阵列的图案化装置，用于支撑衬底的衬底台以及包含微透镜的投影系统阵列，用于将光束投影到基板的目标部分上。提供误差补偿器，用于提供用于补偿微透镜阵列中的位置误差的影响的误差校正值，并且提供灰度调制器，用于根据纠错值按顺序将驱动信号提供给图案化装置的可控元件以通过相对于图案的其它部分改变图案的一些部分的强度来补偿微透镜阵列中位置误差的影响。

2. 发明授权

US07342644B2 Methods and systems for lithographic beam generation 有权
标题翻译：光刻光束生成的方法和系统
公开(公告)号：US07342644B2
公开(公告)日：2008-03-11
申请号：US11023628
申请日：2004-12-29
申请人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Robert-Han Munnig Schmidt , Henri Johannes Petrus Vink
发明人： Johannes Jacobus Matheus Baselmans , Anastasius Jacobus Anicetus Bruinsma , Pieter Willem Herman De Jager , Robert-Han Munnig Schmidt , Henri Johannes Petrus Vink
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/7005
摘要： A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.
摘要翻译：光刻照明装置和方法包括从多个对应的辐射源接收多个源辐射束，沿着公共光束路径偏转多个源辐射束，从而产生投影辐射束，将辐射束投射到横截面图案，以及将图案化的投影辐射束投影到基板的目标部分上。

3. 发明授权

US07016016B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07016016B2
公开(公告)日：2006-03-21
申请号：US10875530
申请日：2004-06-25
申请人： Robert-Han Munnig Schmidt , Pieter Willem Herman De Jager , Theodorus Leonardus Van Den Akker
发明人： Robert-Han Munnig Schmidt , Pieter Willem Herman De Jager , Theodorus Leonardus Van Den Akker
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/7085 , G03B27/58 , G03F7/70758 , G03F7/70775 , G03F7/70791 , G03F7/70816 , G03F9/708 , G03F9/7084 , G03F9/7088
摘要： A lithographic apparatus patterns a projection beam of radiation using a patterning system. A substrate is supported on a substrate table and the patterned beam is projected onto the substrate on the table. A substrate displacement control system displaces the substrate relative to the table and the projection system in a predetermined direction, such that the patterned beam is scanned across the substrate. The position of the substrate relative to the table and the patterned beam is determined by the displacement control system. The displacement control system comprises at least one component that is displaceable with the substrate and a positioning apparatus to place that component in contact with the substrate, such that the component is displaced with the substrate as the projection beam is scanned across the substrate and such that the component is lifted from the substrate after the projection beams has been scanned across the substrate. The component could be, for example, an elongate strip carrying alignment marks or a magnet which is used to apply a displacement force to the substrate.
摘要翻译：光刻设备使用图案化系统对辐射投影束进行图案化。衬底被支撑在衬底台上，并且将图案化的光束投影到桌子上的衬底上。基板位移控制系统使基板相对于工作台和投影系统沿预定方向移位，使得图案化的光束跨过基板扫描。基板相对于工作台和图案化梁的位置由位移控制系统确定。位移控制系统包括至少一个可与衬底移位的部件和定位装置以使该部件与衬底接触，使得当投影束跨过衬底扫描时，该部件与衬底一起移位，并且使得在投影光束被扫描穿过基板之后，该部件被从基板提升。组件可以是例如带有对准标记的细长带或用于向基板施加位移力的磁体。

4. 发明申请

US20070242246A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20070242246A1
公开(公告)日：2007-10-18
申请号：US11733327
申请日：2007-04-10
申请人： Cheng-Qun GUI , Pieter De Jager , Robert-Han Munnig Schmidt
发明人： Cheng-Qun GUI , Pieter De Jager , Robert-Han Munnig Schmidt
IPC分类号： G03B27/42 , G01B3/00
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.
摘要翻译：光刻设备包括用于提供辐射束的照明系统，包括用于将光束横截面赋予图案的独立可控元件阵列的图案化装置，用于支撑衬底的衬底台以及包含微透镜的投影系统阵列，用于将光束投影到基板的目标部分上。提供误差补偿器，用于提供用于补偿微透镜阵列中的位置误差的影响的误差校正值，并且提供灰度调制器，用于根据纠错值按顺序将驱动信号提供给图案化装置的可控元件以通过相对于图案的其它部分改变图案的一些部分的强度来补偿微透镜阵列中位置误差的影响。

5. 发明申请

US20060132750A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20060132750A1
公开(公告)日：2006-06-22
申请号：US11018927
申请日：2004-12-22
申请人： Cheng-Qun Gui , Pieter De Jager , Robert-Han Munnig Schmidt
发明人： Cheng-Qun Gui , Pieter De Jager , Robert-Han Munnig Schmidt
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70308
摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

6. 发明授权

US09696633B2 Substrate handling apparatus and lithographic apparatus 有权
公开(公告)号：US09696633B2
公开(公告)日：2017-07-04
申请号：US13582725
申请日：2011-03-14
申请人： Johannes Onvlee , Robert-Han Munnig Schmidt
发明人： Johannes Onvlee , Robert-Han Munnig Schmidt
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20 , B65H23/24
CPC分类号： G03F7/70258 , B65H23/245 , B65H2406/311 , G03F7/70275 , G03F7/70283 , G03F7/70391 , G03F7/70525 , G03F7/70583 , G03F7/707 , G03F7/70775 , G03F7/70816
摘要： A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.

7. 发明授权

US07016020B2 Positioning device 失效
标题翻译：定位装置
公开(公告)号：US07016020B2
公开(公告)日：2006-03-21
申请号：US10846832
申请日：2004-05-17
申请人： Robert-Han Munnig Schmidt
发明人： Robert-Han Munnig Schmidt
IPC分类号： G03B27/58 , G03B27/62 , H02K41/00
CPC分类号： G03F7/70758 , H02K41/0356 , H02K2201/18
摘要： A positioning device for positioning an object is presented. The positioning device includes a first drive unit and a second drive unit for positioning the object. The first drive unit has a first part connected to the object and a second part connected to a first part of the second drive unit. The positioning device further includes a permanent magnet system constructed and arranged to provide at least part of the force for accelerating or decelerating the object.
摘要翻译：提出了一种用于定位物体的定位装置。定位装置包括用于定位物体的第一驱动单元和第二驱动单元。第一驱动单元具有连接到物体的第一部分和连接到第二驱动单元的第一部分的第二部分。该定位装置还包括永磁体系统，其构造和布置成提供用于加速或减速物体的至少一部分力。

8. 发明授权

US06498350B2 Crash prevention in positioning apparatus for use in lithographic projection apparatus 有权
标题翻译：用于光刻投影设备的定位装置中的防撞
公开(公告)号：US06498350B2
公开(公告)日：2002-12-24
申请号：US09739106
申请日：2000-12-19
申请人： Yim Bun P. Kwan , Engelbertus A. F. van de Pasch , Andreas B. G. Ariens , Edwin J. Buis , Jan F. Hoogkamp , Robert-Han Munnig Schmidt
发明人： Yim Bun P. Kwan , Engelbertus A. F. van de Pasch , Andreas B. G. Ariens , Edwin J. Buis , Jan F. Hoogkamp , Robert-Han Munnig Schmidt
IPC分类号： H01J3713
CPC分类号： G03F7/70733 , G03F7/70716
摘要： In a multi-table lithographic apparatus in which substrate tables may be exchanged between a first working zone where substrates are loaded onto and removed from the table and a second working zones where wafers are exposed, collision prevention means are provided to prevent collisions between tables in the exchange process. The collision prevention means may be formed of a labyrinth or a revolving door. The exchange process may be controlled by shuttles, optionally including drive means, that are interlinked so that the tables can only be exchanged between zones together.
摘要翻译：在其中衬底台可以在其中将基板装载到桌子上并从桌子上移除的第一工作区域和其中晶片暴露的第二工作区域之间进行交换的多工位平版印刷设备中，提供了防止碰撞的装置，交流过程。碰撞防止装置可以由迷宫式或旋转门形成。交换过程可以通过彼此连接的梭子（可选地包括驱动装置）来控制，使得表只能在区域之间交换。

9. 发明授权

US08368868B2 Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless 有权
标题翻译：具有用于控制非接触式图案形成装置的平面位置的气体压力装置的平版印刷装置
公开(公告)号：US08368868B2
公开(公告)日：2013-02-05
申请号：US12627087
申请日：2009-11-30
申请人： Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
发明人： Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70775 , G03F7/70816 , G03F7/70866
摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
摘要翻译：光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控制图案形成装置在其平面方向上的位置。位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置一个非接触的方式。

10. 发明申请

US20100159399A1 LITHOGRAPHIC APPARATUS WITH GAS PRESSURE MEANS FOR CONTROLLING A PLANAR POSITION OF A PATTERNING DEVICE CONTACTLESS 有权
标题翻译：用于控制连续装置的平面位置的气体压力装置的平面设备
公开(公告)号：US20100159399A1
公开(公告)日：2010-06-24
申请号：US12627087
申请日：2009-11-30
申请人： Johannes Petrus Martinus Bernardus VERMEULEN , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
发明人： Johannes Petrus Martinus Bernardus VERMEULEN , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70775 , G03F7/70816 , G03F7/70866
摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
摘要翻译：光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控制图案形成装置在其平面方向上的位置。位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置一个非接触的方式。

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