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    • 6. 发明专利
    • Colloidal silica finishing for metal fluoride optical component
    • 金属氟化物光学部件的胶体二氧化硅涂层
    • JP2010089251A
    • 2010-04-22
    • JP2009196686
    • 2009-08-27
    • Corning Incコーニング インコーポレイテッド
    • FENG JIANGWEIPHUNG MAISABIA ROBERT
    • B24B37/00B08B3/08B08B3/12G02B1/02G02B3/00
    • B24B13/00G02B1/02G02B27/0006Y10T428/268
    • PROBLEM TO BE SOLVED: To considerably improve durability of an optical component so as to solve a deterioration problem of an optical component or to extend its use period. SOLUTION: A finishing method for an optical component made of alkaline earth metal fluoride and the optical component made of alkaline earth manufactured by using the finishing method are provided. The finishing method used for the last polishing process uses polishing slurry made of colloidal silica including silica particles with a particle size of 500 nm or below in particular. Further, this finishing method can remove the whole silica residue on the polished optical component by using a megasonic cleaning process using a high PH-detergent cleaning solution after colloidal silica polishing. Surface roughness of the optical component polished by using the finishing method but is not etched yet is less than 0.5 nm, the surface roughness after polishing and etching is less than 0.6 nm, and step height of the surface roughness is less than 6 nm. COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了显着提高光学部件的耐久性,以解决光学部件的劣化问题或延长其使用周期。 解决方案:提供了一种由碱土金属氟化物制成的光学部件的精加工方法和通过使用精加工方法制造的由碱土制成的光学部件。 用于最后抛光工艺的精加工方法使用由胶体二氧化硅制成的抛光浆料,其特别包括粒度为500nm以下的二氧化硅颗粒。 此外,这种整理方法可以通过使用在胶体二氧化硅抛光后使用高PH洗涤剂清洁溶液的超声波清洗方法来除去抛光的光学部件上的全部二氧化硅残留物。 使用精加工方法抛光但未被蚀刻的光学部件的表面粗糙度小于0.5nm,抛光和蚀刻后的表面粗糙度小于0.6nm,表面粗糙度的台阶高度小于6nm。 版权所有(C)2010,JPO&INPIT