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1. 发明专利

JP2004018954A Production method for titanium-based metal product, and titanium-based metal product 有权
公开(公告)号：JP2004018954A
公开(公告)日：2004-01-22
申请号：JP2002176243
申请日：2002-06-17
申请人： Actment Co Ltd , Takahisa Deguchi , 出口貴久 , 株式会社アクトメント
发明人： DEGUCHI TAKAHISA , OGAWA AKIRA , KYO KENJI , CHIKAMORI KUNIO
IPC分类号： C25F3/18 , C22C14/00 , C22C19/03
摘要： PROBLEM TO BE SOLVED: To provide a production method for a titanium-based metal product with a mirror finish by electrolytically polishing a titanium-based metal product at a relatively low current density; and a titanium-based metal product with a mirror finish.
SOLUTION: The production method comprises the step of immersing a titanium-based metal product in a non-aqueous electrolytic solution to electrolytically polish the product and the step of subjecting the product after stopping the electolytic polishing to an ultrasonic treatment in the electrolytic solution. Thus produced titanium-based metal product has a mirror surface section on its surface, provided that the Ti content in the mirror surface section is higher than that in sections other than the mirror surface section.
COPYRIGHT: (C)2004,JPO

2. 发明专利

JP2005240144A Production method for titanium-based metal product 有权
标题翻译：基于钛的金属产品的生产方法
公开(公告)号：JP2005240144A
公开(公告)日：2005-09-08
申请号：JP2004053845
申请日：2004-02-27
申请人： Actment Co Ltd , Takahisa Deguchi , 貴久出口 , 株式会社アクトメント
发明人： DEGUCHI TAKAHISA , OGAWA AKIRA , KYO KENJI , CHIKAMORI KUNIO
IPC分类号： C25F3/26
摘要： PROBLEM TO BE SOLVED: To provide a method capable of obtaining a titanium-based metal product with a smooth mirror finish on the surface while drastically reducing the time for polishing.
SOLUTION: The production method for the titanium-based metal product having a mirror finish section on the surface comprises immersing the titanium-based metal product into a non-aqueous electrolytic solution and electrolytically polishing the metal product at a current density of the range from 40 to 200 mA/cm
2 , then electrolytically polishing the product at a current density lower than the current density in the high current density electrolytic polishing step and at the current density in the range from 5 to 40 mA/cm
2 .
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够在表面上获得具有光滑镜面光洁度的钛基金属产品的方法，同时显着减少抛光时间。解决方案：在表面上具有镜面精加工部分的钛基金属制品的制造方法包括将钛基金属制品浸入非水电解液中，并以电流密度电解抛光金属产品范围为40〜200mA / cm 2，然后在高电流密度电解研磨工序中以比电流密度低的电流密度电解研磨该产品，电流密度为5〜 40mA / cm 2 SP / 2。版权所有（C）2005，JPO＆NCIPI

3. 发明授权

US6149504A Method and apparatus for profile mirror surface grinding 失效
标题翻译：型材镜面磨削的方法和装置
公开(公告)号：US6149504A
公开(公告)日：2000-11-21
申请号：US258135
申请日：1999-02-26
申请人： Hitoshi Ohmori , Naoki Arai , Kiyotaka Noguchi , Takahisa Deguchi , Tamotsu Toeda , Hiroyuki Oguma , Hisayoshi Shindo , Yutaka Nagai
发明人： Hitoshi Ohmori , Naoki Arai , Kiyotaka Noguchi , Takahisa Deguchi , Tamotsu Toeda , Hiroyuki Oguma , Hisayoshi Shindo , Yutaka Nagai
IPC分类号： B24B19/20 , B24B53/00 , B24B53/013 , B24B53/053 , B24B49/00
CPC分类号： B24B53/013 , B24B19/20 , B24B53/001 , B24B53/02 , B24B53/053
摘要： (A) Applying a voltage between an electrically conductive grindstone (1) and a shaping electrode (4) for shaping the grindstone, generating a spark on a contact point by contacting the shaping electrode to the grindstone, thereby shaping the grindstone by the spark, and (B) simultaneously applying a voltage between the grindstone and a dressing electrode (2) for dressing the grindstone that is oppositely aligned to the grindstone without contact, supplying the electrically conductive grinding fluid between them, thereby dressing the grindstone by electrolytic dressing. According to these steps, highly efficient and simultaneous processing is achieved to provide a high precision profiling high quality mirror.
摘要翻译：（A）在导电磨石（1）和成形电极（4）之间施加电压，用于成形磨石，通过使成形电极与磨石接触而在接触点产生火花，由此通过火花成形磨石，和（B）同时在磨石和修整电极（2）之间施加电压，用于修磨与磨石相对排列的磨石而不接触，在它们之间供应导电研磨液，从而通过电解敷料来修整磨石。根据这些步骤，实现了高效率和同时处理，以提供高精度的高质量镜面。

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