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1. 发明授权

US5166039A Peeling solution for photo- or electron beam-sensitive resin and process for peeling off said resin 失效
标题翻译：用于光电子束或电子束敏感树脂的剥离溶液和用于剥离所述树脂的方法
公开(公告)号：US5166039A
公开(公告)日：1992-11-24
申请号：US704608
申请日：1991-05-23
申请人： Yoshio Maeda , Shigeki Shimokawa
发明人： Yoshio Maeda , Shigeki Shimokawa
IPC分类号： G03F7/42
CPC分类号： G03F7/423
摘要： The peeling solution for photo- or electron beam-sensitive resin according to the present invention consists of an aqueous solution comprising hydrogen peroxide and a compound represented by the general formula (I) ##STR1## wherein R.sub.1 is H or an alkyl group of 1-2 carbon atoms, R.sub.2 is H or an alkyl group of 1-3 carbon atoms, and R.sub.3 is H or an alkyl group of 1-3 carbon atoms.The process for peeling off a photo- or electron beam-sensitive resin according to the present invention comprises a step of treating a photo- or electron beam-sensitive resin-coated substrate with a peeling solution for photo- or electron beam-sensitive resin cnsisting of an aqueous solution comprising hydrogen peroxide and a compound represented by the above general formula (I).
摘要翻译：根据本发明的光电子束敏感树脂的剥离溶液由包含过氧化氢和通式（I）表示的化合物的水溶液组成：其中R1是H或烷基 1-2个碳原子，R2是H或1-3个碳原子的烷基，R3是H或1-3个碳原子的烷基。根据本发明的用于剥离光电子束敏感树脂的方法包括用用于光电子束或电子束敏感树脂的剥离溶液处理光电子束敏感树脂涂覆的基材的步骤的包含过氧化氢的水溶液和由上述通式（I）表示的化合物。

2. 发明授权

US5037724A Peeling solution for photo- or electron beam-sensitive resin 失效
标题翻译：用于光电子束或电子束敏感树脂的剥离溶液
公开(公告)号：US5037724A
公开(公告)日：1991-08-06
申请号：US314961
申请日：1989-02-24
申请人： Yoshio Maeda , Shigeki Shimokawa
发明人： Yoshio Maeda , Shigeki Shimokawa
IPC分类号： G03F7/42
CPC分类号： G03F7/423
摘要： The peeling solution for photo- or electron beam-sensitive resin according to the present invention consists of an aqueous solution consisting of hydrogen peroxide and a compound represented by the general formula (I) ##STR1## wherein R.sub.1 is H or an alkyl group of 1-2 carbon atoms, R.sub.2 is H or an alkyl group of 1-3 carbon atoms, and R.sub.3 is H or an alkyl group of 1-3 carbon atoms.
摘要翻译：根据本发明的光电子束敏感树脂的剥离溶液由由过氧化氢和由通式（I）表示的化合物组成的水溶液组成：其中R 1是H或烷基 1-2个碳原子的基团，R2是H或1-3个碳原子的烷基，R3是H或1-3个碳原子的烷基。

3. 发明授权

US5456898A Method for enrichment and purification of aqueous hydrogen peroxide solution 失效
标题翻译：富含和纯化过氧化氢水溶液的方法
公开(公告)号：US5456898A
公开(公告)日：1995-10-10
申请号：US303834
申请日：1994-09-09
申请人： Shigeki Shimokawa , Yoshitsugu Minamikawa , Seishi Murakami
发明人： Shigeki Shimokawa , Yoshitsugu Minamikawa , Seishi Murakami
IPC分类号： C01B15/013 , C01B15/01
CPC分类号： C01B15/013 , C01B15/0135
摘要： Proposed is an improvement in a method for the preparation of an enriched and purified aqueous hydrogen peroxide solution from a crude aqueous hydrogen peroxide solution comprising the steps of evaporating the crude aqueous hydrogen peroxide solution in an evaporator into vapor with accompanying liquid in the form of a mist, separating the vapor from the mist of liquid in a gas-liquid separator and subjecting the vapor to fractionating distillation in a fractionating distillation column in order to greatly upgrade the product solution relative to the impurity content. The improvement is achieved by subjecting the crude aqueous hydrogen peroxide solution, prior to introduction into the evaporator, to a contacting treatment with a porous synthetic adsorbent resin to remove organic impurities from the crude aqueous hydrogen peroxide solution to such an extent that the crude aqueous hydrogen peroxide solution after the contacting treatment contains organic impurities in an amount not exceeding 50 ppm by weight calculated as organic carbon. Although the mechanism is not well understood, the preliminary removal of organic impurities from the crude aqueous hydrogen peroxide solution has an effect of greatly increasing the efficiency of gas-liquid separation of the vapor accompanied by a mist of liquid in the gas-liquid separator to decrease the amount of contaminant impurities introduced into the distillation column as carried by the mist.
摘要翻译：提出了从粗制过氧化氢水溶液制备富集和纯化的过氧化氢水溶液的方法的改进，包括以下步骤：将蒸发器中的粗过氧化氢水溶液蒸发成蒸汽，伴随液体为在气 - 液分离器中分离蒸气与液雾的蒸气，并在分馏蒸馏塔中对蒸汽进行分馏，以相对于杂质含量大大提升产物溶液。改进之处在于，将粗水过氧化氢溶液在引入蒸发器之前，与多孔合成吸附剂树脂进行接触处理以从粗过氧化氢水溶液中除去有机杂质，使得粗制氢水接触处理后的过氧化物溶液含有不超过作为有机碳计算的50重量ppm的有机杂质。虽然机理尚不清楚，但是从粗过氧化氢水溶液中初步除去有机杂质具有大大提高伴随气液分离器中的液体雾气的气液分离效率，减少由雾气引入到蒸馏塔中的污染物杂质的量。

4. 发明授权

US4999179A Method for purifying impure aqueous hydrogen peroxide solution 失效
标题翻译：纯化不纯过氧化氢水溶液的方法
公开(公告)号：US4999179A
公开(公告)日：1991-03-12
申请号：US447521
申请日：1989-12-07
申请人： Yasuo Sugihara , Shigeki Shimokawa
发明人： Yasuo Sugihara , Shigeki Shimokawa
IPC分类号： C01B15/013
CPC分类号： C01B15/0135
摘要： A method for purifying an impure aqueous hydrogen peroxide solution, which comprises passing an impure aqueous hydrogen peroxide solution through(a) a cation exchange resin layer, a halogen-containing porous resin layer and an anion exchange resin layer in this order, or(b) a halogen-containing porous resin layer, a cation exchange resin layer and an anion exchange resin layer in this order, or(c) a halogen-containing porous resin layer and a cation/anion mixed-bed resin layer in this order to contact said solution with each resin.
摘要翻译：一种净化不纯的过氧化氢水溶液的方法，其包括使不纯的过氧化氢水溶液依次通过（a）阳离子交换树脂层，含卤素多孔树脂层和阴离子交换树脂层，或（b ）含卤素多孔树脂层，阳离子交换树脂层和阴离子交换树脂层，或（c）含卤多孔树脂层和阳离子/阴离子混合树脂层，以接触所述溶液与每种树脂。

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