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    • 2. 发明申请
    • PROCESS FOR PRODUCING PENTAFLUOROETHANE AND FOR PURIFYING 1,1,1,2-TETRAFLUOROETHANE
    • 用于生产五氟乙烷和1,1,1,2-四氟乙烷的净化
    • WO1995010494A1
    • 1995-04-20
    • PCT/EP1994003299
    • 1994-10-06
    • SOLVAY FLUOR UND DERIVATE GMBHHERKELMANN, RalfRUDOLPH, WernerSANDER, Rüdiger
    • SOLVAY FLUOR UND DERIVATE GMBH
    • C07C19/08
    • C07C17/04C07C17/395C07C19/08
    • The invention relates to a process for producing pentafluoroethane from unsaturated compounds with two carbon atoms substituted by hydrogen and possibly fluorine, especially trifluoroethylene. The process can also be used in a process for purifying R134a of such unsaturated compounds. 1,1,1,2-tetrafluoroethane (R134a), a substitute for CFC be produced by addition reaction of hydrofluorides to trifluoroethylene (R1123). Due to the method, unsaturated CHF components, especially the initial compound, are present as traces in the product and have a toxic effect. It has been found that such unsaturated CHF components in R134a can be removed by reaction with high-valency metal fluorides, especially CoF3. Pentafluoroethane (R125) is formed which is not toxic and can, if desired, be removed from the R134a by ordinary processes like distillation and is a useful substance. Surprisingly, R125 and R134a are not fully fluorinated by high-valency metal fluorides in suitable conditions.
    • 本发明涉及一种用于从具有两个,与氢和任选氟取代的碳原子,特别是从三氟属不饱和化合物生产五氟乙烷的方法。 该方法也可以在为R134a的的这类不饱和化合物的纯化方法中使用。 1,1,1,2-四氟乙烷(R134a)等一个CFC替代品,可以通过加入的氟化氢来制备,以三氟乙烯(R1123)。 不饱和CHF组件,特别是原料化合物是,由于包含在产品中的痕迹的处理,并且具有毒性作用。 现已发现,在R134a的这种不饱和CHF部件通过用高价金属氟化物反应,尤其是失效后果3可以被去除。 它形成五氟乙烷(R125),其是无毒的,并且,如果需要,通过常规方法,例如 可以从R-134a的通过蒸馏分离,并表示一个有价值的材料。 令人惊讶地,没有从高价金属氟化物R125和R134a合适的条件下durchfluoriert。
    • 3. 发明申请
    • PRODUCTION OF CARBOXYLIC ACID FLUORIDES
    • 生产碳素酰基氟
    • WO1998024750A1
    • 1998-06-11
    • PCT/EP1997006647
    • 1997-11-28
    • SOLVAY FLUOR UND DERIVATE GMBHBRAUN, MaxEICHHOLZ, KerstinRUDOLPH, Werner
    • SOLVAY FLUOR UND DERIVATE GMBH
    • C07C51/58
    • C07C51/60B01J19/02B01J19/123B01J2219/00078B01J2219/0245B01J2219/0254B01J2219/0875C07C51/58C07C53/50C07C53/48C07C53/46
    • The invention relates to a method for the production of carboxylic acid fluorides of the formula RCFXC(O)F, wherein X designates F or Cl. Compounds of the formula RCFXCHFCl are reacted with oxygen by photochemical oxidation in the gaseous phase. This yields good quantities of highly selective carboxylic acid fluorides. It is preferable to work under sensitization with chlorine and light at a wavelength of lambda >/=280 nm. This makes it possible to work without the use of pressure. Glass apparatus may be covered with a protective coating so as to protect it against traces of hydrogen fluoride. To this end, for example, heat-shrinkable sleeves made of translucent hydrogen fluoride-resistant material may be used. Polytetrafluoroethylene, polyfluoropropylene or a mixture thereof are especially suitable for this purpose. This type of protection is also suited for other reactions, such as photo-induced fluoro-dediazonation in hydrogen fluoride/pyridine for the production of aromatic compounds fluorinated in the nucleus or the oxidation of CHCL2 groups for the production of carboxylic acid fluorides.
    • 公开的是用于制备式RCFXC(O)F,其中X是F或Cl的羧酸氟化物的方法。 反应与氧气式RCFXCHFCl的化合物转化成在气相中的光化学氧化。 形成以良好的收率和高选择性的羧酸氟化物。 优选在敏化进行与波长为λ的氯和光> / = 280纳米。这是可能的,而不的工作压力。 玻璃装置可被提供用于防止RF迹线以保护涂层。 对于这一个就可以了,例如, 热收缩使用耐HF,半透明材料制成。 作为该材料聚四氟乙烯,Polyfluorpropylen或它们的混合物是特别合适的。 这种保护也适用于其它反应,例如,光诱导氟dediazoniation在氟化氢/吡啶生产核氟化的芳族化合物的或CHCl 2的基团为羧酸氯化物的制剂的目的氧化的目的。