专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012145866A1 METHOD, APPARATUS AND SYSTEM FOR DETERMINING VOLTAGE STANDING WAVE RATIO IN DOWNLINK PERIOD OF RADIO COMMUNICATION 审中-公开
标题翻译：用于确定无线电通信下行电压阶段的电压波动比的方法，装置和系统
公开(公告)号：WO2012145866A1
公开(公告)日：2012-11-01
申请号：PCT/CN2011/000759
申请日：2011-04-29
申请人： TELEFONAKTIEBOLAGET L M ERICSSON (publ) , GAO, Xiang , LI, Yazhuo
发明人： GAO, Xiang , LI, Yazhuo
IPC分类号： H04B7/00 , G01R27/06
CPC分类号： H04W24/08 , G01R27/06 , H04B17/103
摘要： The present invention discloses a method for determining a Voltage Standing Wave Ratio (VSWR) in downlink period of a radio communication, comprising: coupling a forward signal into a Transmitter Observation Receiver (TOR) via a Radio Frequency (RF) switch; feeding a reversed signal in a reversed path from a third port of a circulator into the TOR via the RF switch; making down conversion, filtering and converting the forward signal and the reversed signal from an analog signal into digital baseband signal respectively; measuring and storing power levels of the forward signal and the reversed signal in form of digital baseband; and calculating VSWR or Return Loss (RL) value from the stored power levels of the forward signal and the reversed signal. A corresponding apparatus and radio communication system are also provided. This provides an improved VSWR detection method with low complexity and low cost, etc.
摘要翻译：本发明公开了一种在无线电通信的下行链路周期中确定电压驻波比（VSWR）的方法，包括：通过射频（RF）开关将前向信号耦合到发射机观测接收机（TOR）; 在从循环器的第三端口经由RF开关到TOR的反向路径中馈送反向信号; 分别将正向信号和反相信号从模拟信号转换，滤波和转换成数字基带信号; 以数字基带的形式测量和存储正向信号和反相信号的功率电平; 以及从正向信号和反转信号的存储功率电平计算VSWR或回波损耗（RL）值。还提供了相应的装置和无线电通信系统。这提供了一种具有低复杂度和低成本等的改进的VSWR检测方法。

2. 发明申请

WO2005014753A1 NON-POLYMERIC ORGANIC PARTICLES FOR CHEMICAL MECHANICAL PLANARIZATION 审中-公开
标题翻译：用于化学机械平面化的非聚合有机颗粒
公开(公告)号：WO2005014753A1
公开(公告)日：2005-02-17
申请号：PCT/US2003/039840
申请日：2003-12-15
申请人： DYNEA CHEMICALS OY , TANG, Kwok , LI, Yazhuo , CHOWDHURY, Atanu, Roy , BIAN, Guomin , CHEEMALAPATI, Krishnayya
发明人： LI, Yazhuo , CHOWDHURY, Atanu, Roy , BIAN, Guomin , CHEEMALAPATI, Krishnayya
IPC分类号： C09K3/14
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1409 , C09K3/1463
摘要： An abrasive composition comprising non-polymeric organic particles that is useful for chemical mechanical planarization (CMP), and which can widely be used in the semiconductor industry. The inventive compositions preferably comprise soft water in combination with 0.001 - 20 w/w % of non-polymeric organic particles, 0.1 - 10 w/w % of an oxidizing agent, 0.05 - 10 w/w % of a chelating agent, 0.01 - 10 w/w % of a surfactant, and 0 - 10 w/w % of a passivation agent at a pH in the range of 2-12, wherein said percentages are w/w (weight/weight) percentages, based on the total weight of said compositions. The abrasive compositions provide an efficient polishing rate, excellent selectivity and good surface quality when utilized as a new abrasive composition in CMP applications.
摘要翻译：包含可用于化学机械平面化（CMP）的非聚合有机颗粒并且可广泛用于半导体工业中的研磨组合物。本发明的组合物优选包含软水与0.001-20w / w％的非聚合有机颗粒，0.1-10w / w％的氧化剂，0.05-10w / w％的螯合剂，0.01〜 10w / w％的表面活性剂，和0-10w / w％的钝化剂，pH在2-12的范围内，其中所述百分比是w / w（重量/重量）百分比，基于总计所述组合物的重量。当用作CMP应用中的新磨料组合物时，磨料组合物提供了有效的抛光速率，优异的选择性和良好的表面质量。

3. 发明申请

WO2012054951A1 PRINT HEAD MAINTENANCE SYSTEM 审中-公开
标题翻译：打印头维护系统
公开(公告)号：WO2012054951A1
公开(公告)日：2012-05-03
申请号：PCT/AU2010/001418
申请日：2010-10-25
申请人： SILVERBROOK RESEARCH PTY LTD , KARPPINEN, Vesa , LI, Yazhuo , JENSEN, David William
发明人： KARPPINEN, Vesa , LI, Yazhuo , JENSEN, David William
IPC分类号： B41J2/165
CPC分类号： B41J2/16585 , B41J2/16532
摘要： A print head maintenance system for maintaining a stationary print head is disclosed. The maintenance includes both cleaning and priming. In one embodiment the system includes a suction nozzle, a pump for supplying suction to the suction nozzle, and a positioning mechanism for moving the suction nozzle longitudinally past the print head. In an alternative embodiment the system further includes an ejection nozzle closely spaced to the suction nozzle, and a further pump for supplying fluid to the ejection nozzle. The positioning mechanism moves the ejection and suction nozzles longitudinally past the print head.
摘要翻译：公开了一种用于维持固定打印头的打印头维护系统。维护包括清洁和启动。在一个实施例中，系统包括吸嘴，用于向吸嘴提供抽吸的泵以及用于使吸嘴纵向移动经过打印头的定位机构。在替代实施例中，系统还包括与吸嘴紧密间隔开的喷嘴，以及用于向喷嘴供应流体的另一泵。定位机构使排出口和吸嘴纵向移动经过打印头。

4. 发明申请

WO2011109853A1 PRINTHEAD WIPING SYSTEM 审中-公开
标题翻译： PRINTHEAD WIPING系统
公开(公告)号：WO2011109853A1
公开(公告)日：2011-09-15
申请号：PCT/AU2010/000265
申请日：2010-03-08
申请人： SILVERBROOK RESEARCH PTY LTD , KARPPINEN, Vesa , LI, Yazhuo , LOUIS, Gerard
发明人： KARPPINEN, Vesa , LI, Yazhuo , LOUIS, Gerard
IPC分类号： B41J2/165
CPC分类号： B41J2/16585 , B41J2/16535 , B41J2/16552
摘要： A maintenance system for maintaining a stationary printhead is disclosed. The maintenance system includes a porous wiper element movable longitudinally past the printhead. The wiper element contacts the printhead during movement in at least one direction of longitudinal movement. A pump is included for pumping liquid into the wiper element. A rotating means is included for spinning the wiper element to thereby spin liquid and contaminants from the wiper element. By spinning the wiper element the wetness thereof is reset to a known condition. Advantageously the wetness of the wiper element is then set to a desired level by controlling the amount of liquid pumped by the pump into the wiper element. In order to clean the wiper element, the wiper element is saturated with liquid before spinning the wiper element again, followed by another spinning operation. Other levels of wetness include a level for rehydrating the printhead, and another level for wiping the printhead.
摘要翻译：公开了维护固定打印头的维护系统。维护系统包括可沿着打印头纵向移动的多孔擦拭器元件。擦拭器元件在纵向运动的至少一个方向的运动期间接触打印头。包括用于将液体泵入刮水器元件的泵。包括旋转装置以旋转擦拭器元件，从而从擦拭器元件旋转液体和污染物。通过旋转刮水器元件，其湿度被重新设定为已知状态。有利的是，通过控制泵抽入刮水器元件的液体量，将刮水器元件的湿度设定到所需的水平。为了清洁刮水器元件，在再次旋转刮水器元件之前，擦拭器元件被液体饱和，接着进行另一个旋转操作。其他湿度水平包括用于再水化打印头的水平，以及擦拭打印头的另一个水平。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式