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1. 发明授权

US06238824B1 Method for designing and making photolithographic reticle, reticle, and photolithographic process 有权
标题翻译：光刻掩模版，光罩和光刻工艺的设计和制造方法
公开(公告)号：US06238824B1
公开(公告)日：2001-05-29
申请号：US09386314
申请日：1999-08-31
申请人： John R. Futrell , Christophe Pierrat , William Stanton
发明人： John R. Futrell , Christophe Pierrat , William Stanton
IPC分类号： G03F900
CPC分类号： G03F9/7003 , G03F1/36 , G03F7/70441
摘要： There are provided methods for making a reticle for use in a photolithography process, comprising generating an first reticle layout having at least one printable reticle feature, generating a modified reticle layout having the first reticle layout and at least one correction area, generating an alignment budget-containing reticle layout having at least one different printable reticle feature and at least one alignment budget border area, and removing from the modified reticle layout any area of overlap between the at least one correction area and the at least one alignment budget border area. There are also provided reticles formed according to such methods. In addition, there are provided computer-implemented methods for designing such a reticle, as well as computer readable storage media, and computer systems for use in making such reticles. In addition, there are provided photolithographic processes using such a reticle.
摘要翻译：提供了用于制造用于光刻工艺的掩模版的方法，包括产生具有至少一个可打印掩模版特征的第一掩模布局，产生具有第一掩模版布局的修改的掩模版布局和至少一个校正区域，产生对准预算具有至少一个不同的可打印标线特征和至少一个对准预算边界区域的标线布局，以及从所述修改的标线布局移除所述至少一个校正区域和所述至少一个对准预算边界区域之间的任何重叠区域。还提供根据这种方法形成的掩模版。此外，提供了用于设计这种掩模版的计算机实现的方法以及计算机可读存储介质以及用于制作这种掩模版的计算机系统。此外，提供了使用这种掩模版的光刻工艺。

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