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    • 5. 发明授权
    • Childrens ride-on vehicles having mechanical assemblies
    • 具有机械组件的儿童乘坐车辆
    • US07988524B2
    • 2011-08-02
    • US12389775
    • 2009-02-20
    • Gerald P. SitarskiDavid GroberRonald M. Asbach
    • Gerald P. SitarskiDavid GroberRonald M. Asbach
    • A63H17/00
    • B62K9/00A63G19/20
    • A children's ride-on vehicle is disclosed. In some embodiments, the vehicle may include a body including at least one seat sized for a child; a plurality of wheels including at least one driven wheel; a battery-powered drive assembly configured to selectively drive the rotation of the at least one driven wheel; a mechanical assembly including a first mechanical member movably connected to the body and configured to move among a plurality of positions including a first position in which one or more portions of the first mechanical member are not visible, and a second position in which the one or more portions of the first mechanical member are visible; and at least one user input device positioned to receive inputs from a child sitting on the at least one seat, and configured to selectively move the first mechanical member between the first and second positions.
    • 披露了儿童骑乘车。 在一些实施例中,所述车辆可以包括主体,所述主体包括至少一个尺寸适于儿童的座位; 多个车轮,包括至少一个从动轮; 电池供电的驱动组件,被配置为选择性地驱动所述至少一个从动轮的旋转; 机械组件,包括可移动地连接到主体并被构造成在包括第一机构的一个或多个部分不可见的第一位置的多个位置和第二位置之间移动的第一机械部件,在第二位置, 第一机械构件的更多部分是可见的; 以及至少一个用户输入装置,其定位成接收来自坐在所述至少一个座椅上的儿童的输入,并且被配置为在所述第一和第二位置之间选择性地移动所述第一机械构件。
    • 6. 发明申请
    • CHILDRENS RIDE-ON VEHICLES HAVING MECHANICAL ASSEMBLIES
    • 具有机械装配的儿童驾驶车辆
    • US20100216372A1
    • 2010-08-26
    • US12389775
    • 2009-02-20
    • Gerald P. SitarskiDavid GroberRonald M. Asbach
    • Gerald P. SitarskiDavid GroberRonald M. Asbach
    • A63H17/26B60K1/00
    • B62K9/00A63G19/20
    • A children's ride-on vehicle is disclosed. In some embodiments, the vehicle may include a body including at least one seat sized for a child; a plurality of wheels including at least one driven wheel; a battery-powered drive assembly configured to selectively drive the rotation of the at least one driven wheel; a mechanical assembly including a first mechanical member movably connected to the body and configured to move among a plurality of positions including a first position in which one or more portions of the first mechanical member are not visible, and a second position in which the one or more portions of the first mechanical member are visible; and at least one user input device positioned to receive inputs from a child sitting on the at least one seat, and configured to selectively move the first mechanical member between the first and second positions.
    • 披露了儿童骑乘车。 在一些实施例中,所述车辆可以包括主体,所述主体包括至少一个尺寸适于儿童的座位; 多个车轮,包括至少一个从动轮; 电池供电的驱动组件,被配置为选择性地驱动所述至少一个从动轮的旋转; 机械组件,包括可移动地连接到主体并被构造成在包括第一机构的一个或多个部分不可见的第一位置的多个位置和第二位置之间移动的第一机械部件,在第二位置, 第一机械构件的更多部分是可见的; 以及至少一个用户输入装置,其定位成接收来自坐在所述至少一个座椅上的儿童的输入,并且被配置为在所述第一和第二位置之间选择性地移动所述第一机械构件。
    • 7. 发明申请
    • METHODS AND COMPOSITIONS FOR IMAGING ACIDS IN CHEMICALLY AMPLIFIED PHOTORESISTS USING PH-DEPENDENT FLUOROPHORES
    • 使用PH依赖性荧光素在化学放大光电体中成像酸的方法和组合物
    • US20010001698A1
    • 2001-05-24
    • US09320101
    • 1999-05-26
    • Robert David Grober
    • ROBERT D. GROBERSCOTT J. BUKOFSKYPAUL M. DENTINGERJAMES W. TAYLOR
    • G03C001/73G03C005/16
    • G03F7/0045G03F7/105
    • A method of imaging acids in chemically amplified photoresists involves exposing to radiation a chemically amplified photoresist comprising a pH-dependent fluorophore. Upon exposure to radiation, such as deep-UV radiation, the chemically amplified photoresist produces an acid, which is then visualized by the fluorescence of the pH-dependent fluorophore. An image is generated from the fluorescence of the pH-dependent fluorophore, thus providing a map of the location of the acid in the photoresist. The images are able to be visualized prior to a post-exposure bake of the resist composition. Chemically amplified photoresists comprising pH-dependent fluorophores are useful in the practice of the present invention. The method finds particular use in examining the efficiency of photoacid generators in chemically amplified photoresists, in that it allows the practitioner the ability to directly determine the amount of acid generated within the photoresist.
    • 在化学放大的光致抗蚀剂中成像酸的方法包括将包含pH依赖荧光团的化学放大的光致抗蚀剂暴露于辐射。 在暴露于诸如深紫外辐射的辐射之后,化学放大的光致抗蚀剂产生酸,然后通过pH依赖性荧光团的荧光显现出酸。 从pH依赖荧光团的荧光产生图像,从而提供光致抗蚀剂中酸的位置的图。 在抗蚀剂组合物的曝光后烘烤之前,图像能够被可视化。 包含pH依赖性荧光团的化学放大光致抗蚀剂在本发明的实践中是有用的。 该方法特别用于检查化学放大光致抗蚀剂中光酸产生剂的效率,因为其允许从业者直接测定光致抗蚀剂内产生的酸的量的能力。
    • 8. 发明授权
    • Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores
    • 使用pH依赖性荧光团在化学放大光致抗体中成像酸的方法和组合物
    • US06376149B2
    • 2002-04-23
    • US09320101
    • 1999-05-26
    • Robert David GroberScott Josef BukofskyPaul Michael DentingerJames Welch Taylor
    • Robert David GroberScott Josef BukofskyPaul Michael DentingerJames Welch Taylor
    • G03C516
    • G03F7/0045G03F7/105
    • A method of imaging acids in chemically amplified photoresists involves exposing to radiation a chemically amplified photoresist comprising a pH-dependent fluorophore. Upon exposure to radiation, such as deep-UV radiation, the chemically amplified photoresist produces an acid, which is then visualized by the fluorescence of the pH-dependent fluorophore. An image is generated from the fluorescence of the pH-dependent fluorophore, thus providing a map of the location of the acid in the photoresist. The images are able to be visualized prior to a post-exposure bake of the resist composition. Chemically amplified photoresists comprising pH-dependent fluorophores are useful in the practice of the present invention. The method finds particular use in examining the efficiency of photoacid generators in chemically amplified photoresists, in that it allows the practitioner the ability to directly determine the amount of acid generated within the photoresist.
    • 在化学放大的光致抗蚀剂中成像酸的方法包括将包含pH依赖荧光团的化学放大的光致抗蚀剂暴露于辐射。 在暴露于诸如深紫外辐射的辐射之后,化学放大的光致抗蚀剂产生酸,然后通过pH依赖性荧光团的荧光显现出酸。 从pH依赖性荧光团的荧光产生图像,从而提供光致抗蚀剂中酸的位置的图。 在抗蚀剂组合物的曝光后烘烤之前,图像能够被可视化。 包含pH依赖性荧光团的化学放大光致抗蚀剂在本发明的实践中是有用的。 该方法特别用于检查化学放大光致抗蚀剂中光酸产生剂的效率,因为其允许从业者直接测定光致抗蚀剂内产生的酸的量的能力。