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1. 发明申请

US20110212567A1 METHOD OF FABRICATING IMAGE SENSOR AND REWORKING METHOD THEREOF 有权
标题翻译：制作图像传感器的方法及其制作方法
公开(公告)号：US20110212567A1
公开(公告)日：2011-09-01
申请号：US12714093
申请日：2010-02-26
申请人： Hsin-Ting TSAI , Cheng-Hung Yu , Chin-Kuang Liu , Kun-Yen Hsu
发明人： Hsin-Ting TSAI , Cheng-Hung Yu , Chin-Kuang Liu , Kun-Yen Hsu
IPC分类号： H01L31/0232 , H01L31/18 , H01L27/14
CPC分类号： H01L27/14687 , H01L27/14636 , H01L27/14685
摘要： A method of fabricating an image sensor device is provided. First, a substrate comprising a pixel array region and a pad region is provided. A patterned metal layer and a first planarization layer having an opening exposing the patterned metal layer in the pad region are sequentially formed on the substrate. A color filter array is formed on the first planarization layer in the pixel array region. A second planarization layer is formed to cover the color filter array and filled into the opening. A plurality of microlens is formed above the color filter array on the second planarization layer. A capping layer is conformally formed on the microlens and the second planarization layer. An etching step is performed to remove the capping layer and the second planarization layer in the opening so as to expose the patterned metal layer in the pad region.
摘要翻译：提供一种制造图像传感器装置的方法。首先，提供包括像素阵列区域和衬垫区域的衬底。图案化金属层和具有露出焊盘区域中的图案化金属层的开口的第一平坦化层依次形成在基板上。在像素阵列区域中的第一平坦化层上形成滤色器阵列。形成第二平坦化层以覆盖滤色器阵列并填充到开口中。在第二平坦化层上的滤色器阵列上方形成多个微透镜。覆盖层保形地形成在微透镜和第二平坦化层上。执行蚀刻步骤以去除开口中的覆盖层和第二平坦化层，以暴露焊盘区域中的图案化金属层。

2. 发明申请

US20110139188A1 WAFER CLEANING DEVCIE AND METHOD THEREOF 有权
标题翻译： WAFER CLEANING DEVCIE及其方法
公开(公告)号：US20110139188A1
公开(公告)日：2011-06-16
申请号：US12635710
申请日：2009-12-11
申请人： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Ming-Hsin Lee , Wei-Hong Chuang , Kuei-Chang Tung , Yan-Yi Lu , Chin-Chin Wang
发明人： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Ming-Hsin Lee , Wei-Hong Chuang , Kuei-Chang Tung , Yan-Yi Lu , Chin-Chin Wang
IPC分类号： B08B3/00
CPC分类号： B08B3/04 , B08B3/02 , H01L21/67051 , H01L21/6708
摘要： A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.
摘要翻译：一种晶片清洗装置，包括用于保持具有待清洗表面的晶片的晶片台，位于晶片上方的第一喷嘴，位于晶片上方的第二喷嘴。第一高度在第一喷嘴和表面之间，第二高度在第二喷嘴和表面之间，其中第一高度比第二高度短。

3. 发明授权

US08707974B2 Wafer cleaning device 有权
标题翻译：晶圆清洗装置
公开(公告)号：US08707974B2
公开(公告)日：2014-04-29
申请号：US12635710
申请日：2009-12-11
申请人： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Ming-Hsin Lee , Wei-Hong Chuang , Kuei-Chang Tung , Yan-Yi Lu , Chin-Chin Wang
发明人： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Ming-Hsin Lee , Wei-Hong Chuang , Kuei-Chang Tung , Yan-Yi Lu , Chin-Chin Wang
IPC分类号： B08B3/02
CPC分类号： B08B3/04 , B08B3/02 , H01L21/67051 , H01L21/6708
摘要： A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height.
摘要翻译：一种晶片清洗装置，包括用于保持具有待清洗表面的晶片的晶片台，位于晶片上方的第一喷嘴，位于晶片上方的第二喷嘴。第一高度在第一喷嘴和表面之间，第二高度在第二喷嘴和表面之间，其中第一高度比第二高度短。

4. 发明授权

US08084289B2 Method of fabricating image sensor and reworking method thereof 有权
标题翻译：图像传感器的制作方法及其返工方法
公开(公告)号：US08084289B2
公开(公告)日：2011-12-27
申请号：US12714093
申请日：2010-02-26
申请人： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Kun-Yen Hsu
发明人： Hsin-Ting Tsai , Cheng-Hung Yu , Chin-Kuang Liu , Kun-Yen Hsu
IPC分类号： H01L21/00
CPC分类号： H01L27/14687 , H01L27/14636 , H01L27/14685
摘要： A method of fabricating an image sensor device is provided. First, a substrate comprising a pixel array region and a pad region is provided. A patterned metal layer and a first planarization layer having an opening exposing the patterned metal layer in the pad region are sequentially formed on the substrate. A color filter array is formed on the first planarization layer in the pixel array region. A second planarization layer is formed to cover the color filter array and filled into the opening. A plurality of microlens is formed above the color filter array on the second planarization layer. A capping layer is conformally formed on the microlens and the second planarization layer. An etching step is performed to remove the capping layer and the second planarization layer in the opening so as to expose the patterned metal layer in the pad region.
摘要翻译：提供一种制造图像传感器装置的方法。首先，提供包括像素阵列区域和衬垫区域的衬底。图案化金属层和具有露出焊盘区域中的图案化金属层的开口的第一平坦化层依次形成在基板上。在像素阵列区域中的第一平坦化层上形成滤色器阵列。形成第二平坦化层以覆盖滤色器阵列并填充到开口中。在第二平坦化层上的滤色器阵列上方形成多个微透镜。覆盖层保形地形成在微透镜和第二平坦化层上。执行蚀刻步骤以去除开口中的覆盖层和第二平坦化层，以暴露焊盘区域中的图案化金属层。

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