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    • 2. 发明授权
    • Antidandruff agents and cosmetic preparations
    • 去头屑剂和化妆品制剂
    • US5494658A
    • 1996-02-27
    • US317030
    • 1994-10-03
    • Heinz HanelWaltraud SimschAlwin K. Reng
    • Heinz HanelWaltraud SimschAlwin K. Reng
    • A61K8/00A61K8/49A61Q5/00A61Q5/02A61Q15/00A61Q19/10C07D213/89A61K7/06A61K7/08A61K7/32
    • A61K8/4926A61Q15/00A61Q5/006Y10S514/88Y10S514/881
    • The invention relates to cosmetic preparations which have a content of compounds of the general formula I ##STR1## in which R.sup.1, R.sup.2 and R.sup.3 are identical or different and are hydrogen or alkyl with 1 to 4 carbon atoms, where R.sup.1 and R.sup.3 are preferably hydrogen and R.sup.2 is preferably methyl,X is S or O,Y is hydrogen or up to two halogen atoms, preferably chlorine and/or bromine,Z is a single bond or the divalent radicals 0, S, --CH.sub.2 --, --CH.sub.2 --O--, --O--CH.sub.2 --, --CH.sub.2 --S--, --S--CH.sub.2 -- or --CH.dbd.CH--CH.sub.2 --O--,Ar is an aromatic ring system which has up to two rings and which can be substituted by up to three radicals from the group comprising fluorine, chlorine, bromine, methoxy, C.sub.1 -C.sub.4 -alkyl, trifluoromethyl and trifluoromethoxy,and/or their salts.The invention furthermore relates to the use of these cosmetic preparations as antidandruff composition and deodorant cosmetic composition.
    • 本发明涉及具有通式I(I)化合物含量的化妆品制剂,其中R 1,R 2和R 3相同或不同,为氢或具有1至4个碳原子的烷基,其中R 1和R 3 优选为氢,R 2优选为甲基,X为S或O,Y为氢或最多两个卤素原子,优选为氯和/或溴,Z为单键或二价基团0,S,-CH 2 - , - CH2-O-,-O-CH2-,-CH2-S-,-S-CH2-或-CH = CH-CH2-O-,Ar是具有多达两个环并且可以被取代的芳环体系 由至多三个自由基组成,所述基团包括氟,氯,溴,甲氧基,C 1 -C 4 - 烷基,三氟甲基和三氟甲氧基,和/或它们的盐。 本发明还涉及这些化妆品制剂作为去头皮屑组合物和除臭化妆品组合物的用途。