发明申请
WO2023076066A1 SEMICONDUCTOR DEVICE ASSEMBLIES INCLUDING MONOLITHIC SILICON STRUCTURES FOR THERMAL DISSIPATION AND METHODS OF MAKING THE SAME
审中-公开
基本信息:
- 专利标题: SEMICONDUCTOR DEVICE ASSEMBLIES INCLUDING MONOLITHIC SILICON STRUCTURES FOR THERMAL DISSIPATION AND METHODS OF MAKING THE SAME
- 申请号:PCT/US2022/046915 申请日:2022-10-17
- 公开(公告)号:WO2023076066A1 公开(公告)日:2023-05-04
- 发明人: PAREKH, Kunal, R.
- 申请人: MICRON TECHNOLOGY, INC.
- 申请人地址: 8000 S. Federal Way, P.O. Box 6
- 专利权人: MICRON TECHNOLOGY, INC.
- 当前专利权人: MICRON TECHNOLOGY, INC.
- 当前专利权人地址: 8000 S. Federal Way, P.O. Box 6
- 代理机构: NELSON, Joshua, M. et al.
- 优先权: US17/719,241 2022-04-12
- 主分类号: H01L25/065
- IPC分类号: H01L25/065 ; H01L23/00 ; H01L23/31
摘要:
A semiconductor device assembly includes a first semiconductor device including a plurality of electrical contacts on an upper surface thereof, a monolithic silicon structure having a lower surface in contact with the upper surface and a cavity extending from the lower surface into a body of the monolithic silicon structure; a second semiconductor device disposed in the cavity, the second semiconductor device including a first plurality of interconnects, each operatively coupled to a corresponding one of the plurality of electrical contacts, and a second plurality of interconnects on an upper surface of the second semiconductor device, each coupled to a corresponding TSV of a plurality of TSVs extending from the cavity to a top surface of the monolithic silicon structure; and a third semiconductor device disposed over the monolithic silicon structure and including a third plurality of interconnects, each operatively coupled to a corresponding one of the plurality of TSVs.
IPC结构图谱:
H | 电学 |
--H01 | 基本电气元件 |
----H01L | 半导体器件;其他类目未包含的电固体器件 |
------H01L25/00 | 由多个单个半导体或其他固态器件组成的组装件 |
--------H01L25/03 | .所有包含在H01L27/00至H01L51/00各组中同一小组内的相同类型的器件,例如整流二极管的组装件 |
----------H01L25/04 | ..不具有单独容器的器件 |
------------H01L25/065 | ...包含在H01L27/00组类型的器件 |