发明申请
WO2022268560A1 SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONING OF RETICLES IN LITHOGRAPHIC APPARATUSES
审中-公开
基本信息:
- 专利标题： SYSTEMS, METHODS, AND DEVICES FOR THERMAL CONDITIONING OF RETICLES IN LITHOGRAPHIC APPARATUSES
- 申请号：PCT/EP2022/066044 申请日：2022-06-13
- 公开(公告)号：WO2022268560A1 公开(公告)日：2022-12-29
- 发明人： VAN DAMME, Jean-Philippe, Xavier , JOHNSON, Richard, John , SUBRAMANIAN, Raaja Ganapathy
- 申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- 申请人地址： P.O. Box 324; P.O. Box 324
- 专利权人： ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- 当前专利权人： ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- 当前专利权人地址： P.O. Box 324; P.O. Box 324
- 代理机构： ASML NETHERLANDS B.V.
- 优先权： US63/213,898 2021-06-23
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/70783 ; G03F7/7085 ; G03F7/70875
摘要：
Embodiments herein describe systems, methods, and devices for thermal conditioning of patterning devices at a lithographic apparatus. A patterning device cooling system for thermally conditioning a patterning device (202) of a lithographic apparatus is described, the cooling system including a thermal conditioner that thermally conditions the patterning device, and a controller that controls the thermal conditioner to determine a temperature state of the patterning device, determine a production state of the lithographic apparatus, and thermally condition the patterning device for exposures based on the temperature state and a production state of the lithographic apparatus.