基本信息:
- 专利标题： PLASMA ARC PROCESS AND APPARATUS FOR THE PRODUCTION OF FUMED SILICA
- 申请号：PCT/CA2022/050770 申请日：2022-05-16
- 公开(公告)号：WO2022241545A1 公开(公告)日：2022-11-24
- 发明人： SHAHVERDI, Ali , GAGNON, Jean-rené , CARABIN, Pierre
- 申请人： HPQ SILICA POLVERE INC.
- 申请人地址： 3000, Omer-Lavallée St.
- 专利权人： HPQ SILICA POLVERE INC.
- 当前专利权人： HPQ SILICA POLVERE INC.
- 当前专利权人地址： 3000, Omer-Lavallée St.
- 代理机构： BENOIT & COTE INC.
- 优先权： US63/189,069 2021-05-15
- 主分类号： C01B13/28
- IPC分类号： C01B13/28 ; B01J19/24 ; C01B33/12 ; C01B33/18 ; H05H1/48
摘要：
An apparatus for producing fumed silica from silica is described, wherein a plasma arc reactor includes at least one top electrode extending to the molten silica contained in the reactor, a conductive plate provided under the molten silica and a bottom anode. A plasma arc is adapted to be generated, wherein the plasma arc is provided at a tip of the electrode and is adapted to be transferred directly to the molten silica for forming SiO. A quenching system is also provided, such as hydrogen and oxygen containing gases that are injected within the reactor. The quenching system is adapted to reform SiO2 but in nano-sized amorphous particles, with a reactor outlet being provided for allowing the amorphous SiO2 nano particles in the form of fumed silica to exit the reactor.
IPC结构图谱:
| C | 化学；冶金 |
| --C01 | 无机化学 |
| ----C01B | 非金属元素；其化合物 |
| ------C01B13/00 | 氧；臭氧；一般氧化物或氢氧化物 |
| --------C01B13/02 | .氧的制备 |
| ----------C01B13/20 | ..用气态单质的氧化；气态化合物的氧化或水解 |
| ------------C01B13/22 | ...卤化物或卤氧化物的 |
| --------------C01B13/28 | ....使用等离子体或放电 |