基本信息:
- 专利标题： ION IMPLANTATION TO MODIFY GLASS LOCALLY FOR OPTICAL DEVICES
- 申请号：PCT/US2022/021399 申请日：2022-03-22
- 公开(公告)号：WO2022204192A1 公开(公告)日：2022-09-29
- 发明人： PI, Nai-Wen , FU, Jinxin , LUO, Kang , GODET, Ludovic
- 申请人： APPLIED MATERIALS, INC.
- 申请人地址： 3050 Bowers Avenue
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 当前专利权人地址： 3050 Bowers Avenue
- 代理机构： PATTERSON, B., Todd et al.
- 优先权： US63/165,958 2021-03-25
- 主分类号： G02B6/136
- IPC分类号： G02B6/136 ; G02B27/01 ; G02B6/12
摘要：
Embodiments described herein provide for optical devices with methods of forming optical device substrates having at least one area of increased refractive index or scratch resistance. One method includes disposing an etch material on a discrete area of an optical device substrate or an optical device layer, disposing a diffusion material in the discrete area, and removing excess diffusion material to form an optical material in the optical device substrate or the optical device layer having a refractive index greater than or equal to 2.0 or a hardness greater than or equal to 5.5 Mohs.
IPC结构图谱:
| G | 物理 |
| --G02 | 光学 |
| ----G02B | 光学元件、系统或仪器 |
| ------G02B6/00 | 光导；包含光导和其他光学元件（如耦合器）的装置的结构零部件 |
| --------G02B6/02 | .带有包层的光导纤维 |
| ----------G02B6/12 | ..集成光路类型 |
| ------------G02B6/13 | ...以制作方法为特征的集成光路 |
| --------------G02B6/136 | ....用蚀刻法 |