发明申请
WO2022112979A1 LIQUID COMPOSITION SET, POROUS RESIN MANUFACTURING APPARATUS, AND POROUS RESIN MANUFACTURING METHOD
审中-公开
基本信息:
- 专利标题： LIQUID COMPOSITION SET, POROUS RESIN MANUFACTURING APPARATUS, AND POROUS RESIN MANUFACTURING METHOD
- 申请号：PCT/IB2021/060950 申请日：2021-11-25
- 公开(公告)号：WO2022112979A1 公开(公告)日：2022-06-02
- 发明人： OHKIMOTO, Miku , TAKAUJI, Keigo , NOSE, Daisuke , SUGIHARA, Naoki , USHIROGOCHI, Toru
- 申请人： RICOH COMPANY, LTD. , OHKIMOTO, Miku , TAKAUJI, Keigo , NOSE, Daisuke , SUGIHARA, Naoki , USHIROGOCHI, Toru
- 申请人地址： 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome
- 专利权人： RICOH COMPANY, LTD.,OHKIMOTO, Miku,TAKAUJI, Keigo,NOSE, Daisuke,SUGIHARA, Naoki,USHIROGOCHI, Toru
- 当前专利权人： RICOH COMPANY, LTD.,OHKIMOTO, Miku,TAKAUJI, Keigo,NOSE, Daisuke,SUGIHARA, Naoki,USHIROGOCHI, Toru
- 当前专利权人地址： 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome; C/O Ricoh Company, Ltd. 3-6, Nakamagome
- 代理机构： SUZUKI, Yasushi
- 优先权： JP2020-197906 2020-11-30
- 主分类号： C09D5/00
- IPC分类号： C09D5/00
摘要：
The present disclosure provides a liquid composition set comprising: a liquid composition X comprising a polymerizable compound X and a solvent X; and a liquid composition Y comprising a solvent Y. The liquid composition X is to form a porous resin. A liquid composition Z comprising 10.0% by mass of the liquid composition X and 90.0% by mass of the liquid composition Y has a light transmittance of 30% or more at a wavelength of 550 nm, where the light transmittance is measured while the liquid composition Z is being stirred. A haze measuring element produced from the liquid composition Z has a haze increasing rate of 1.0% or more.