发明申请
WO2022039984A1 CONTROLLING TEMPERATURE PROFILES OF PLASMA CHAMBER COMPONENTS USING STRESS ANALYSIS
审中-公开
基本信息:
- 专利标题： CONTROLLING TEMPERATURE PROFILES OF PLASMA CHAMBER COMPONENTS USING STRESS ANALYSIS
- 申请号：PCT/US2021/045471 申请日：2021-08-11
- 公开(公告)号：WO2022039984A1 公开(公告)日：2022-02-24
- 发明人： DREWERY, John
- 申请人： LAM RESEARCH CORPORATION
- 申请人地址： 4650 Cushing Parkway
- 专利权人： LAM RESEARCH CORPORATION
- 当前专利权人： LAM RESEARCH CORPORATION
- 当前专利权人地址： 4650 Cushing Parkway
- 代理机构： WIGGINS, Michael D. et al.
- 优先权： US63/067,115 2020-08-18
- 主分类号： H01J37/32
- IPC分类号： H01J37/32
摘要：
A system for estimating stress on a component of a processing chamber during a process includes a plurality of sensors configured to sense temperatures at a plurality of locations of the component during the process and a controller a controller configured to interpolate the temperatures to estimate a temperature distribution across the component and to estimate the stress on the component during the process. A method of estimating stress on a component of a processing chamber during a process includes sensing temperatures at a plurality of locations of the component during the process, interpolating the temperatures to estimate a temperature distribution across the component, and estimating the stress on the component during the process.