基本信息:
- 专利标题: AN EASILY ADJUSTABLE OPTICAL EMISSION SPECTROMETER
- 申请号:PCT/EP2020/080992 申请日:2020-11-04
- 公开(公告)号:WO2021089639A1 公开(公告)日:2021-05-14
- 发明人: PETERS, André , SIMONS, Rainer
- 申请人: HITACHI HIGH-TECH ANALYTICAL SCIENCE GMBH
- 申请人地址: Wellesweg 31
- 专利权人: HITACHI HIGH-TECH ANALYTICAL SCIENCE GMBH
- 当前专利权人: HITACHI HIGH-TECH ANALYTICAL SCIENCE GMBH
- 当前专利权人地址: Wellesweg 31
- 代理机构: FARAGO PATENTANWALTS- UND RECHTSANWALTSGESELLSCHAFT MBH
- 优先权: EP19207192.6 2019-11-05
- 主分类号: G01J3/02
- IPC分类号: G01J3/02 ; G01J3/18 ; G01J3/28 ; G01J3/36 ; G01J3/443 ; G01J3/20 ; G01N21/27 ; G01N21/71 ; H05H1/24 ; G01N21/73 ; G01N21/67 ; H05H1/00 ; H05H1/48 ; H05H1/52
摘要:
The invention relates to an optical emission spectrometer (1) being easily adjustable, and to a method (100) to set-up and operate such a spectrometer (1) comprising a plasma stand (2) to establish a light emitting plasma from sample material, and an optical system (3) to measure the spectrum of the light (L) emitted by the plasma being characteristic to the sample material, where the optical system (3) comprises at least one light entrance aperture (31), at least one diffraction grating (32) to split up the light (L) coming from the plasma (A) and one or more detectors (33) to measure the spectrum of the light (L), wherein the plasma stand (2) and the optical system (3) are directly and fixedly mounted on respective a plasma stand flange (2B) and an optical system flange (3B) which are directly and fixedly connected to each other and wherein the optical emission spectrometer (1) further comprises an analyzing unit (34) adapted to analyze the measured spectrum and to compensate for a drift of the spectrum relative to the detector (33) potentially caused by heat transferred from the plasma stand (2) to the optical system (3) considering the thermal expansion of the optical system (3).
IPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01J | 红外光、可见光、紫外光的强度、速度、光谱成分,偏振、相位或脉冲特性的测量;比色法;辐射高温测定法 |
------G01J3/00 | 光谱测定法;分光光度测定法;单色器;测定颜色 |
--------G01J3/02 | .零部件 |