发明申请
WO2021073821A1 VERFAHREN UND VORRICHTUNG ZUR CHARAKTERISIERUNG DER OBERFLÄCHENFORM EINES OPTISCHEN ELEMENTS
审中-公开
基本信息:
- 专利标题: VERFAHREN UND VORRICHTUNG ZUR CHARAKTERISIERUNG DER OBERFLÄCHENFORM EINES OPTISCHEN ELEMENTS
- 专利标题(英):METHOD AND DEVICE FOR CHARACTERIZING THE SURFACE SHAPE OF AN OPTICAL ELEMENT
- 申请号:PCT/EP2020/075737 申请日:2020-09-15
- 公开(公告)号:WO2021073821A1 公开(公告)日:2021-04-22
- 发明人: SIEGLER, Steffen , RUOFF, Johannes , WOLF, Alexander , CARL, Michael , GRUNER, Toralf , SCHICKETANZ, Thomas
- 申请人: CARL ZEISS SMT GMBH , SIEGLER, Steffen , RUOFF, Johannes , WOLF, Alexander , CARL, Michael , GRUNER, Toralf , SCHICKETANZ, Thomas
- 申请人地址: Rudolf-Eber-Strasse 2; Edmund-Kohler-Straße 58; Droste-Hülshoff-Weg 35; Kirschenweg 46; Alfred-Delp Straße 2; Opalstraße 22; Jahnstraße 13
- 专利权人: CARL ZEISS SMT GMBH,SIEGLER, Steffen,RUOFF, Johannes,WOLF, Alexander,CARL, Michael,GRUNER, Toralf,SCHICKETANZ, Thomas
- 当前专利权人: CARL ZEISS SMT GMBH,SIEGLER, Steffen,RUOFF, Johannes,WOLF, Alexander,CARL, Michael,GRUNER, Toralf,SCHICKETANZ, Thomas
- 当前专利权人地址: Rudolf-Eber-Strasse 2; Edmund-Kohler-Straße 58; Droste-Hülshoff-Weg 35; Kirschenweg 46; Alfred-Delp Straße 2; Opalstraße 22; Jahnstraße 13
- 代理机构: FRANK, Hartmut
- 优先权: DE10 2019 215 707.6 2019-10-14
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G01B11/24 ; G01M11/00 ; G03F7/20
The invention relates to a method and to a device for characterizing the surface shape of an optical element. The method according to the invention comprises the following steps: carrying out, in an interferometric test arrangement, at least a first interferogram measurement on the optical element by superimposing a test wave, which has been generated by diffraction of electromagnetic radiation on a diffractive element and has been reflected at the optical element, with a reference wave not reflected at the optical element, carrying out at least one additional interferogram measurement on in each case one calibrating mirror for determining calibration corrections, and determining the deviation from the target shape of the optical element on the basis of the first interferogram measurement carried out on the optical element and the determined calibration corrections. At least two interferogram measurements are carried out for the at least one calibrating mirror, which differ from one another with regard to the polarization state of the electromagnetic radiation.
IPC结构图谱:
G | 物理 |
--G01 | 测量;测试 |
----G01B | 长度、厚度或类似线性尺寸的计量;角度的计量;面积的计量;不规则的表面或轮廓的计量 |
------G01B9/00 | 组中所列的及以采用光学测量方法为其特征的仪器 |
--------G01B9/02 | .干涉仪 |