发明申请
WO2020120667A1 SUBSTRATE CLEANING SOLUTION, AND USING THE SAME, METHOD FOR MANUFACTURING CLEANED SUBSTRATE AND METHOD FOR MANUFACTURING DEVICE
审中-公开
基本信息:
- 专利标题： SUBSTRATE CLEANING SOLUTION, AND USING THE SAME, METHOD FOR MANUFACTURING CLEANED SUBSTRATE AND METHOD FOR MANUFACTURING DEVICE
- 申请号：PCT/EP2019/084873 申请日：2019-12-12
- 公开(公告)号：WO2020120667A1 公开(公告)日：2020-06-18
- 发明人： KINUTA, Takafumi , NAGAHARA, Tatsuro , HORIBA, Yuko
- 申请人： MERCK PATENT GMBH
- 申请人地址： Frankfurter Strasse 250 64293 Darmstadt DE
- 专利权人： MERCK PATENT GMBH
- 当前专利权人： MERCK PATENT GMBH
- 当前专利权人地址： Frankfurter Strasse 250 64293 Darmstadt DE
- 优先权： JP2018-234040 20181214
- 主分类号： C09D161/00
- IPC分类号： C09D161/00 ; H01L21/02
摘要：
[Problem] To obtain a substrate cleaning solution capable of cleaning a substrate and removing particles. [Means for Solution] The present invention is a substrate cleaning solution comprising an insoluble or hardly soluble solute (A), a soluble solute (B), and a solvent (C).