发明申请
WO2020092963A1 BOTTOM-UP CONFORMAL COATING AND PHOTOPATTERNING ON PAG-IMMOBILIZED SURFACES
审中-公开
基本信息:
- 专利标题： BOTTOM-UP CONFORMAL COATING AND PHOTOPATTERNING ON PAG-IMMOBILIZED SURFACES
- 申请号：PCT/US2019/059481 申请日：2019-11-01
- 公开(公告)号：WO2020092963A1 公开(公告)日：2020-05-07
- 发明人： DAI, Jinhua , LOWES, Joyce A. , JONES, Carissa
- 申请人： BREWER SCIENCE, INC.
- 申请人地址： 2401 Brewer Drive Rolla, Missouri 65401 US
- 专利权人： BREWER SCIENCE, INC.
- 当前专利权人： BREWER SCIENCE, INC.
- 当前专利权人地址： 2401 Brewer Drive Rolla, Missouri 65401 US
- 代理机构： BORNMAN, Tracy L.
- 优先权： US62/754,837 20181102; US16/671,426 20191101
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F7/09 ; G03F7/20 ; G03F7/34 ; G03F7/42 ; G03F7/021 ; H01L21/027
摘要：
Materials and methods to immobilize photoacid generators on semiconducting substrates are provided. PAG-containing monomers are copolymerized with monomers to allow the polymer to bind to a surface, and optionally copolymerized with monomers to enhance solubility to generate PAG-containing polymers. The PAG-containing monomers can be coated onto a surface, where the immobilized PAGs can then be used to pattern materials coated on top of the immobilized PAGs, allowing direct patterning without the use of a photoresist, thereby reducing process steps and cost. The disclosed materials and processes can be used to produce conformal coatings of controlled thicknesses.