基本信息:
- 专利标题： MICROREPLICATED POLISHING SURFACE WITH ENHANCED CO-PLANARITY
- 申请号：PCT/IB2018/055815 申请日：2018-08-02
- 公开(公告)号：WO2019026021A1 公开(公告)日：2019-02-07
- 发明人： MEYER, Kenneth A. P. , SULLIVAN, John J. , LUECK, Brian W. , LEHUU, Duy K. , MURADIAN, David J. , SLAMA, David F.
- 申请人： 3M INNOVATIVE PROPERTIES COMPANY
- 申请人地址： 3M Center Post Office Box 33427 Saint Paul, Minnesota 55133-3427 US
- 专利权人： 3M INNOVATIVE PROPERTIES COMPANY
- 当前专利权人： 3M INNOVATIVE PROPERTIES COMPANY
- 当前专利权人地址： 3M Center Post Office Box 33427 Saint Paul, Minnesota 55133-3427 US
- 代理机构： BRAMWELL, Adam M., et al.
- 优先权： US62/541,362 20170804
- 主分类号： B24B37/26
- IPC分类号： B24B37/26 ; B24B37/16 ; B24B37/22 ; B24B37/24 ; B24D3/28
摘要：
An article includes a polishing layer that includes a plurality of raised cells separated by a plurality of channels. Each of the plurality of raised cells includes a microstructured working surface, a substantially vertical channel surface, and an offset surface between an edge of the working surface and an upper edge of the channel surface. The microstructured working surface includes a plurality of microstructures. Tops of the plurality of microstructures define a top plane and bases of the plurality of microstructures define a base plane. The substantially vertical channel surface defines a wall of a channel of the plurality of channels and the channel surface defines a channel plane. The offset surface includes a nonplanar portion of displaced material. The displaced material defines a displacement plane that is below the base plane or within a tolerance of the top plane.
IPC结构图谱:
| B | 作业；运输 |
| --B24 | 磨削；抛光 |
| ----B24B | 用于磨削或抛光的机床、装置或工艺；磨具磨损表面的修理或调节；磨削，抛光剂或研磨剂的进给 |
| ------B24B37/00 | 研磨机床或装置，即需要在相对软但仍为刚性的研具和被研磨表面之间加入粉末状磨料；及其附件 |
| --------B24B37/005 | .研磨机床或装置的控制装置 |
| ----------B24B37/12 | ..用于加工平面的研磨片 |
| ------------B24B37/26 | ...以研磨垫表面的形状为特征，如带有槽的 |