发明申请
WO2018215140A1 SETPOINT GENERATOR, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS OPERATING METHOD, AND DEVICE MANUFACTURING METHOD
审中-公开
基本信息:
- 专利标题： SETPOINT GENERATOR, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS OPERATING METHOD, AND DEVICE MANUFACTURING METHOD
- 申请号：PCT/EP2018/059830 申请日：2018-04-18
- 公开(公告)号：WO2018215140A1 公开(公告)日：2018-11-29
- 发明人： VAN DAMME, Jean-Philippe, Xavier , VAN BOKHOVEN, Laurentius, Johannes, Adrianus , VAN GILS, Petrus, Franciscus , PIETERSE, Gerben
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： P.O. Box 324 5500 AH Veldhoven NL
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： P.O. Box 324 5500 AH Veldhoven NL
- 代理机构： RAS, Michael
- 优先权： EP17172452.9 20170523
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
The invention relates to a setpoint generator for moving a patterning device of a lithographic apparatus, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, wherein the setpoint generator comprises a finite number of movement profiles for the patterning device, and wherein the setpoint generator is configured to select one of the finite number of movement profiles based on a desired movement profile and to output the selected movement profile as a setpoint for the patterning device.